Optical test system including interferometer with micromirror
    1.
    发明公开
    Optical test system including interferometer with micromirror 失效
    Optisches测试系统微电脑干涉仪

    公开(公告)号:EP0814331A2

    公开(公告)日:1997-12-29

    申请号:EP97116978

    申请日:1996-03-19

    CPC classification number: G01J3/45 G01J3/4535 G01J9/02

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

    Abstract translation: 干涉仪包括用于将源束分裂成测试光束和参考光束的分束器,用于检测干涉图案的成像装置,设置在测试光束的路径中以用于将测试光束反射到成像装置的反射镜, 设置在参考光束的路径中以将参考光束的一部分反射到成像装置的微镜;以及聚焦机构,设置用于将参考光束聚焦在微镜上。 微镜的横向尺寸不超过由聚焦机构聚焦在其上的参考光束的中心波瓣的近似侧向尺寸。 用于减小光束中的像差影响的空间滤光器包括设置在透明基底上的反射器,其中反射器的横向尺寸不超过聚焦在反射器上的光束的空间强度分布的中心波瓣的大致侧向尺寸。 还提供了一种在波前测量系统中对波束进行滤波的方法。 该方法包括聚焦光束,反射聚焦光束的特定第一部分,以及透射光束的第二部分。

    2.
    发明专利
    未知

    公开(公告)号:DK0736759T3

    公开(公告)日:2000-06-13

    申请号:DK96301860

    申请日:1996-03-19

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

    Wavefront sensing with micromirror for self referencing and its alignment

    公开(公告)号:HK1012704A1

    公开(公告)日:1999-08-06

    申请号:HK98114014

    申请日:1998-12-18

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

    4.
    发明专利
    未知

    公开(公告)号:AT201265T

    公开(公告)日:2001-06-15

    申请号:AT97116978

    申请日:1996-03-19

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

    5.
    发明专利
    未知

    公开(公告)号:ES2142023T3

    公开(公告)日:2000-04-01

    申请号:ES96301860

    申请日:1996-03-19

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

    6.
    发明专利
    未知

    公开(公告)号:DK0814331T3

    公开(公告)日:2001-06-11

    申请号:DK97116978

    申请日:1996-03-19

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

    7.
    发明专利
    未知

    公开(公告)号:AT189520T

    公开(公告)日:2000-02-15

    申请号:AT96301860

    申请日:1996-03-19

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

    8.
    发明专利
    未知

    公开(公告)号:PT814331E

    公开(公告)日:2001-10-31

    申请号:PT97116978

    申请日:1996-03-19

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

    9.
    发明专利
    未知

    公开(公告)号:ES2156326T3

    公开(公告)日:2001-06-16

    申请号:ES97116978

    申请日:1996-03-19

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

    10.
    发明专利
    未知

    公开(公告)号:PT736759E

    公开(公告)日:2000-05-31

    申请号:PT96301860

    申请日:1996-03-19

    Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.

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