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    METHOD OF DETECTING RELATIVE POSITION OF EXPOSURE MASK AND OBJECT TO BE EXPOSED, ALIGNMENT METHOD, AND EXPOSURE METHOD USING THE SAME
    1.
    发明申请
    METHOD OF DETECTING RELATIVE POSITION OF EXPOSURE MASK AND OBJECT TO BE EXPOSED, ALIGNMENT METHOD, AND EXPOSURE METHOD USING THE SAME 审中-公开
    检测曝光掩模的相对位置和要曝光的对象的方法，使用其的对准方法和曝光方法

    公开(公告)号：WO2004099879A2

    公开(公告)日：2004-11-18

    申请号：PCT/JP2004006696

    申请日：2004-05-12

    Applicant: CANON KK ,  YAMAGUCHI TAKAKO ,  KURODA RYO

    Inventor： YAMAGUCHI TAKAKO ,  KURODA RYO

    IPC: G03F1/22 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC classification number: G03F7/7035 ,  G03F1/22 ,  G03F1/42 ,  G03F7/2039 ,  G03F9/7038

    Abstract: An alignment method for an exposure mask and an object to be exposed, wherein exposure is carried out while the exposure mask having a light blocking film formed at a membrane portion thereof is closely contacted to the object to be exposed and light from a light source is projected to the object to be exposed, through the exposure mask, and wherein alignment of the exposure mask and the object to be exposed is carried out prior to the exposure, the method comprising the steps of preparing an exposure mask having a light blocking film provided on a base material constituting the membrane portion and having a structure for performing position detection, flexing the membrane portion and detecting, by use of the structure, a relative position of the exposure mask and the object to be exposed, in a state in which the exposure mask is contacted to the object to be exposed, and aligning the exposure mask and the object to be exposed, with each other, on the basis of a result of the position detection.

    Abstract translation: 一种用于曝光掩模和待曝光物体的对准方法，其中在其膜部分形成有遮光膜的曝光掩模与待曝光的物体紧密接触并且来自光源的光是 通过曝光掩模投影到待曝光的物体上，并且其中曝光前曝光掩模和待曝光对象的对准在曝光之前进行，该方法包括以下步骤：制备具有遮光膜的曝光掩模 在构成膜部的基材上，具有进行位置检测的结构，弯曲膜部，并且通过使用该结构，在曝光掩模与被曝光物的相对位置之间，在 曝光掩模与要曝光的物体接触，并且基于位置的结果将曝光掩模和待曝光的对象彼此对准 检测。

    EXPOSURE METHOD, EXPOSURE MASK, AND EXPOSURE APPARATUS
    2.
    发明申请
    EXPOSURE METHOD, EXPOSURE MASK, AND EXPOSURE APPARATUS 审中-公开
    曝光方法，曝光掩模和曝光装置

    公开(公告)号：WO2004023211A3

    公开(公告)日：2004-10-14

    申请号：PCT/JP0311357

    申请日：2003-09-05

    Applicant: CANON KK

    Inventor： INAO YASUHISA ,  KURODA RYO ,  MIZUTANI NATSUHIKO

    IPC: B82B3/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/14 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

    Abstract: An exposure method for exposing a workpiece on the basis of near-field light escaping from an opening of a mask, wherein nonpolarized exposure light from a light source is projected onto an exposure mask having a light blocking film and a plurality of rectangular openings formed in the light blocking film, the openings having a width in a widthwise direction not greater than one-third of the exposure light and having its lengthwise directions extending in two or more directions along the mask surface, so that near-field light escaping from the openings is produced thereby to perform exposure of a pattern on the basis of the openings.

    Abstract translation: 一种曝光方法，用于基于从掩模的开口逸出的近场光来曝光工件，其中来自光源的非偏振曝光光被投影到具有遮光膜和形成在其上的多个矩形开口的曝光掩模上 所述遮光膜的开口在宽度方向上的宽度不大于曝光光线的三分之一，并且其长度方向沿着掩模表面在两个或更多个方向上延伸，使得从开口逸出的近场光 由此产生基于开口的图案的曝光。

    EXPOSURE APPARATUS, EXPOSURE METHOD, AND EXPOSURE MASK
    4.
    发明公开
    EXPOSURE APPARATUS, EXPOSURE METHOD, AND EXPOSURE MASK 审中-公开
    曝光装置，曝光方法及曝光MASK

    公开(公告)号：EP1782456A4

    公开(公告)日：2008-07-30

    申请号：EP05755684

    申请日：2005-06-24

    Applicant: CANON KK

    Inventor： INAO YASUHISA ,  KURODA RYO ,  MIZUTANI NATSUHIKO

    IPC: H01L21/027 ,  G03F1/60 ,  G03F7/20 ,  G03F9/00

    CPC classification number: G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70433 ,  G03F7/70691 ,  G03F9/703 ,  G03F9/7053 ,  G03F9/7088

    Abstract: Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure apparatus is arranged to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern, wherein for exposure the exposure mask is flexed to be brought into contact with an object to be exposed. The exposure apparatus includes a distance detecting system for detecting a distance between the exposure mask before being flexed and the object to be exposed, and a distance controlling system for controlling the distance between the exposure mask before being flexed and the object to be exposed, on the basis of a signal from the distance detecting system.

    8.
    发明专利
    未知

    公开(公告)号：DE69128317D1

    公开(公告)日：1998-01-15

    申请号：DE69128317

    申请日：1991-08-13

    Applicant: CANON KK

    Inventor： MIYAZAKI TOSHIHIKO ,  NOSE HIROYASU ,  KURODA RYO ,  KAWASE TOSHIMITSU ,  SHINJO KATSUHIKO

    IPC: G01B7/34 ,  G01B21/30 ,  G01N37/00 ,  G01Q10/04 ,  G01Q20/04 ,  G01Q60/10 ,  G01Q60/16 ,  G01Q60/38 ,  G01Q70/06 ,  G01Q70/10 ,  G01Q70/14 ,  G01Q80/00 ,  G11B5/592 ,  G11B9/00 ,  G11B9/14 ,  H01J37/28 ,  H01L41/09 ,  G01N27/00

    Abstract: A micro-displacement type information detection probe device capable of following all of the undulation on the mu m order, etc. and the periodical surface unevenness on the nm order, etc. of the recording medium or the substrate in performing recording, reproduction, etc. by use of tunnel current, etc. is provided. By forming a cantilever 701 of the first stage by extending the insulation layer laminated on the substrate, providing a layer structure 708 - 710 having a piezoelectric material sandwiched between the electrode members on the cantilever of the first stage, forming further a cantilever 702 of the second stage on the extension from the tip end of the first cantilever having said layer structure and also forming an information detection probe 703 at the free end of the cantilever of said second stage, and utilizing the reverse piezoelectric effect formed by application of a voltage between the electrodes of said layer structure, the cantilever 701 of the above first stage is displaced.

    9.
    发明专利
    未知

    公开(公告)号：AT160865T

    公开(公告)日：1997-12-15

    申请号：AT91307429

    申请日：1991-08-13

    Applicant: CANON KK

    Inventor： MIYAZAKI TOSHIHIKO ,  NOSE HIROYASU ,  KURODA RYO ,  KAWASE TOSHIMITSU ,  SHINJO KATSUHIKO

    IPC: G01B7/34 ,  G01B21/30 ,  G01N37/00 ,  G01Q10/04 ,  G01Q20/04 ,  G01Q60/10 ,  G01Q60/16 ,  G01Q60/38 ,  G01Q70/06 ,  G01Q70/10 ,  G01Q70/14 ,  G01Q80/00 ,  G11B5/592 ,  G11B9/00 ,  G11B9/14 ,  H01J37/28 ,  H01L41/09 ,  G01N27/00

    Abstract: A micro-displacement type information detection probe device capable of following all of the undulation on the mu m order, etc. and the periodical surface unevenness on the nm order, etc. of the recording medium or the substrate in performing recording, reproduction, etc. by use of tunnel current, etc. is provided. By forming a cantilever 701 of the first stage by extending the insulation layer laminated on the substrate, providing a layer structure 708 - 710 having a piezoelectric material sandwiched between the electrode members on the cantilever of the first stage, forming further a cantilever 702 of the second stage on the extension from the tip end of the first cantilever having said layer structure and also forming an information detection probe 703 at the free end of the cantilever of said second stage, and utilizing the reverse piezoelectric effect formed by application of a voltage between the electrodes of said layer structure, the cantilever 701 of the above first stage is displaced.

    10.
    发明专利
    未知

    公开(公告)号：DE69125538T2

    公开(公告)日：1997-10-09

    申请号：DE69125538

    申请日：1991-07-23

    Applicant: CANON KK

    Inventor： KURODA RYO ,  YAMANO AKIHIKO ,  NOSE HIROYASU ,  MIYAZAKI TOSHIHIKO ,  OGUCHI TAKAHIRO

    IPC: G01Q30/04 ,  G01Q60/10 ,  G01Q80/00 ,  G11B9/00 ,  G11B9/14

    Abstract: Apparatus and method for recording and/or reproducing information onto/from a medium through a probe electrode by using a scanning tunnel microscope comprises: a voltage applying circuit to apply a voltage between the medium and the probe electrode, in which the recording operation and/or the reproducing operation of the information onto/from the medium are/is executed by applying the voltage by the voltage applying circuit; a distance adjusting mechanism to adjust a distance between the medium and the probe electrode in a manner such that the voltage applied by the voltage applying circuit and the current flowing between the medium and the probe electrode to which the voltage has been applied by the voltage applying circuit satisfy the current-voltage characteristics such that the current between the medium and the probe electrode also changes in accordance with a change in the applied voltage.

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