公开(公告)号：WO2003012811A1

公开(公告)日：2003-02-13

申请号：PCT/US2002/023424

申请日：2002-07-22

Applicant: GLIMMERGLASS NETWORKS, INC.

Inventor： STAKER, Bryan, P. ,  TEETER, Douglas, L., Jr. ,  DeBEY, Thomas, A. ,  AMM, David, T.

IPC: H01H57/00

CPC classification number: H01H59/0009

Abstract: An array apparatus has a micromachined SOI structure (22), such as a MEMS array, mounted directly on a class of substrate (24), such as low temperature co-fired ceramic, in which is embedded electrostatic actuation electrodes (26-29) disposed in substantial alignment with the individual MEMS elements, where the electrostatic electrodes (26-29) are configured for substantial fanout and the electrodes (26-29) are oversized such that in combination with the ceramic assembly are configured to allow for placement of the vias (36-37) within a tolerance of position relative to electrodes (26-29) such that contact is not lost therebetween at the time of manufacturing.

Abstract translation: 阵列装置具有微机械加工的SOI结构（例如MEMS阵列），其直接安装在诸如低温共烧陶瓷之类的基底（24）上，其中嵌有静电致动电极（26-29） 设置成与各个MEMS元件基本上对准，其中静电电极（26-29）被配置为实质上扇出，并且电极（26-29）被加大尺寸，使得与陶瓷组件组合以允许放置 通孔（36-37）在相对于电极（26-29）的位置的公差范围内，使得在制造时不会发生接触。

公开(公告)号：WO2003012171A1

公开(公告)日：2003-02-13

申请号：PCT/US2002/023421

申请日：2002-07-22

Applicant: GLIMMERGLASS NETWORKS, INC.

Inventor： STAKER, Bryan, P. ,  TEETER JR., Douglas, L. ,  AMM, David, T.

IPC: C25B9/00

CPC classification number: B81B3/0086 ,  B81B2201/042

Abstract: In an array apparatus, each MEMS element, comprising an actuatable element and a supportive handle, is mounted over a plurality of electrodes (26, 27) wherein an air gap is controlled by the thickness of the electrodes and not primarily by the structure of the handle (20). The structure of electrostatic actuation electrodes in specific embodiments is disclosed. While the invention is primarily a technique for reducing the air gap (52) without unduly limiting the thickness of the handle, the invention may also be used to establish an air gap greater than the thickness of the handle.

Abstract translation: 在阵列装置中，包括可致动元件和支撑手柄的每个MEMS元件安装在多个电极（26,27）上，其中气隙由电极的厚度控制，而不主要由电极的结构 手柄（20）。 在具体实施例中公开了静电致动电极的结构。 尽管本发明主要是用于减小气隙（52）而不过度地限制手柄厚度的技术，但是本发明也可用于建立大于手柄厚度的气隙。

公开(公告)号：WO2008070764A2

公开(公告)日：2008-06-12

申请号：PCT/US2007/086616

申请日：2007-12-06

Applicant: GLIMMERGLASS NETWORKS, INC. ,  STAKER, Bryan, P. ,  FERNANDEZ, Andres ,  KINDWALL, Alexander, P. ,  OWENS, Windsor, E.

Inventor： STAKER, Bryan, P. ,  FERNANDEZ, Andres ,  KINDWALL, Alexander, P. ,  OWENS, Windsor, E.

CPC classification number: G02B6/3556 ,  G02B6/357 ,  G02B26/0841

Abstract: An array of MEMS devices is formed on a planar substrate having in each of a plurality of annular regions or sectors a plurality of MEMS mirrors of substantially identical structure, wherein the MEMS mirrors in each region have an identical pre-tilt. The pre-tilt is achieved by embedding each dual-axis tiltable mirror within a pre-tilted microplatform or gimbal. In a specific embodiment, one microplatform of a preselected pre-tilt is provided for each micromirror and an underlying electrode is provided having a shape conforming with the pre-tilt. In a specific embodiment, the annular regions are contiguous elliptical or ovoidal regions. By pre-tilt, it is meant that the rest state or nonactuated state of the micro-mirror is such that a reflected beam from a fixed source is directed to the center of a target array.

Abstract translation: 在平面衬底上形成MEMS器件阵列，该平面衬底在多个环形区域或扇区中的每一个中具有基本上相同结构的多个MEMS反射镜，其中每个区域中的MEMS反射镜具有相同的 预倾斜。 通过将每个双轴可倾斜反射镜嵌入预倾斜微平台或万向节内来实现预倾斜。 在特定实施例中，为每个微镜提供预选预倾斜的一个微平台，并且提供具有与预倾斜一致的形状的下电极。 在一个具体实施例中，环形区域是连续的椭圆形或卵形区域。 通过预倾斜，意味着微镜的静止状态或非启动状态使得来自固定源的反射光束被引导至目标阵列的中心。

公开(公告)号：WO2004036259A2

公开(公告)日：2004-04-29

申请号：PCT/US2003/031811

申请日：2003-10-07

Applicant: GLIMMERGLASS NETWORKS, INC.

Inventor： STAKER, Bryan, P. ,  CAMPBELL, Eugene, W. ,  PAX, Paul, H.

IPC: G02B

CPC classification number: G02B6/3508 ,  G02B6/3556 ,  G02B6/357

Abstract: In a folded three-dimensional free-space optical switch including a set of fibers and an optical system for producing collimated beamlets aligned to intersect an array of dual axis micromirrors of coplanar input and output mirror elements, and a folding mirror, the input and output micromirrors are arranged in a pattern wherein either the input or output mirror set is disposed along an annulus and wherein the complementary output or input mirror set is disposed within the annulus in order to globally minimize maximum tilt angles for a two-dimensional locus of tilt angles of the micromirror set. The beamlets are routed from assigned input fibers to corresponding input moveable mirrors to assigned output fibers via the static folding mirror and corresponding output moveable mirrors.

Abstract translation: 在包括一组光纤的折叠的三维自由空间光学开关和用于产生准直的子束的光学系统的光学系统中，所述准直子束被对齐以与共面输入和输出反射镜元件的双轴微镜阵列和折叠镜相交，所述输入和输出 微镜以其中输入或输出反射镜组沿着环形布置的图案布置，并且其中互补输出或输入反射镜组设置在环形空间内，以便全局地最小化倾斜角度的二维轨迹的最大倾斜角度 的微镜组。 子束从分配的输入光纤路由到相应的输入可移动反射镜，经由静态折叠镜和相应的输出可移动反射镜分配给输出光纤。

公开(公告)号：WO2003032402A1

公开(公告)日：2003-04-17

申请号：PCT/US2002/032400

申请日：2002-10-08

Applicant: GLIMMERGLASS NETWORKS, INC.

Inventor： STAKER, Bryan, P. ,  TEETER, Douglas, L., Jr. ,  FERNANDEZ, Andres ,  AMM, David, T.

IPC: H01L29/82

CPC classification number: B81B3/0086

Abstract: A structure of a hybrid MEMS structure is provided wherein a plate comprises a thin actuatable layer of conductive silicon, such as a MEMS actuatable element, and a thicker handle layer of conductive silicon to provide structural integrity which are separated by a thin oxide, together forming an SOI wafer. This plate is mounted to a substrate, typically ceramic, with the thin actuatable layer facing the substrate and separated by an air gap that is formed by creating, on the substrate, insulator standoffs which come in contact with the plate. A suitable dielectric material useful as a standoff on the substrate is a footrest that permits high aspect ratios.

Abstract translation: 提供了混合MEMS结构的结构，其中板包括导电硅的薄可致动层，例如MEMS可致动元件，以及较厚的导电硅手柄层，以提供由薄氧化物隔开的结构完整性，一起形成 SOI晶片。 该板被安装到通常为陶瓷的基板上，薄的可致动层面向基板，并由通过在基板上产生与板接触的绝缘体间隙而形成的气隙分开。 用作衬底上的支座的合适的介电材料是允许高纵横比的搁脚板。

公开(公告)号：WO2005047954A1

公开(公告)日：2005-05-26

申请号：PCT/US2004/007192

申请日：2004-03-08

Applicant: GLIMMERGLASS NETWORKS INC. ,  STAKER, Bryan, P. ,  MURAY, Lawrence, P. ,  FERNANDEZ, Andres

Inventor： STAKER, Bryan, P. ,  MURAY, Lawrence, P. ,  FERNANDEZ, Andres

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  B81B3/0086 ,  B81B2201/042

Abstract: In an electrostatically controlled deflection apparatus, such as a MEMS array having cavities formed around electrodes and which is mounted directly on a dielectric or controllably resistive substrate in which are embedded electrostatic actuation electrodes disposed in alignment with the individual MEMS elements, a mechanism is provided to mitigate the effects of uncontrolled dielectric surface potentials between the MEMS elements and the electrostatic actuation electrodes, the mechanism being raised electrodes relative to the dielectric or controllably resistive surface of the substrate. The aspect ratio of the gaps between elements (element height to element separation ratio) is at least 0.1 and preferably at least 0.5 and preferably between 0.75 and 2.0 with a typical choice of about 1.0, assuming a surface fill factor of 50% or greater. Higher aspect ratios at these fill factors are believed not to provide more than marginal improvement.

Abstract translation: 在静电控制的偏转装置中，例如具有围绕电极形成的空腔的MEMS阵列，其直接安装在电介质或可控电阻衬底上，其中嵌入的静电致动电极与各个MEMS元件对准设置， 减轻MEMS元件和静电致动电极之间不受控制的电介质表面电位的影响，该机构是相对于衬底的电介质或可控电阻表面升高的电极。 假设表面填充因子为50％以上，元件之间的间隙（元件高度与元件分离比）的纵横比为至少0.1，优选为至少0.5，优选为0.75至2.0，典型选择为约1.0。 这些填充因子的较高纵横比被认为不能提供更多的边际改进。

公开(公告)号：WO2004003619A1

公开(公告)日：2004-01-08

申请号：PCT/US2003/020143

申请日：2003-06-24

Applicant: GLIMMERGLASS NETWORKS, INC.

Inventor： STAKER, Bryan, P. ,  SPALLAS, James, P. ,  MURAY, Lawrence, P. ,  FERNANDEZ, Andres

IPC: G02B7/182

CPC classification number: B81B3/0051 ,  B81B2201/042 ,  G02B26/0841

Abstract: A mirror (12) is mounted on a first pair of hinges (14, 16) to a gimble (18). The gimble (18) is connected by a second pair of hinges (20, 21) having one degree of freedom to a frame (24) wherein an oxide layer (25) is provided for bonding and etch stop during manufacturing.

Abstract translation: 一个反射镜（12）安装在第一对铰链（14,16）上到一个柔性件（18）上。 弹性件（18）通过具有一个自由度的第二对铰链（20,21）连接到框架（24），其中提供氧化物层（25）用于在制造期间进行接合和蚀刻停止。

公开(公告)号：WO2003031316A3

公开(公告)日：2003-04-17

申请号：PCT/US2002/023418

申请日：2002-07-22

Applicant: GLIMMERGLASS NETWORKS, INC.

Inventor： MURAY, Lawrence, P. ,  STAKER, Bryan, P. ,  FERNANDEZ, Andres

IPC: G02B26/00

Abstract: In an electrostatically controlled apparatus (fig.1), such as a MEMS array (10) having cavities (44, 46, 48) formed around electrodes and which is mounted directly on a dielectric substrate (24) in which are embedded electrostatic actuation electrodes (26, 27) disposed in alignment with the individual MEMS elements, a mechanism is provided to controllably neutralize excess charge and establish a controlled potential between the MEMS elements and the electrostatic actuation electrodes.

公开(公告)号：WO2008061101A2

公开(公告)日：2008-05-22

申请号：PCT/US2007/084575

申请日：2007-11-13

Applicant: GLIMMERGLASS NETWORKS, INC. ,  FERNANDEZ, Andres ,  STAKER, Bryan, P. ,  KINDWALL, Alexander, P. ,  OWENS, Windsor, E.

Inventor： FERNANDEZ, Andres ,  STAKER, Bryan, P. ,  KINDWALL, Alexander, P. ,  OWENS, Windsor, E.

IPC: B32B7/14 ,  B32B37/02 ,  B32B37/14

CPC classification number: B32B37/1292 ,  B32B7/12 ,  B32B2309/68 ,  B32B2457/00 ,  B81C3/001 ,  B81C2203/032 ,  B81C2203/035 ,  Y10T428/24612 ,  Y10T428/2462

Abstract: One or more cavities are formed in the bonding surfaces of one, all, or some of the elements to be bonded. These cavities serve as receptacles for the bonding material and are where the bonds are localized. The cavities are of sufficient size and shape so that their volume is greater than the volume of bonding material forming the bond. This ensures that when the elements are brought into contact with one another to mate, the bonding material, which can flow prior to solidifying into a bond, will flow into the cavities and will not impede the separation of the parts. This allows the parts to be mated with nominally zero separation. Once solidified, the bonding material forms a localized bond inside each cavity. Different cavity shapes, such as, rectangular, circular, or any other shape that can be injected or filled with adhesive material may be used.

Abstract translation: 一个或多个空腔形成在待粘合的一个，全部或一些元件的粘合表面中。 这些空腔用作结合材料的容器并且是结合部位的位置。 腔体具有足够的尺寸和形状，使得它们的体积大于形成结合的结合材料的体积。 这确保了当元件彼此接触以配合时，在凝固成结合之前可以流动的结合材料将流入空腔并且不会阻止部件的分离。 这允许零件与名义上的零分离配合。 一旦固化，结合材料在每个腔内形成局部结合。 可以使用不同的空腔形状，例如矩形，圆形或可以注入或填充有粘合材料的任何其他形状。

公开(公告)号：WO2008061097A2

公开(公告)日：2008-05-22

申请号：PCT/US2007/084568

申请日：2007-11-13

Applicant: GLIMMERGLASS NETWORKS, INC. ,  STAKER, Bryan, P. ,  FERNANDEZ, Andres ,  KINDWALL, Alexander, P. ,  OWENS, Windsor, E.

Inventor： STAKER, Bryan, P. ,  FERNANDEZ, Andres ,  KINDWALL, Alexander, P. ,  OWENS, Windsor, E.

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A MEMS-based mirror is provided with trenches between adjacent electrodes in order to be able to withstand relatively high applied voltages, and thus has a substantially reduced exposure to uncontrolled surface potentials. The MEMS-based mirror, thus avoids voltage drifts and has an improved mirror position stability. The trench dimensions are selected such that the voltage applied between each adjacent pair of electrodes stays within predefined limits. An insulating layer, such as silicon dioxide, electrically isolates each pair of adjacent electrodes. Each insulting layer extends partially above an associated trench and is characterized by the same height and width dimensions.

Abstract translation: 基于MEMS的反射镜在相邻电极之间设置有沟槽，以便能够承受相对较高的施加电压，并且因此显着降低了暴露于不受控制的表面电位。 基于MEMS的反射镜可避免电压漂移，并具有改进的反射镜位置稳定性。 选择沟槽尺寸，使得在每个相邻电极对之间施加的电压保持在预定限度内。 诸如二氧化硅的绝缘层将每对相邻的电极电隔离。 每个绝缘层部分地延伸到相关沟槽的上方，并且具有相同的高度和宽度尺寸。