1.
    发明专利
    未知

    公开(公告)号:FR2860385B1

    公开(公告)日:2007-06-01

    申请号:FR0311280

    申请日:2003-09-26

    Applicant: CIT ALCATEL

    Abstract: The source has a radiation zone (3) situated in a radiation chamber (1) connected to turbomolecular pumps (11). A collector device (13) for collecting and conditioning extreme ultraviolet (EUV) radiation emitted by a radiation generating material, is placed in a transmission chamber (2) that is connected to turbomolecular pumps (12). The chamber (2) is connected to the chamber (1) through a diaphragm (4) having reduced dimension. The turbomolecular pumps (11) maintain a pressure that is higher than the pressure maintained by the turbomolecular pumps (12). The diaphragm is provided at proximity of the radiation zone (3) and is oriented along an optical axis. An independent claim is also included for a photolithography device comprising extreme ultraviolet radiation source.

    2.
    发明专利
    未知

    公开(公告)号:FR2860385A1

    公开(公告)日:2005-04-01

    申请号:FR0311280

    申请日:2003-09-26

    Applicant: CIT ALCATEL

    Abstract: The source has a radiation zone (3) situated in a radiation chamber (1) connected to turbomolecular pumps (11). A collector device (13) for collecting and conditioning extreme ultraviolet (EUV) radiation emitted by a radiation generating material, is placed in a transmission chamber (2) that is connected to turbomolecular pumps (12). The chamber (2) is connected to the chamber (1) through a diaphragm (4) having reduced dimension. The turbomolecular pumps (11) maintain a pressure that is higher than the pressure maintained by the turbomolecular pumps (12). The diaphragm is provided at proximity of the radiation zone (3) and is oriented along an optical axis. An independent claim is also included for a photolithography device comprising extreme ultraviolet radiation source.

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