2.
    发明专利
    未知

    公开(公告)号:FI901179A0

    公开(公告)日:1990-03-08

    申请号:FI901179

    申请日:1990-03-08

    Applicant: HOECHST AG

    Abstract: A radiation-curable mixture is proposed which contains a compound which forms an acid when exposed to high-energy radiation and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa of less than 12 or is a derivative of a compound having such a pKa, which derivative can be converted into the free compound by acid catalysis. The composition claimed, and in particular the recording material prepared therefrom, has a higher sensitivity and an improved resolution, and in addition exhibits no image haze after development.

    3.
    发明专利
    未知

    公开(公告)号:FI901178A0

    公开(公告)日:1990-03-08

    申请号:FI901178

    申请日:1990-03-08

    Applicant: HOECHST AG

    Abstract: A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12 or is a derivative of a compound having such a pKa value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

Patent Agency Ranking