公开(公告)号：WO2010077659A3

公开(公告)日：2010-09-10

申请号：PCT/US2009067149

申请日：2009-12-08

Applicant: GEN PLASMA INC ,  MADOCKS JOHN

Inventor： MADOCKS JOHN

IPC: H01J37/317 ,  H01J37/08

CPC classification number: H01J37/08 ,  H01J27/143 ,  H01J37/3053 ,  H01J37/317 ,  H01J37/32862 ,  H01J37/3405 ,  H01J2237/081

Abstract: A process for modifying a surface of a substrate is provided that includes supplying electrons to an electrically isolated anode electrode of a closed drift ion source. The anode electrode has an anode electrode charge bias that is positive while other components of the closed drift ion source are electrically grounded or support an electrical float voltage. The electrons encounter a closed drift magnetic field that induces ion formation. Anode contamination is prevented by switching the electrode charge bias to negative in the presence of a gas, a plasma is generated proximal to the anode electrode to clean deposited contaminants from the anode electrode. The electrode charge bias is then returned to positive in the presence of a repeat electron source to induce repeat ion formation to again modify the surface of the substrate. An apparatus for modification of a surface of a substrate by this process is provided.

Abstract translation: 提供了用于修改衬底的表面的工艺，其包括将电子供应到闭合漂移离子源的电绝缘阳极电极。 阳极电极具有正的阳极电荷偏压，而闭合的漂移离子源的其他部件电接地或支持电浮动电压。 电子遇到诱导离子形成的闭合漂移磁场。 通过在存在气体的情况下将电极充电偏压切换至负极来防止阳极污染，在阳极电极附近产生等离子体以从阳极电极清除沉积的污染物。 然后在存在重复电子源的情况下将电极电荷偏置返回到正值以诱导重复离子形成以再次改变衬底的表面。 提供了一种通过该过程来修改基板表面的设备。

公开(公告)号：WO2011056581A3

公开(公告)日：2011-09-09

申请号：PCT/US2010054111

申请日：2010-10-26

Applicant: GEN PLASMA INC ,  MADOCKS JOHN ,  MORSE PATRICK LAWRENCE

Inventor： MADOCKS JOHN ,  MORSE PATRICK LAWRENCE

IPC: C23C14/35 ,  C23C14/14 ,  C23C14/34

CPC classification number: C23C14/54 ,  C23C14/3407 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/342 ,  H01J37/3452 ,  H01J37/3482 ,  H01J2237/24585 ,  H01J2237/332

Abstract: An apparatus for coating a substrate is provided that includes a racetrack- shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.

Abstract translation: 提供了一种用于涂覆基底的装置，其包括具有两个直线部分的跑道形等离子体源和连接所述直线部分的至少一个终端周转部分。 由形成涂层组分的目标材料形成的管状目标具有一端。 目标在等离子体源附近用于目标材料的溅射。 目标被固定到管状背衬阴极，两者都可围绕中心轴线旋转。 一组磁体布置在阴极内部，以便当靶被用于将涂层沉积在基底上时，将与端子周转的侵蚀区域朝向靶的端部移动。 目标利用率达到初始目标重量的87％（重量）。

公开(公告)号：WO2011029096A3

公开(公告)日：2011-05-05

申请号：PCT/US2010047994

申请日：2010-09-07

Applicant: GEN PLASMA INC ,  MADOCKS JOHN

Inventor： MADOCKS JOHN

IPC: C23C16/50 ,  C23C16/455 ,  C23C16/458

CPC classification number: C23C16/448 ,  C23C16/45514 ,  C23C16/50 ,  H01J37/3408 ,  H01J37/3485

Abstract: PECVD apparatus for depositing material onto a moving substrate is provided comprising a process chamber, a precursor gas inlet to the process chamber, a pumped outlet, and a plasma source disposed within the process chamber. The plasma source produces one or more negative glow regions and one or more positive columns. At least one positive column is disposed toward the substrate. The plasma source and precursor gas inlet are disposed relative to each other and the substrate such that the precursor gas is injected into the positive column adjacent the substrate. Apparatus is provided to channel the precursor gas into the positive column away from the negative glow region.

Abstract translation: 提供用于将材料沉积到移动基板上的PECVD设备，其包括处理室，处理室的前体气体入口，泵送出口和布置在处理室内的等离子体源。 等离子体源产生一个或多个负辉光区域和一个或多个正柱。 至少一个正极柱朝向基板设置。 等离子体源和前体气体入口相对于彼此和衬底布置，使得前体气体被注入到邻近衬底的正柱中。 提供装置以将前体气体引导到阳极柱中远离负辉光区。

公开(公告)号：WO2011017314A3

公开(公告)日：2011-06-09

申请号：PCT/US2010044235

申请日：2010-08-03

Applicant: GEN PLASMA INC ,  MADOCKS JOHN

Inventor： MADOCKS JOHN

IPC: H01J37/08 ,  H05H1/02

CPC classification number: H01J37/08 ,  H01J27/143 ,  H01J37/30 ,  H01J2237/061

Abstract: A closed drift ion source is provided comprising a single magnetic source, a first pole and a second pole. The ends of the first and second poles are separated by a gap. The magnetic source is disposed proximate to one of the first pole and second pole. A first magnetic path is provided between one magnetic pole of the single magnetic source and the end of the first pole. A second magnetic path is provided between the other magnetic pole of the single magnetic source and the end of the second pole. The first and second magnetic paths are selectively constructed to produce a symmetrical magnetic field in the gap.

Abstract translation: 提供闭合漂移离子源，其包括单个磁源，第一极和第二极。 第一和第二极的端部被间隙隔开。 磁源靠近第一极和第二极中的一个设置。 第一磁路设置在单个磁源的一个磁极和第一极的端部之间。 第二磁路设置在单个磁源的另一个磁极和第二极的末端之间。 第一和第二磁路被选择性地构造成在间隙中产生对称的磁场。

公开(公告)号：WO2015085283A8

公开(公告)日：2015-09-03

申请号：PCT/US2014068966

申请日：2014-12-06

Applicant: GEN PLASMA INC ,  NGO PHONG ,  MADOCKS JOHN

Inventor： NGO PHONG ,  MADOCKS JOHN

IPC: B05D5/06 ,  B05D5/00

CPC classification number: G02B1/115

Abstract: A coated substrate in accordance with a particular embodiment includes a base substrate and an anti-reflective coating having at least six chemically deposited layers on the base substrate. At least a 15 cm2 region of the anti-reflective coating is continuous has an optical thickness variation of not more than 3% over a maximum dimension of the region. The anti-reflective coating, at the region, has an average reflectance of not more than 1% for normal incident visible light, an average nanoindentation hardness of at least 9 GPa, and a reflectance color at incident angles within a range from -45° to 45° having both a* and b* in CIELAB color space within a range from -2.0 to 2.0. The layers include S13N4 high-refractive-index layers interspersed with S1O2 low-refractive-index layers. The coated substrate overlies display circuitry within a housing of an electronic device, such as a mobile phone.

Abstract translation: 根据特定实施例的涂覆的基底包括基底基底和在基底基底上具有至少六个化学沉积层的抗反射涂层。 抗反射涂层的至少15cm 2区域是连续的，在该区域的最大尺寸上具有不超过3％的光学厚度变化。 在该区域的抗反射涂层对于正常入射的可见光的平均反射率为不大于1％，平均纳米压痕硬度为至少9GPa，入射角的反射率颜色为-45° 在CIELAB颜色空间中的a *和b *在-2.0至2.0的范围内的45°。 这些层包括散布有S1O 2低折射率层的S13N4高折射率层。 涂覆的基底覆盖在诸如移动电话的电子设备的壳体内的显示电路。

公开(公告)号：WO2010063027A3

公开(公告)日：2010-08-26

申请号：PCT/US2009066108

申请日：2009-11-30

Applicant: GEN PLASMA INC ,  MADOCKS JOHN ,  CAMUS CURTIS CHARLES ,  MARCUS PATRICK

Inventor： MADOCKS JOHN ,  CAMUS CURTIS CHARLES ,  MARCUS PATRICK

IPC: H02M7/04 ,  H02M7/48

CPC classification number: H02M5/297

Abstract: A process for powering an electrical load includes applying a rectified alternating current waveform across the load for a first time period with only a single power supply for at least two half cycles. At least one half cycle of an alternating current waveform of opposite polarity are then applied relative to the rectified alternating current waveform across the load for a second time period. Rectified alternating current waveform is then again applied across the load for at least two half cycles for a third time period to power the electrical load. The rectified alternating current waveform can be applied a direct current offset. A power supply is provided for provided power across the load according to this process.

Abstract translation: 用于为电负载供电的过程包括在仅有单个电源的第一时间段内在整个负载上施加整流的交流电波形至少两个半周期。 然后在第二时间段内相对于整流负载上的经整流的交流电波形施加相反极性的交流电波形的至少一个半周期。 然后在整个负载上再次施加整流交流电波形至少两个半周期第三时间周期以为电力负载供电。 整流的交流电流波形可以施加直流偏移。 根据这个过程提供电源以提供跨过负载的电力。

公开(公告)号：EP2473650A4

公开(公告)日：2015-09-02

申请号：EP10814629

申请日：2010-09-07

Applicant: GEN PLASMA INC

Inventor： MADOCKS JOHN

IPC: C23C16/50 ,  C23C16/448 ,  C23C16/455 ,  C23C16/458 ,  H01J37/34

CPC classification number: C23C16/448 ,  C23C16/45514 ,  C23C16/50 ,  H01J37/3408 ,  H01J37/3485

公开(公告)号：EP2014142A4

公开(公告)日：2010-10-27

申请号：EP07755772

申请日：2007-04-19

Applicant: GEN PLASMA INC

Inventor： MADOCKS JOHN

IPC: H05H1/46 ,  C23C14/32 ,  C23C16/513

CPC classification number: H05H1/46 ,  C23C14/32 ,  C23C16/513 ,  H01J37/3266

公开(公告)号：EP2368257A4

公开(公告)日：2016-03-09

申请号：EP09836710

申请日：2009-12-08

Applicant: GEN PLASMA INC

Inventor： MADOCKS JOHN

IPC: H01J27/14 ,  H01J37/08 ,  H01J37/305 ,  H01J37/317 ,  H01J37/32 ,  H01J37/34

CPC classification number: H01J37/08 ,  H01J27/143 ,  H01J37/3053 ,  H01J37/317 ,  H01J37/32862 ,  H01J37/3405 ,  H01J2237/081

公开(公告)号：AT496388T

公开(公告)日：2011-02-15

申请号：AT02764187

申请日：2002-04-10

Applicant: GEN PLASMA INC

Inventor： MADOCKS JOHN

IPC: H01J27/00 ,  H05H1/24 ,  C23C14/28 ,  C23C14/30 ,  C23C14/35 ,  C23C16/50 ,  C23C16/503 ,  C23C16/505 ,  C23C16/54 ,  C23F4/00 ,  H01J37/32 ,  H01J49/42 ,  H01L21/205 ,  H01L21/3065 ,  H05H1/14 ,  H05H1/46

Abstract: The preferred embodiments described herein provide a magnetic mirror plasma source. While the traditional magnetic/electrostatic confinement method is ideal for many applications, some processes are not best served with this arrangement. The preferred embodiments described herein present a new technique to confine electrons ( 3 ) to produce a low pressure, dense plasma directly on a substrate surface ( 75 ). With these preferred embodiments, a combination of electrostatic and mirror magnetic confinement is implemented. The result is a novel plasma source that has unique and important advantages enabling advancements in PECVD, etching, and plasma treatment processes.