公开(公告)号：JP2556534B2

公开(公告)日：1996-11-20

申请号：JP30189787

申请日：1987-11-30

Applicant: HOYA CORP

Inventor： MITSUI MASARU ,  MAEDA YOSHIO ,  USHIDA SHOJI

IPC: G03F1/00 ,  G03F1/50 ,  G03F1/54 ,  H01L21/027 ,  H01L21/30 ,  G03F1/08

公开(公告)号：JPH01142637A

公开(公告)日：1989-06-05

申请号：JP30189787

申请日：1987-11-30

Applicant: HOYA CORP

Inventor： MITSUI MASARU ,  MAEDA YOSHIO ,  USHIDA SHOJI

IPC: G03F1/00 ,  G03F1/50 ,  G03F1/54 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To prevent degradation in the yield of products and to facilitate process control by providing a thin film for reinforcing the adhesion of a light shielding film to a resist by a metal silicide contg. oxygen on a light shieldable thin film consisting of the metal silicide. CONSTITUTION:The light shieldable thin film 3 consisting of the metal silicide is formed on one face of a transparent substrate 2 consisting of quartz glass and the thin film 4 for reinforcing the adhesion consisting of the metal silicide contg. oxygen is provided on this light shieldable thin film 3. The thin film 4 for reinforcing the adhesion has the compsn. resembling to the compsn. of the light shieldable thin film 3 and is formable by the thin film forming technique similar to the case of the light shieldable thin film 3. Said thin film is, therefore, easily formed as the extension of he stage for forming the light shieldable thin film. A photoresist film is satisfactorily adhered onto the light shieldable thin film of the photomask blank 1 even if an adhesion accelerator is not coated thereon. The degradation in the yield of the products is thus prevented.