公开(公告)号：US20200287082A1

公开(公告)日：2020-09-10

申请号：US16881344

申请日：2020-05-22

Applicant: EPISTAR CORPORATION

Inventor： Jing-Jie DAI ,  Tzu-Chieh HU

IPC: H01L33/14 ,  H01L33/32 ,  H01L33/06 ,  H01L33/30 ,  H01L33/00 ,  H01L33/04

Abstract: A semiconductor device includes: a first semiconductor layer; a second semiconductor layer including a first dopant of a first conductivity type and a second dopant of a second conductivity type, wherein the first dopant has a doping concentration, and the first conductivity type is different from the second conductivity type; a third semiconductor layer on the second semiconductor layer, wherein the third semiconductor layer includes a third dopant including a doping concentration higher than the doping concentration of the first dopant; and an active region between the first semiconductor layer and the second semiconductor layer; wherein the second semiconductor layer includes a bottom surface facing the active region, and the active region includes a top surface facing the second semiconductor layer, and a distance between the bottom surface of the second semiconductor layer and the top surface of the active region is not less than 2 nm.

公开(公告)号：US20190157511A1

公开(公告)日：2019-05-23

申请号：US16182849

申请日：2018-11-07

Applicant: EPISTAR CORPORATION

Inventor： Jing-Jie DAI ,  Tzu-Chieh HU

IPC: H01L33/32

Abstract: A semiconductor device includes: a first semiconductor layer; a second semiconductor layer including a first dopant of a first conductivity type and a second dopant of a second conductivity type, wherein the first dopant has a doping concentration, and the first conductivity type is different from the second conductivity type; a third semiconductor layer on the second semiconductor layer, wherein the third semiconductor layer includes a third dopant including a doping concentration higher than the doping concentration of the first dopant; and an active region between the first semiconductor layer and the second semiconductor layer; wherein the second semiconductor layer includes a bottom surface facing the active region, and the active region includes a top surface facing the second semiconductor layer, and a distance between the bottom surface of the second semiconductor layer and the top surface of the active region is not less than 2 nm.

公开(公告)号：US20230134581A1

公开(公告)日：2023-05-04

申请号：US17979563

申请日：2022-11-02

Applicant: EPISTAR CORPORATION

Inventor： Chia-Ming LIU ,  Chen OU ,  Jing-Jie DAI ,  Shih-Wei WANG ,  Chih-Ciao YANG ,  Feng-Wen HUANG ,  Dian-Ying HU ,  Yu-Hsiang YEH

IPC: H01L33/06 ,  H01L33/10 ,  H01L33/12 ,  H01L33/32 ,  H01L33/42 ,  H01L33/46 ,  H01L33/60

Abstract: A light-emitting device includes a first nitride semiconductor structure; a stress relief structure on the first nitride semiconductor structure including a plurality of narrow band gap layers and a plurality of wide band gap layers alternately stacked, wherein one of the plurality of wide band gap layers includes a plurality of wide band gap sub-layers and one of the plurality of wide band gap sub-layers includes aluminum; an active structure on the stress relief structure including a plurality of quantum well layers and a plurality of barrier layers alternately stacked, wherein one of the plurality of barrier layers includes a plurality of barrier sub-layers and one of the plurality of barrier sub-layers includes aluminum, an aluminum composition of the wide band gap sub-layer is greater than or equal to that of the barrier sub-layer, and an average aluminum composition of the wide band gap layer is greater than that of the barrier layer; and an electron blocking structure on the active structure.