Abstract:
PROBLEM TO BE SOLVED: To provide an optical filter for an interferometer system for supplying a reference beam not relatively receiving the effect of aberration and capable of monitoring alignment. SOLUTION: This interferometer 10 includes a beamsplitter 32 for splitting a source beam into a test beam 40 and the reference beam 42, an imaging device 24 for detecting an interference pattern, a mirror 38 for reflecting the test beam toward the imaging device, a micromirror 44 for reflecting a portion of the reference beam toward the imaging device and a focusing mechanism 34 for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide an adjustable optical system that determines aberration in a source beam by comparing a test beam with a reference beam. SOLUTION: This optical system includes a test source for producing the source beam having a spatial intensity distribution including an aberration component, a wavefront analyzer for processing a fringe signal associated with the aberration component, and an interferometer interposed between the test source and wavefront analyzer. The interferometer includes a beamsplitter for splitting the source beam into the test beam and reference beam, a mirror disposed in the test beam path, and a micromirror disposed in the interference beam path. The micromirror reflects a central position of the ference beam toward an imaging device and allows an outer portion of the reference beam to pass thereby. Therefore, this optical system is not affected by the aberration existing in the source beam. COPYRIGHT: (C)2003,JPO
Abstract:
An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.
Abstract:
An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.
Abstract:
An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.
Abstract:
An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.
Abstract:
An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.
Abstract:
An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.
Abstract:
An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector. A method of filtering a beam in a wavefront measurement system is also provided. This method includes focusing the beam, reflecting a particular first portion of the focused beam, and transmitting a second portion of the beam.