SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20230170301A1

    公开(公告)日:2023-06-01

    申请号:US17972648

    申请日:2022-10-25

    CPC classification number: H01L23/5286 H01L21/76802 H01L21/76877 H01L23/552

    Abstract: A semiconductor structure includes a substrate, a dielectric layer, a connection layer and wire layers. The dielectric layer is disposed on a surface of the substrate and includes vias showing the surface. The connection layer is disposed on the dielectric layer, a first connection portion of the connection layer is located in the vias and connected to the surface, a second connection portion of the connection layer is connected to the dielectric layer. A first ground portion of the ground metal layer is connected to the first connection portion of the connection layer, and a second ground portion of the ground metal layer is connected to the second connection portion of the connection layer. Each of the wire layers is disposed on the second connection portion of the connection layer, and the second ground portion is located between the adjacent wire layers.

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