Abstract:
Beschrieben wird ein optisches Glasfilter, bei welchem eine Transmissionsrate nicht instabil wird, und welches eine flache spektrale Transmissionscharakteristik mit hohem Maß an Genauigkeit aufweist. Das optische Glasfilter basiert auf einer Silikat basierenden Glaszusammensetzung, die zumindest NiO, MnO2 und CO2O3 als essentielle Bestandteile umfasst und eine flache spektrale Transmissionscharakteristik im Wellenlängenbereich von 450–650 nm aufweist.
Abstract:
PROBLEM TO BE SOLVED: To provide a colored glass material capable of thinning the thickness of an excitation light cut filter furthermore than a conventional colored glass material by heightening excitation light shielding characteristics.SOLUTION: This cobalt-containing glass includes as cation, 25-60% Si, 3-19% Al, 18-38% B, 9-31% Kand 0.1-1.5% Coby cation display, and includes as anion, Oas a main component, and further includes 1-12% Fand 0.01-2% Clby anion display.
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor wafer support glass made of a glass plate (GP) which is adhered to a semiconductor wafer (SW) to support it and has flexibility so as to be peeled off from it. SOLUTION: A glass plate (GP) is a wafer support glass which is adhered to a semiconductor wafer (SW) to support it. For peeling off a wafer support glass adhered to a semiconductor wafer (SW), the wafer support glass can be bent more than a predetermined angle. Being bent more than 30 degree, the wafer support glass can be peeled off from the semiconductor wafer without giving large shock to it. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an air cleaning device having a highly efficient deodorizing function and highly efficient function of removing volatile organic compounds, and a method for cleaning air using the same. SOLUTION: The air cleaning device has a treated gas adsorbing/concentrating part in a first channel for absorbing/concentrating the treated gas by letting air containing the treated gas pass through the first channel, and also has a treated gas adsorbing/concentrating part and a separated gas decomposing/removing part in a second channel separate from the first channel. Clean air is fed to the treated gas adsorbing/concentrating part, and the treated gas adsorbed/concentrated by the treated gas adsorbing/concentrating part is separated by a treated gas separating part built in the treated gas adsorbing/concentrating part. After that, air containing the separated treated gas flows into the separated gas decomposing/removing part, where the separated treated gas is decomposed and removed. As a result, the treated gas adsorbing/concentrating part in the first channel can be reproduced. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a wafer supporting glass having shock resistance in its end face on which no chip nor crack occur caused by impulsive force applied to the end face. SOLUTION: The wafer supporting glass GP is a wafer supporting glass which is bonded to a semiconductor wafer having a prescribed diameter and has a diameter L larger than the prescribed diameter and supports the semiconductor wafer, the wafer supporting glass GP is provided with shock resistance at least on the end face of the wafer supporting glass. The shock resistance is obtained by forming a compressive stress layer on the surface of the wafer supporting glass by chemical strengthening processing. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a regeneration treatment apparatus for an activated carbon filter capable of removing nitrogen oxides generated by oxidative reaction of volatile organic compounds while removing odor water generated when gaseous volatile organic compounds and gaseous water molecule, which are desorbed from an activated carbon filter are circulated through a ventilation pipe, and a regeneration treatment method of the activated carbon filter. SOLUTION: In the regeneration treatment apparatus of the activated carbon filter, the activated carbon filter is regenerated by heating the gaseous volatile organic compounds and gaseous water molecule adsorbed by the activated carbon filter to be desorbed. The apparatus has; a platinum catalyst reactor for decomposing the gaseous volatile organic compounds; a dehumidifier; an acidic chemical filter device for removing nitrogen oxide components; and a suction apparatus for sucking gases in the components such as the activated carbon filter, the platinum catalyst reactor, the dehumidifier, and the acidic chemical filter device, in order of the respective components. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide an organic compound free gas generator guiding gas including volatile organic compounds and generating gas wherein the concentration of the volatile organic compounds are reduced, wherein the volatile organic compounds are prevented from mixing into the organic compound free gas generated by an organic compound removing filter. SOLUTION: The generator includes a gas guiding part 2 guiding the gas, a gas adjuster 3 adjusting at least one of the gas flow rate and the gas pressure of the guided gas, and an organic compound removing filer 5 removing the volatile organic compounds included in the gas. The gas guiding part 2, the gas adjuster 3, and the organic compound removing filter 5 are arranged in this order. The generator generates the organic compound free gas, wherein the concentration of the volatile organic compounds is equal to or less than 10 μg/m 3 . COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide an organic-matter-free zero gas generator for supplying zero gas with the gross concentration of volatile organic compounds being 10μg/m 3 or less, easy to use, maintain and manage, lower in cost and continuously usable for a long period. SOLUTION: The organic-matter-free zero gas generator comprises a filter device constituted by two or more filters connected in series. The decreasing rate of the concentration of volatile organic compounds in the rear filter is greater than the decreasing rate of the concentration of volatile organic compounds in the front filter, and the gross concentration of the volatile organic compounds is 10μm/m 3 or less. COPYRIGHT: (C)2004,JPO