公开(公告)号：BRPI0519714A2

公开(公告)日：2009-03-10

申请号：BRPI0519714

申请日：2005-12-21

Applicant: ESSILOR INT

Inventor： SILVA MARC ,  RIALL JAMES DAVID ,  PADIOU JEAN-MARC ,  QUERE LOIC

IPC: B24B13/01

Abstract: A polishing wheel (10) arranged to polish an article. The polishing wheel comprises a hub (12) provided with an axial cavity (18) coaxial with an axis (26). The polishing wheel further comprises a substrate layer (14) being made of an elastomer material affixed to the hub (12) and coaxial with the axis (26). The substrate layer (14) has an outer surface (20) having a substantially symmetrical shape with respect to the axis (26). The polishing wheel (10) further comprises a continuous cover layer (16) affixed to the outer surface (20) and coaxial with the axis (26). The continuous cover layer (16) is made of an elastomer material covering substantially entirely the outer surface (20).