OPTISCHES GLASFILTER
    1.
    发明专利

    公开(公告)号:DE102015117540A1

    公开(公告)日:2016-04-21

    申请号:DE102015117540

    申请日:2015-10-15

    Inventor: NISHII YOSHIKAZU

    Abstract: Beschrieben wird ein optisches Glasfilter, bei welchem eine Transmissionsrate nicht instabil wird, und welches eine flache spektrale Transmissionscharakteristik mit hohem Maß an Genauigkeit aufweist. Das optische Glasfilter basiert auf einer Silikat basierenden Glaszusammensetzung, die zumindest NiO, MnO2 und CO2O3 als essentielle Bestandteile umfasst und eine flache spektrale Transmissionscharakteristik im Wellenlängenbereich von 450–650 nm aufweist.

    発光装置
    3.
    发明专利
    発光装置 审中-公开
    发光装置

    公开(公告)号:JP2015032642A

    公开(公告)日:2015-02-16

    申请号:JP2013159975

    申请日:2013-07-31

    Inventor: NISHII YOSHIKAZU

    Abstract: 【課題】封止工程において発生する内部応力によってガラスにクラックが発生しない発光装置を提供すること。【解決手段】発光装置が、一方面に素子搭載面を有する基板と、素子搭載面に実装されたLED(Light Emitting Diode)素子と、LED素子を封止して、素子搭載面に接合された封止ガラスと、を備え、LED素子の熱膨張率をα1、基板の熱膨張率をα2、封止ガラスの熱膨張率をα3としたときに、以下の条件式(1)を満たし、α1

    Abstract translation: 要解决的问题:提供一种发光装置,其中在密封过程中产生的内应力在玻璃中不会发生裂纹。解决方案:一种发光装置,包括:具有在其一个表面上的元件安装表面的基板; 安装在元件安装表面上的LED(发光二极管)元件; 以及密封玻璃密封LED元件并结合到元件安装表面上的密封玻璃。 发光元件满足以下条件式(1):α1<α3<α2...(1)其中α1表示LED元件的热膨胀系数,α2表示基板的热膨胀系数,α3表示 密封玻璃的热膨胀系数。 由基板的热膨胀系数α2与密封玻璃的热膨胀系数α3之间的差产生的密封玻璃中的压缩应力大于由热膨胀系数α1之差产生的密封玻璃中的拉伸应力 的LED元件和密封玻璃的热膨胀系数α3。

    Cobalt-containing glass, blue filter, and radiation image reading apparatus
    4.
    发明专利
    Cobalt-containing glass, blue filter, and radiation image reading apparatus 有权
    含钴玻璃,蓝色滤光片和辐射图像读取装置

    公开(公告)号:JP2012140262A

    公开(公告)日:2012-07-26

    申请号:JP2010292668

    申请日:2010-12-28

    Inventor: NISHII YOSHIKAZU

    Abstract: PROBLEM TO BE SOLVED: To provide a colored glass material capable of thinning the thickness of an excitation light cut filter furthermore than a conventional colored glass material by heightening excitation light shielding characteristics.SOLUTION: This cobalt-containing glass includes as cation, 25-60% Si, 3-19% Al, 18-38% B, 9-31% Kand 0.1-1.5% Coby cation display, and includes as anion, Oas a main component, and further includes 1-12% Fand 0.01-2% Clby anion display.

    Abstract translation: 要解决的问题:通过提高激发光屏蔽特性,提供能够通过提高激发光截止滤光器的厚度而比常规彩色玻璃材料更薄的着色玻璃材料。

    解决方案:该含钴玻璃包括25-60%的Si阳离子,3〜19%的Al 3+ / SP>,18-38%B 3 + ,9-31%K + 和0.1-1.5%Co 2 + ,并且包含作为阴离子的O 2 - 为主要成分,并且还包括1-12% 通过阴离子显示,SP POS =“POST”> - 和0.01-2%Cl - 。 版权所有(C)2012,JPO&INPIT

    Wafer support glass
    5.
    发明专利
    Wafer support glass 有权
    WAFER支持玻璃

    公开(公告)号:JP2008306149A

    公开(公告)日:2008-12-18

    申请号:JP2007191825

    申请日:2007-07-24

    Inventor: NISHII YOSHIKAZU

    Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor wafer support glass made of a glass plate (GP) which is adhered to a semiconductor wafer (SW) to support it and has flexibility so as to be peeled off from it. SOLUTION: A glass plate (GP) is a wafer support glass which is adhered to a semiconductor wafer (SW) to support it. For peeling off a wafer support glass adhered to a semiconductor wafer (SW), the wafer support glass can be bent more than a predetermined angle. Being bent more than 30 degree, the wafer support glass can be peeled off from the semiconductor wafer without giving large shock to it. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种由玻璃板(GP)制成的半导体晶片支撑玻璃,该玻璃板(GP)粘附到半导体晶片(SW)以支撑它,并且具有柔性以便从其剥离。 解决方案:玻璃板(GP)是粘附到半导体晶片(SW)上以支撑玻璃板的晶片支撑玻璃。 为了剥离粘附到半导体晶片(SW)的晶片支撑玻璃,可以使晶片支撑玻璃弯曲超过预定角度。 弯曲超过30度时,晶片支撑玻璃可以从半导体晶片剥离而不会对其造成大的冲击。 版权所有(C)2009,JPO&INPIT

    Air cleaning device and method for cleaning air using the same

    公开(公告)号:JP2004329499A

    公开(公告)日:2004-11-25

    申请号:JP2003128330

    申请日:2003-05-06

    Inventor: NISHII YOSHIKAZU

    CPC classification number: Y02A50/235

    Abstract: PROBLEM TO BE SOLVED: To provide an air cleaning device having a highly efficient deodorizing function and highly efficient function of removing volatile organic compounds, and a method for cleaning air using the same. SOLUTION: The air cleaning device has a treated gas adsorbing/concentrating part in a first channel for absorbing/concentrating the treated gas by letting air containing the treated gas pass through the first channel, and also has a treated gas adsorbing/concentrating part and a separated gas decomposing/removing part in a second channel separate from the first channel. Clean air is fed to the treated gas adsorbing/concentrating part, and the treated gas adsorbed/concentrated by the treated gas adsorbing/concentrating part is separated by a treated gas separating part built in the treated gas adsorbing/concentrating part. After that, air containing the separated treated gas flows into the separated gas decomposing/removing part, where the separated treated gas is decomposed and removed. As a result, the treated gas adsorbing/concentrating part in the first channel can be reproduced. COPYRIGHT: (C)2005,JPO&NCIPI

    Wafer supporting glass
    7.
    发明专利
    Wafer supporting glass 审中-公开
    WAFER支持玻璃

    公开(公告)号:JP2009016771A

    公开(公告)日:2009-01-22

    申请号:JP2007191826

    申请日:2007-07-24

    Inventor: NISHII YOSHIKAZU

    Abstract: PROBLEM TO BE SOLVED: To provide a wafer supporting glass having shock resistance in its end face on which no chip nor crack occur caused by impulsive force applied to the end face. SOLUTION: The wafer supporting glass GP is a wafer supporting glass which is bonded to a semiconductor wafer having a prescribed diameter and has a diameter L larger than the prescribed diameter and supports the semiconductor wafer, the wafer supporting glass GP is provided with shock resistance at least on the end face of the wafer supporting glass. The shock resistance is obtained by forming a compressive stress layer on the surface of the wafer supporting glass by chemical strengthening processing. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种在其端面上具有抗冲击性的晶片支撑玻璃,由于施加到端面的冲击力而不产生芯片或裂纹。 解决方案:晶片支撑玻璃GP是晶片支撑玻璃,其结合到具有规定直径并且具有大于规定直径的直径L的半导体晶片并且支撑半导体晶片,晶片支撑玻璃GP设置有 至少在晶片支撑玻璃的端面上具有抗冲击性。 通过化学强化处理在晶片支撑玻璃的表面上形成压应力层来获得抗冲击性。 版权所有(C)2009,JPO&INPIT

    Regeneration treatment apparatus for activated carbon filter, and regeneration treatment method of activated carbon filter
    8.
    发明专利
    Regeneration treatment apparatus for activated carbon filter, and regeneration treatment method of activated carbon filter 审中-公开
    活性炭过滤器的再生处理装置和活性炭过滤器的再生处理方法

    公开(公告)号:JP2006181527A

    公开(公告)日:2006-07-13

    申请号:JP2004379795

    申请日:2004-12-28

    Inventor: NISHII YOSHIKAZU

    CPC classification number: Y02A50/235 Y02C10/08

    Abstract: PROBLEM TO BE SOLVED: To provide a regeneration treatment apparatus for an activated carbon filter capable of removing nitrogen oxides generated by oxidative reaction of volatile organic compounds while removing odor water generated when gaseous volatile organic compounds and gaseous water molecule, which are desorbed from an activated carbon filter are circulated through a ventilation pipe, and a regeneration treatment method of the activated carbon filter. SOLUTION: In the regeneration treatment apparatus of the activated carbon filter, the activated carbon filter is regenerated by heating the gaseous volatile organic compounds and gaseous water molecule adsorbed by the activated carbon filter to be desorbed. The apparatus has; a platinum catalyst reactor for decomposing the gaseous volatile organic compounds; a dehumidifier; an acidic chemical filter device for removing nitrogen oxide components; and a suction apparatus for sucking gases in the components such as the activated carbon filter, the platinum catalyst reactor, the dehumidifier, and the acidic chemical filter device, in order of the respective components. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题:提供一种活性炭过滤器的再生处理装置,其能够除去挥发性有机化合物的氧化反应产生的氮氧化物,同时除去气态挥发性有机化合物和气态水分子产生的异味,其被解吸 活性炭过滤器通过通气管循环,并且活性炭过滤器的再生处理方法。 解决方案:在活性炭过滤器的再生处理装置中,通过加热待吸附的活性炭过滤器吸附的气态挥发性有机化合物和气态水分子来再生活性炭过滤器。 装置有 用于分解气态挥发性有机化合物的铂催化剂反应器; 除湿机 用于去除氮氧化物组分的酸性化学过滤装置; 以及用于按照各个部件的顺序吸入诸如活性炭过滤器,铂催化剂反应器,除湿器和酸性化学过滤装置的组分中的气体的抽吸装置。 版权所有(C)2006,JPO&NCIPI

    Organic compound free gas generator
    9.
    发明专利

    公开(公告)号:JP2004125720A

    公开(公告)日:2004-04-22

    申请号:JP2002293232

    申请日:2002-10-07

    Abstract: PROBLEM TO BE SOLVED: To provide an organic compound free gas generator guiding gas including volatile organic compounds and generating gas wherein the concentration of the volatile organic compounds are reduced, wherein the volatile organic compounds are prevented from mixing into the organic compound free gas generated by an organic compound removing filter.
    SOLUTION: The generator includes a gas guiding part 2 guiding the gas, a gas adjuster 3 adjusting at least one of the gas flow rate and the gas pressure of the guided gas, and an organic compound removing filer 5 removing the volatile organic compounds included in the gas. The gas guiding part 2, the gas adjuster 3, and the organic compound removing filter 5 are arranged in this order. The generator generates the organic compound free gas, wherein the concentration of the volatile organic compounds is equal to or less than 10 μg/m
    3 .
    COPYRIGHT: (C)2004,JPO

    Organic-material-free zero gas generator
    10.
    发明专利

    公开(公告)号:JP2004108853A

    公开(公告)日:2004-04-08

    申请号:JP2002269456

    申请日:2002-09-17

    Inventor: NISHII YOSHIKAZU

    Abstract: PROBLEM TO BE SOLVED: To provide an organic-matter-free zero gas generator for supplying zero gas with the gross concentration of volatile organic compounds being 10μg/m
    3 or less, easy to use, maintain and manage, lower in cost and continuously usable for a long period.
    SOLUTION: The organic-matter-free zero gas generator comprises a filter device constituted by two or more filters connected in series. The decreasing rate of the concentration of volatile organic compounds in the rear filter is greater than the decreasing rate of the concentration of volatile organic compounds in the front filter, and the gross concentration of the volatile organic compounds is 10μm/m
    3 or less.
    COPYRIGHT: (C)2004,JPO

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