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公开(公告)号：ZA9001150B
公开(公告)日：1990-10-31
申请号：ZA9001150
申请日：1990-02-15
Applicant: HOECHST AG
Inventor： DOESSEL KARL-FRIEDRICH , KARL-FRIEDRICH DOESSEL , FISCHER BERND , BERND FISCHER , SCHLOSSER ERNST-GUENTER , ERNST-GUENTER SCHLOSSER , SCHMIDT GUENTHER , GUENTHER SCHMIDT
IPC: G11B11/10 , G11B11/105 , H01F10/08 , H01F10/12 , H01F10/13 , H01F10/32 , H01F41/18 , G11B , C23C , G03G
CPC classification number: H01F41/183 , B82Y25/00 , G11B11/10586 , H01F10/131 , H01F10/132 , H01F10/265 , Y10S428/90 , Y10T428/12458 , Y10T428/12653 , Y10T428/26 , Y10T428/265
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公开(公告)号：ZA8904743B
公开(公告)日：1990-04-25
申请号：ZA8904743
申请日：1989-06-22
Applicant: HOECHST AG
Inventor： DAMMEL RALPH , RALPH DAMMEL , DOESSEL KARL-FRIEDRICH , KARL-FRIEDRICH DOESSEL , LINGNAU JUERGEN , JUERGEN LINGNAU , THEIS JUERGEN , JUERGEN THEIS
CPC classification number: G03F7/0295 , G03F7/0045
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公开(公告)号：ZA901150B
公开(公告)日：1990-10-31
申请号：ZA901150
申请日：1990-02-15
Applicant: HOECHST AG
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公开(公告)号：ZA894743B
公开(公告)日：1990-04-25
申请号：ZA894743
申请日：1989-06-22
Applicant: HOECHST AG
Inventor： DAMMEL RALPH , RALPH DAMMEL , DOESSEL KARL-FRIEDRICH , KARL-FRIEDRICH DOESSEL , LINGNAU JUERGEN , JUERGEN LINGNAU , THEIS JUERGEN , JUERGEN THEIS
Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.
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