Abstract:
PROBLEM TO BE SOLVED: To provide a catalyst composition for use in forming a multi-block copolymer, the copolymer containing therein two or more segments or blocks differing in chemical or physical properties, and to provide a polymerization process using the same.SOLUTION: The composition comprises the admixture or reaction product resulting from combining: (A) a first olefin polymerization catalyst; (B) a second olefin polymerization catalyst capable of preparing polymers differing in chemical or physical properties from the polymer prepared by catalyst (A) under equivalent polymerization conditions; and (C) a chain shuttling agent.
Abstract:
PROBLEM TO BE SOLVED: To produce a block copolymer catalytically, namely by a method for producing two or more polymer molecules per molecule of a concomitantly used catalyst or initiator.SOLUTION: The provided method is a method for forming a copolymer including multiple regions or segments having differentiated polymer compositions or characteristics by polymerizing at least one type of addition-polymerizable monomer and comprises a step of contacting the addition-polymerizable monomer or a mixture of the corresponding monomers with a composition including at least one type of olefin polymerization catalyst, a cocatalyst, and a reversible chain shuttling agent under addition polymerization conditions so as to form at least several growable polymer chains in a state where two or more blocks or segments formed within at least several of the produced polymers can be chemically or physically discriminated under differentiated process conditions.
Abstract:
PROBLEM TO BE SOLVED: To provide: a composition for use in forming a multi-block copolymer produced in a continuous process without the need for sequential monomer addition, the copolymer containing two or more segments or blocks differing in chemical or physical properties; and a polymerization process using the same.SOLUTION: Provided are: an admixture or reaction product resulting from combining (A) a first olefin polymerization catalyst, (B) a second olefin polymerization catalyst capable of preparing polymers differing in chemical or physical properties from the polymer prepared by the catalyst (A) under equivalent polymerization conditions, and (C) a chain shuttling agent; and a polymerization process using the same.
Abstract:
PROBLEM TO BE SOLVED: To provide a polymerization process and the like that is capable of preparing copolymers having unique properties in a high-yield process adapted for commercial utilization.SOLUTION: This invention relates to a polymerization process and the resulting polymer composition, the process comprising a step of polymerizing one or more addition polymerizable monomers and a polymerizable shuttling agent in the presence of at least one addition polymerization catalyst comprising a metal compound or complex and a cocatalyst under conditions characterized by the formation of a branched polymer, preferably comprising pseudo-block molecular architecture.
Abstract:
PROBLEM TO BE SOLVED: To provide novel photoacid generators, and polymers having end groups derived from the compounds.SOLUTION: For example, a photoacid generator compound represented by the specified formula is disclosed. In the formula, TPS+ represents triphenylsulfonium cation. Also disclosed are a polymer having an end group including a reaction product of the compound of the formula, and a method of producing the polymer.
Abstract:
PROBLEM TO BE SOLVED: To provide an acrylate-based polymer which has narrow distributions of compositions and molecular weights and is excellent in resolution when used as a photoresist.SOLUTION: A polymer is produced using: unsaturated monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, a photoacid-generating monomer, or a combination comprising at least one of said monomers; anda dithioester compound represented in a simplified form by the specified formula (I) as a chain transfer agent for reversible addition fragmentation transfer polymerization (RAFT). (in the formula (I), Z is a y-valent Corganic group, L is a heteroatom or a single bond, and y is an integer between 1 and 6.) Also disclosed are a photoresist composition comprising the polymer, a coated substrate comprising a layer of the composition, and a method of forming an electronic device from the photoresist.
Abstract:
PROBLEM TO BE SOLVED: To provide a photoresist composition useful in forming a photolithographic pattern by a negative tone development process, a method for forming a photolithographic pattern, and a substrate coated with the photoresist composition.SOLUTION: The present invention relates to a photoresist composition and a photo lithography method allowing formation of a fine pattern by using a negative tone development process. The photoresist composition contains a copolymer formed from a monomer a part of which contains a certain acetal moiety. The preferred composition and method of the present invention provide reduction of thickness loss in photo lithography treatment and improvement of a pattern collapse margin. For the composition, the method and a coated substrate, special applicability has been found in manufacturing a semiconductor device.
Abstract:
Embodiments of this disclosure include polymers comprising the polymerized product of ethylene, at least one diene comonomer, and optionally at least one C3 to C14 comonomer. The polymer comprises tri -functional long-chain branches resulting from the diene that occur at a frequency of at least 0.03 per 1000 carbon atoms of the polymer. The diene has a structure according to formula (I):
Abstract:
Ethylene-based polymers of this disclosure include a melt viscosity ratio (V0.1/V100) at 190° C. of at least 10, where V0.1 is the viscosity of the ethylene-based polymer at 190° C. at a shear rate of 0.1 radians/second, and V100 is the viscosity of the ethylene-based polymer at 190° C. at a shear rate of 100 radians/second; and a molecular weight tail quantified by an MWD area metric, ATAIL, and ATAIL is less than or equal to 0.04 as determined by gel permeation chromatography using a triple detector.