ARRAY OF GRADUATED PRE-TILTED MEMS MIRRORS
    1.
    发明申请
    ARRAY OF GRADUATED PRE-TILTED MEMS MIRRORS 审中-公开
    梯度预倾斜MEMS镜面阵列

    公开(公告)号:WO2008070764A2

    公开(公告)日:2008-06-12

    申请号:PCT/US2007/086616

    申请日:2007-12-06

    CPC classification number: G02B6/3556 G02B6/357 G02B26/0841

    Abstract: An array of MEMS devices is formed on a planar substrate having in each of a plurality of annular regions or sectors a plurality of MEMS mirrors of substantially identical structure, wherein the MEMS mirrors in each region have an identical pre-tilt. The pre-tilt is achieved by embedding each dual-axis tiltable mirror within a pre-tilted microplatform or gimbal. In a specific embodiment, one microplatform of a preselected pre-tilt is provided for each micromirror and an underlying electrode is provided having a shape conforming with the pre-tilt. In a specific embodiment, the annular regions are contiguous elliptical or ovoidal regions. By pre-tilt, it is meant that the rest state or nonactuated state of the micro-mirror is such that a reflected beam from a fixed source is directed to the center of a target array.

    Abstract translation: 在平面衬底上形成MEMS器件阵列,该平面衬底在多个环形区域或扇区中的每一个中具有基本上相同结构的多个MEMS反射镜,其中每个区域中的MEMS反射镜具有相同的 预倾斜。 通过将每个双轴可倾斜反射镜嵌入预倾斜微平台或万向节内来实现预倾斜。 在特定实施例中,为每个微镜提供预选预倾斜的一个微平台,并且提供具有与预倾斜一致的形状的下电极。 在一个具体实施例中,环形区域是连续的椭圆形或卵形区域。 通过预倾斜,意味着微镜的静止状态或非启动状态使得来自固定源的反射光束被引导至目标阵列的中心。

    METHOD AND APPARATUS FOR LOCALIZED BONDING
    2.
    发明申请
    METHOD AND APPARATUS FOR LOCALIZED BONDING 审中-公开
    用于局部结合的方法和设备

    公开(公告)号:WO2008061101A2

    公开(公告)日:2008-05-22

    申请号:PCT/US2007/084575

    申请日:2007-11-13

    Abstract: One or more cavities are formed in the bonding surfaces of one, all, or some of the elements to be bonded. These cavities serve as receptacles for the bonding material and are where the bonds are localized. The cavities are of sufficient size and shape so that their volume is greater than the volume of bonding material forming the bond. This ensures that when the elements are brought into contact with one another to mate, the bonding material, which can flow prior to solidifying into a bond, will flow into the cavities and will not impede the separation of the parts. This allows the parts to be mated with nominally zero separation. Once solidified, the bonding material forms a localized bond inside each cavity. Different cavity shapes, such as, rectangular, circular, or any other shape that can be injected or filled with adhesive material may be used.

    Abstract translation: 一个或多个空腔形成在待粘合的一个,全部或一些元件的粘合表面中。 这些空腔用作结合材料的容器并且是结合部位的位置。 腔体具有足够的尺寸和形状,使得它们的体积大于形成结合的结合材料的体积。 这确保了当元件彼此接触以配合时,在凝固成结合之前可以流动的结合材料将流入空腔并且不会阻止部件的分离。 这允许零件与名义上的零分离配合。 一旦固化,结合材料在每个腔内形成局部结合。 可以使用不同的空腔形状,例如矩形,圆形或可以注入或填充有粘合材料的任何其他形状。

    CHARGING GUARD WITH PASCHEN STACKING
    3.
    发明申请
    CHARGING GUARD WITH PASCHEN STACKING 审中-公开
    充电警卫与帕斯坦堆叠

    公开(公告)号:WO2008061097A2

    公开(公告)日:2008-05-22

    申请号:PCT/US2007/084568

    申请日:2007-11-13

    CPC classification number: G02B26/0841

    Abstract: A MEMS-based mirror is provided with trenches between adjacent electrodes in order to be able to withstand relatively high applied voltages, and thus has a substantially reduced exposure to uncontrolled surface potentials. The MEMS-based mirror, thus avoids voltage drifts and has an improved mirror position stability. The trench dimensions are selected such that the voltage applied between each adjacent pair of electrodes stays within predefined limits. An insulating layer, such as silicon dioxide, electrically isolates each pair of adjacent electrodes. Each insulting layer extends partially above an associated trench and is characterized by the same height and width dimensions.

    Abstract translation: 基于MEMS的反射镜在相邻电极之间设置有沟槽,以便能够承受相对较高的施加电压,并且因此显着降低了暴露于不受控制的表面电位。 基于MEMS的反射镜可避免电压漂移,并具有改进的反射镜位置稳定性。 选择沟槽尺寸,使得在每个相邻电极对之间施加的电压保持在预定限度内。 诸如二氧化硅的绝缘层将每对相邻的电极电隔离。 每个绝缘层部分地延伸到相关沟槽的上方,并且具有相同的高度和宽度尺寸。

    MEMS STRUCTURE WITH RAISED ELECTRODES
    4.
    发明申请
    MEMS STRUCTURE WITH RAISED ELECTRODES 审中-公开
    具有电极的MEMS结构

    公开(公告)号:WO2005047954A1

    公开(公告)日:2005-05-26

    申请号:PCT/US2004/007192

    申请日:2004-03-08

    CPC classification number: G02B26/0841 B81B3/0086 B81B2201/042

    Abstract: In an electrostatically controlled deflection apparatus, such as a MEMS array having cavities formed around electrodes and which is mounted directly on a dielectric or controllably resistive substrate in which are embedded electrostatic actuation electrodes disposed in alignment with the individual MEMS elements, a mechanism is provided to mitigate the effects of uncontrolled dielectric surface potentials between the MEMS elements and the electrostatic actuation electrodes, the mechanism being raised electrodes relative to the dielectric or controllably resistive surface of the substrate. The aspect ratio of the gaps between elements (element height to element separation ratio) is at least 0.1 and preferably at least 0.5 and preferably between 0.75 and 2.0 with a typical choice of about 1.0, assuming a surface fill factor of 50% or greater. Higher aspect ratios at these fill factors are believed not to provide more than marginal improvement.

    Abstract translation: 在静电控制的偏转装置中,例如具有围绕电极形成的空腔的MEMS阵列,其直接安装在电介质或可控电阻衬底上,其中嵌入的静电致动电极与各个MEMS元件对准设置, 减轻MEMS元件和静电致动电极之间不受控制的电介质表面电位的影响,该机构是相对于衬底的电介质或可控电阻表面升高的电极。 假设表面填充因子为50%以上,元件之间的间隙(元件高度与元件分离比)的纵横比为至少0.1,优选为至少0.5,优选为0.75至2.0,典型选择为约1.0。 这些填充因子的较高纵横比被认为不能提供更多的边际改进。

    MEMS STRUCTURE WITH MECHANICAL OVERDEFLECTION LIMITER
    5.
    发明申请
    MEMS STRUCTURE WITH MECHANICAL OVERDEFLECTION LIMITER 审中-公开
    MEMS结构与机械超选择限制

    公开(公告)号:WO2004003619A1

    公开(公告)日:2004-01-08

    申请号:PCT/US2003/020143

    申请日:2003-06-24

    CPC classification number: B81B3/0051 B81B2201/042 G02B26/0841

    Abstract: A mirror (12) is mounted on a first pair of hinges (14, 16) to a gimble (18). The gimble (18) is connected by a second pair of hinges (20, 21) having one degree of freedom to a frame (24) wherein an oxide layer (25) is provided for bonding and etch stop during manufacturing.

    Abstract translation: 一个反射镜(12)安装在第一对铰链(14,16)上到一个柔性件(18)上。 弹性件(18)通过具有一个自由度的第二对铰链(20,21)连接到框架(24),其中提供氧化物层(25)用于在制造期间进行接合和蚀刻停止。

    MEMS STRUCTURE WITH SURFACE POTENTIAL CONTROL

    公开(公告)号:WO2003031316A3

    公开(公告)日:2003-04-17

    申请号:PCT/US2002/023418

    申请日:2002-07-22

    Abstract: In an electrostatically controlled apparatus (fig.1), such as a MEMS array (10) having cavities (44, 46, 48) formed around electrodes and which is mounted directly on a dielectric substrate (24) in which are embedded electrostatic actuation electrodes (26, 27) disposed in alignment with the individual MEMS elements, a mechanism is provided to controllably neutralize excess charge and establish a controlled potential between the MEMS elements and the electrostatic actuation electrodes.

    SILICON ON INSULATOR STANDOFF AND METHOD FOR MANUFACTURE THEREOF
    9.
    发明申请
    SILICON ON INSULATOR STANDOFF AND METHOD FOR MANUFACTURE THEREOF 审中-公开
    绝缘子硅绝缘子及其制造方法

    公开(公告)号:WO2003090261A1

    公开(公告)日:2003-10-30

    申请号:PCT/US2003/012311

    申请日:2003-04-21

    Abstract: Method for fabricating ultrathin gaps producing ultrashort standoffs (26) in array structures includes sandwiching a patterned device layer (12) between a silicon standoff layer (26) and a silicon support layer (38), providing that the back surfaces (46, 48) of the respective silicon support layer and the standoff layer are polished to a desired thickness corresponding to the desired standoff height on one side and to at least a minimum height for mechanical strength on the opposing side, as well as to a desired smoothness. Standoffs and mechanical supports are then fabricated by etching to produce voids with the dielectric oxides (20, 40) on both sides of the device layer serving as suitable etch stops. Thereafter, the exposed portions of the oxide layers are removed to release the pattern, and a package layer is mated with the standoff voids to produce a finished device. The standoff layer can be fabricated to counteract curvature.

    Abstract translation: 用于制造在阵列结构中产生超短距离(26)的超薄间隙的方法包括在硅间隔层(26)和硅支撑层(38)之间夹着图案化的器件层(12),只要后表面(46,48) 将相应的硅支撑层和支座层抛光到对应于一侧上所需的间隔高度的期望厚度,并且至少在相对侧上的机械强度的最小高度以及期望的平滑度。 然后通过蚀刻制造支座和机械支撑件以产生空隙,其中装置层两侧的电介质氧化物(20,40)用作合适的蚀刻停止点。 此后,去除氧化物层的暴露部分以释放图案,并且将封装层与间隙空隙配合以产生成品装置。 可以制造隔离层以抵消曲率。

    METHOD AND APPARATUS FOR ACTUATION OF A TWO-AXIS MEMS DEVICE USING THREE ACTUATION ELEMENTS
    10.
    发明申请
    METHOD AND APPARATUS FOR ACTUATION OF A TWO-AXIS MEMS DEVICE USING THREE ACTUATION ELEMENTS 审中-公开
    使用三个启动元件来实现双轴MEMS器件的方法和装置

    公开(公告)号:WO2003076977A2

    公开(公告)日:2003-09-18

    申请号:PCT/US2003/006512

    申请日:2003-03-03

    IPC: G02B

    CPC classification number: G02B26/0833

    Abstract: Apparatus and methods are provided for driving a two-axis MEMS mirror using three non-contact actuation elements or electrodes. A differential bi-directional mirror control uses unipolar drive voltages biased at a suitable value. Transformation functions map two-axis tip-tilt commands to three actuation drive signals for selected electrode orientations and sizes.

    Abstract translation: 提供了用于使用三个非接触致动元件或电极驱动双轴MEMS镜的装置和方法。 差分双向镜控制使用以适当值偏置的单极驱动电压。 转换功能将两轴尖端倾斜命令映射到三个驱动驱动信号,以选择电极方向和尺寸。

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