METHOD AND APPARATUS FOR FABRICATING WAVEGUIDES AND WAVEGUIDES FABRICATED THEREFROM

    公开(公告)号:CA2494307C

    公开(公告)日:2012-02-07

    申请号:CA2494307

    申请日:2003-07-24

    Applicant: GEN ELECTRIC

    Abstract: A method for adaptively fabricating a waveguide (30) comprises: measuring misplacement of a photonic device (31, 32, 34) relative to a substrate (20); generating computer readable instructions for using a plurality of graphics primitives (16) to form the waveguide; and photocomposing the waveguide on the substrate in accordance with the computer readable instructions. A reticle (14) comprises a plurality of graphics primitives with at least one of the plurality of graphics primitives comprising a tapered end. A waveguide (30) comprises a plurality of waveguide segments (22) with each of the plurality of waveguide segments comprising a tapered end and being adjacent to at least one other of the plurality of waveguide segments.

    3.
    发明专利
    未知

    公开(公告)号:DE69620945T2

    公开(公告)日:2002-12-12

    申请号:DE69620945

    申请日:1996-05-20

    Applicant: GEN ELECTRIC

    Abstract: An adaptive method of providing electrical interconnections for a plurality of feed-through lines each having a respective end extending to at least one substrate surface includes generating an artwork representation for the electrical interconnections using specified feed-through line end positions on the at least one substrate surface. The at least one substrate surface may include a surface of a stack of substrates with at least two substrates having feed-through line ends facing a common direction. Actual positions of the at least two of the feed-through line ends are determined, and a scale factor is estimated using the determined actual positions. Actual positions of others of the feed-through line ends are estimated using the scale factor, and the artwork representation is modified to properly include electrical interconnections to ones of the feed-through line ends which are not in their specified positions. The artwork representation can be converted into a turn point polygon (TPP) format for effective data handling and modification of the artwork representation, and the TPP format can then be can be converted to a rectangular representation. A laser can be controlled in accordance with the rectangular representation of the modified artwork.

    SCALED ADAPTIVE LITHOGRAPHY
    4.
    发明专利

    公开(公告)号:CA2176880A1

    公开(公告)日:1996-12-01

    申请号:CA2176880

    申请日:1996-05-17

    Applicant: GEN ELECTRIC

    Abstract: An adaptive method of providing electrical interconnections for a plurality of feed-through lines each having a respective end extending to at least one substrate surface includes generating an artwork representation for the electrical interconnections using specified feedthrough line end positions on the at least one substrate surface. The at least one substrate surface may include a surface of a stack of substrates with at least two substrates having feed-through line ends facing a common direction. Actual positions of the at least two of the feedthrough line ends are determined, and a scale factor is estimated using the determined actual positions. Actual positions of others of the feed-through line ends are estimated using the scale factor and the artwork representation is modified to properly include electrical interconnections to ones of the feed-through line ends which are not in their specified positions. The artwork representation can be converted into a turn point polygon (TPP) format for effective data handling and modification of the artwork representation and the TPP format can then be can be converted to a rectangular representation. A laser can be controlled in accordance with the rectangular representation of the modified artwork.

    SCALED ADAPTIVE LITHOGRAPHY
    5.
    发明专利

    公开(公告)号:CA2176880C

    公开(公告)日:2007-11-13

    申请号:CA2176880

    申请日:1996-05-17

    Applicant: GEN ELECTRIC

    Abstract: An adaptive method of providing electrical interconnections for a plurality of feed-through lines each having a respective end extending to at least one substrate surface includes generating an artwork representation for the electrical interconnections using specified feed--through line end positions on the at least one substrate surface. The at least one substrate surface may include a surface of a stack of substrates with at least two substrates having feed-through line ends facing a common direction. Actual positions of the at least two of the feed--through line ends are determined, and a scale factor is estimated using the determined actual positions. Actual positions of others of the feed-through line ends are estimated using the scale factor, and the artwork representation is modified to properly include electrical interconnections to ones of the feed-through line ends which are not in their specified positions. The artwork representation can be converted into a turn point polygon (TPP) format for effective data handling and modification of the artwork representation, and the TPP format can then be can be converted to a rectangular representation. A laser can be controlled in accordance with the rectangular representation of the modified artwork.

    METHOD AND APPARATUS FOR FABRICATING WAVEGUIDES AND WAVEGUIDES FABRICATED THEREFROM

    公开(公告)号:AU2003259224A1

    公开(公告)日:2004-02-16

    申请号:AU2003259224

    申请日:2003-07-24

    Applicant: GEN ELECTRIC

    Abstract: A method for adaptively fabricating a waveguide comprises: measuring misplacement of a photonic device relative to a substrate; generating computer readable instructions for using a plurality of graphics primitives to form the waveguide; and photocomposing the waveguide on the substrate in accordance with the computer readable instructions. A reticle comprises a plurality of graphics primitives with at least one of the plurality of graphics primitives comprising a tapered end. A waveguide comprises a plurality of waveguide segments with each of the plurality of waveguide segments comprising a tapered end and being adjacent to at least one other of the plurality of waveguide segments.

    7.
    发明专利
    未知

    公开(公告)号:DE60324813D1

    公开(公告)日:2009-01-02

    申请号:DE60324813

    申请日:2003-07-24

    Applicant: GEN ELECTRIC

    Abstract: A method for adaptively fabricating a waveguide comprises: measuring misplacement of a photonic device relative to a substrate; generating computer readable instructions for using a plurality of graphics primitives to form the waveguide; and photocomposing the waveguide on the substrate in accordance with the computer readable instructions. A reticle comprises a plurality of graphics primitives with at least one of the plurality of graphics primitives comprising a tapered end. A waveguide comprises a plurality of waveguide segments with each of the plurality of waveguide segments comprising a tapered end and being adjacent to at least one other of the plurality of waveguide segments.

    METHOD AND APPARATUS FOR FABRICATING WAVEGUIDES AND WAVEGUIDES FABRICATED THEREFROM

    公开(公告)号:CA2494307A1

    公开(公告)日:2004-02-05

    申请号:CA2494307

    申请日:2003-07-24

    Applicant: GEN ELECTRIC

    Abstract: A method for adaptively fabricating a waveguide (30) comprises: measuring misplacement of a photonic device (31, 32, 34) relative to a substrate (20); generating computer readable instructions for using a plurality of graphics primitives (16) to form the waveguide; and photocomposing the waveguide on t he substrate in accordance with the computer readable instructions. A reticle (14) comprises a plurality of graphics primitives with at least one of the plurality of graphics primitives comprising a tapered end. A waveguide (30) comprises a plurality of waveguide segments (22) with each of the plurality of waveguide segments comprising a tapered end and being adjacent to at least o ne other of the plurality of waveguide segments.

    9.
    发明专利
    未知

    公开(公告)号:DE69620945D1

    公开(公告)日:2002-06-06

    申请号:DE69620945

    申请日:1996-05-20

    Applicant: GEN ELECTRIC

    Abstract: An adaptive method of providing electrical interconnections for a plurality of feed-through lines each having a respective end extending to at least one substrate surface includes generating an artwork representation for the electrical interconnections using specified feed-through line end positions on the at least one substrate surface. The at least one substrate surface may include a surface of a stack of substrates with at least two substrates having feed-through line ends facing a common direction. Actual positions of the at least two of the feed-through line ends are determined, and a scale factor is estimated using the determined actual positions. Actual positions of others of the feed-through line ends are estimated using the scale factor, and the artwork representation is modified to properly include electrical interconnections to ones of the feed-through line ends which are not in their specified positions. The artwork representation can be converted into a turn point polygon (TPP) format for effective data handling and modification of the artwork representation, and the TPP format can then be can be converted to a rectangular representation. A laser can be controlled in accordance with the rectangular representation of the modified artwork.

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