公开(公告)号：JPH07111329A

公开(公告)日：1995-04-25

申请号：JP30736791

申请日：1991-11-22

Applicant: CONS RIC MICROELETTRONICA

Inventor： FUERUTSUCHIO FURIISHINA ,  NERA TABUOORO ,  MARIO RASUPARIISHI

IPC: H01L21/322 ,  H01L21/22 ,  H01L21/265 ,  H01L21/336 ,  H01L29/78

Abstract: PURPOSE: To make it possible to constantly keep intrinsic resistance distribution in thickness direction and along the surface of a semiconductor slice by a method wherein the transimplantation of platinum ions is conducted before formation of a contact point and conduction of a metallization process on the backside of a silicon slice against the semiconductor device after a heat process at high temperature. CONSTITUTION: Chemical etching is conducted on the rear surface of a substrate 1, where a total heat treatment process is conducted for the purpose of removing the oxide layer generated as a matter of cource on the rear surface of the substrate 1 where a total heat treatment process is conducted at a high temperature. Subsequently, platinum ions are transplanted. Then, an aperture at contact point reaching the lower layer of source region 4 is formed by etching a passivation oxide 7 for the purpose of providing a window 12. A part of the oxide 7 is left in the amount with which a gate electrode 5 can be insulated from a source metallized layer 9 which is vapor deposited on the whole surface of the device. Thereafter, a metallized layer 11 is vapor deposited on the rear of the substrate 1 for drain metallization. Accordingly, a flat and controlled intrinsic resistance distribution can be formed in thickness direction of a silicon slice.

公开(公告)号：JPH06349431A

公开(公告)日：1994-12-22

申请号：JP613591

申请日：1991-01-23

Applicant: CONS RIC MICROELETTRONICA

Inventor： MARIO RASUPARIISHI ,  KANDEIIDO MEDEYURATSU

IPC: C23C14/48 ,  H01J27/08 ,  H01J27/22 ,  H01J37/08 ,  H01J37/317 ,  H01L21/265

Abstract: PURPOSE: To provide a Freeman-type ionizer which can be used for a commercial ion implanter and can ionize metals having a high melting point, while maintaining conventional operation. CONSTITUTION: This ionizer is provided with a cylindrical casing 1, having an inside cavity 2 and a flange, an arc chamber 15 which is superposed on its outside upper part and contains a filament 20 to which electric power is supplied by passing through power supply conductors 8, 7 and 6 supported by the flange, a repulsive plate 21 held at a negative voltage by the power supply conductors and an inlet for gas to be ionized. A support 23 for metal 24 to be ionized, which is supported by a rod 9 passing through the inside cavity of the cylindrical casing and electrically connected to an electrode 13, exists on the inside of the arc chamber.