公开(公告)号：JPS6434479A

公开(公告)日：1989-02-03

申请号：JP18771887

申请日：1987-07-29

Applicant: HOYA CORP

Inventor： MAEDA YOSHIO

IPC: B08B3/08 ,  H01L21/304

Abstract: PURPOSE: To cleanly maintain the washing liquid in washing tanks and to obtain a high washing effect without being affected by the number of washing times by providing the apparatus with a liquid storage tank, a steam washing tank, washing tanks and recovering tanks, filtering and regenerating the washing liquid and circulating the washing liquid between these tanks and between the washing tanks and the recovering tanks. CONSTITUTION: The washing liquid 5 housed in the lower part of the steam washing tank 1 including the washing tanks 2A, 2B is heated and evaporated by a heater 4. The steam 6 in the tank 1 is cooled by a condenser pipe 7 disposed in the upper part of the tank 1. The washing liquid is stored in the liquid storage tank 20 and the washing liquid flowing over from the tank 1 is recovered into the recovering tanks 21A, 21B. Further, the washing liquid in the tank 20 is supplied into the lower part of the tank 1 and to the recovering tanks by the means 25, 26. In addition, the washing liquid in the recovering tanks is supplied to the tank 1 by the means 29 and 31. Drain pipes 23A and 23B connect the tank 1 and the recovering tanks and returning pipes 34A and 34B connect the tank 20 and the recovering tanks in such that when the washing liquid in the recovering tanks exceeds the prescribed amt. this washing liquid is introduced as an excess liquid to the tank 20.

公开(公告)号：JPS60114385A

公开(公告)日：1985-06-20

申请号：JP22010283

申请日：1983-11-22

Applicant: HOYA CORP

Inventor： MAEDA YOSHIO

IPC: B08B3/08

公开(公告)号：JPH049847A

公开(公告)日：1992-01-14

申请号：JP11029890

申请日：1990-04-27

Applicant: HOYA CORP

Inventor： MITSUI MASARU ,  MAEDA YOSHIO ,  USHIDA MASAO

IPC: G03F1/46 ,  G03F1/50 ,  H01L21/027

Abstract: PURPOSE:To prevent the degradation in sectional shape at the time of overetching by incorporating a chromium carbide, chromium nitride and chromium oxide into an antireflection film and decreasing the degree of oxidation of the antireflection film from a light transparent substrate toward a light shieldable thin film in the thickness direction thereof. CONSTITUTION:The 1st antireflection film 2 consists of the chromium carbonitrooxides and the degree of the oxidation thereof decreases from the light transparent substrate 1 toward the light shieldable thin film 3 in the thickness direction thereof. The degree of the oxidation of the antireflection film 2 is changed in the film thickness direction, by which the side etching rate is suppressed and the prescribed sectional shape is obtd. The etching rate of the antireflection film 2 is matched with the etching rate of the light shieldable thin film 3 laminated thereon by carbonizing the chromium. The formation of the film to the overhang-like sectional shape is prevented in this way.

公开(公告)号：JPH03168748A

公开(公告)日：1991-07-22

申请号：JP30989989

申请日：1989-11-29

Applicant: HOYA CORP

Inventor： MAEDA YOSHIO

IPC: G03F1/82 ,  H01L21/304

Abstract: PURPOSE:To improve the wettability of a metallic thin film with water and to effectively clean the metallic thin film by processing the thin film contg. a metal with an aq. soln. contg. at least one kind selected from a specific group. CONSTITUTION:The metallic thin film is processed with the aq. soln. contg. at least one kind selected from the group consisting of hypohalogenous acid, hypohalogenate, halogenous acid and halogenite. The hypohalogenous acid or its salt and the halogenous acid and its salt have the etching ability to the metallic thin film and etches the surface of the metallic thin film; therefore, the oxide, etc., of the surface of the metallic thin film are removed. Thus, the wettability of the metallic thin film with water is improved and the metallic thin film is effectively cleaned.

公开(公告)号：JPS6316189B2

公开(公告)日：1988-04-07

申请号：JP22010283

申请日：1983-11-22

Applicant: HOYA CORP

Inventor： MAEDA YOSHIO

IPC: B08B3/08

公开(公告)号：JPH02981A

公开(公告)日：1990-01-05

申请号：JP4268889

申请日：1989-02-22

Applicant: HOYA CORP ,  MITSUBISHI GAS CHEMICAL CO

Inventor： MAEDA YOSHIO ,  SHIMOKAWA SHIGEKI

IPC: G03F7/42

Abstract: PURPOSE:To surely strip various photosensitive resins by using a stripping liquid consisting of an aq. soln. contg. hydrogen peroxide and specific compd. CONSTITUTION:The stripping liquid for photosensitive resins consisting of the aq. soln. contg. the hydrogen peroxide and the compd. expressed by formula I is used. In formula I, R1 is H or 1 or 2C alkyl group; R2 is H or 1-3C alkyl group; R3 is H or 1-3C alkyl group. The various photosensitive resins are surely stripped in a short period of time in this way and further, the good stripping power is maintained over a long period of time.

公开(公告)号：JPH01142637A

公开(公告)日：1989-06-05

申请号：JP30189787

申请日：1987-11-30

Applicant: HOYA CORP

Inventor： MITSUI MASARU ,  MAEDA YOSHIO ,  USHIDA SHOJI

IPC: G03F1/00 ,  G03F1/50 ,  G03F1/54 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To prevent degradation in the yield of products and to facilitate process control by providing a thin film for reinforcing the adhesion of a light shielding film to a resist by a metal silicide contg. oxygen on a light shieldable thin film consisting of the metal silicide. CONSTITUTION:The light shieldable thin film 3 consisting of the metal silicide is formed on one face of a transparent substrate 2 consisting of quartz glass and the thin film 4 for reinforcing the adhesion consisting of the metal silicide contg. oxygen is provided on this light shieldable thin film 3. The thin film 4 for reinforcing the adhesion has the compsn. resembling to the compsn. of the light shieldable thin film 3 and is formable by the thin film forming technique similar to the case of the light shieldable thin film 3. Said thin film is, therefore, easily formed as the extension of he stage for forming the light shieldable thin film. A photoresist film is satisfactorily adhered onto the light shieldable thin film of the photomask blank 1 even if an adhesion accelerator is not coated thereon. The degradation in the yield of the products is thus prevented.

公开(公告)号：JPS62210467A

公开(公告)日：1987-09-16

申请号：JP5271986

申请日：1986-03-12

Applicant: HOYA CORP

Inventor： MAEDA YOSHIO

IPC: B05D1/40 ,  G03C1/74 ,  G03F7/16 ,  G03F7/42 ,  H01L21/027

Abstract: PURPOSE:To make effective use of a photomask blank by providing a stage for stripping the resist coated on the light shieldable film of the photomask blank by a resist stripping liquid, stage for removing the resist stripping liquid and stage for freshly coating the resist on the light shieldable film. CONSTITUTION:The photomask blank with the resist is immersed in the resist stripping liquid in a resist stripping device to strip the resist while ultrasonic waves are propagated therein for 3min. The photomask blank is then successively immersed into the cleaning liquids which consists of an isopropyl alcohol and the housed in 3 pieces of cleaning tank. The photomask blank is subjected to 1min of ultrasonic cleaning respectively in said tanks, by which the resist stripping liquid is removed from the light shieldable film and the photomask blank is dried. The resist stripping liquid and cleaning liquid are thus thoroughly removed. The resist is freshly coated by a known spin coating method on the light shieldable film of such clean photomask blank. The film thickness is inspected, and if the film thickness is of a desired value, the photomask blank is subjected to stages for exposing, developing, etching of the light shieldable film, etc., which are post stages, by which the photomask is manufactured.

公开(公告)号：JPS6077148A

公开(公告)日：1985-05-01

申请号：JP18354583

申请日：1983-09-30

Applicant: HOYA CORP

Inventor： MAEDA YOSHIO

IPC: C03C15/00

Abstract: PURPOSE:To make it possible to carry out chemical etching of only the end of a glass substrate with ease, by applying an ethylene-vinyl acetate based hot-melt resin having the acid resistance to at least one principal surface of the glass substrate. CONSTITUTION:A soda lime based glass substrate 1 which is worked into a given shape and has just a roughly ground end 2 is heated in an oven at about 90 deg.C, taken out thereof, and a resin 3 consisting essentially of rosin and beeswax as an ethylene-vinyl acetate based hot-melt type resin is rubbed against both principal surfaces under high temperature conditions, melted and applied thereto. The resultant substrate 1 is then dipped in a chemical etching solution prepared by mixing about 3% hydrofluoric acid with about 56% sulfuric acid for about 2min to give the end 2 of the glass substrate 1 a smooth end 4. The resultant substrate 1 is washed, dried and dipped in an organic solvent, e.g. trichloroethylene, for about 5min to peel the resin 3 therefrom.

公开(公告)号：JPS6029747A

公开(公告)日：1985-02-15

申请号：JP13845983

申请日：1983-07-28

Applicant: HOYA CORP

Inventor： MAEDA YOSHIO ,  SATOU TAKASHI ,  MATSUDA TSUNEO

IPC: G03F1/60 ,  H01L21/027

Abstract: PURPOSE:To prevent defects, such as pinholes, deterioration of producitivity and operability in forming a pattern by chemically etching the borders of a base plate with HF to form its surface unlike mirror. CONSTITUTION:The borders 21, 52 of a base glass plate 2 is chemically etched with an acid mixture contg. HF to form the borders each freed of a mirror face. The etching operation is carried out by pinching at least one main face of the plate 2 with dummy glasses 3, 3 or org. resin plates to bring the plates 2 into contact with each other. It is desirable to execute this etching operation after rough grinding of the plates 2 and before their fine polishing. The mask base plate 51 thus obtained allows only a small amt. of foreign matters to attach to the surface during a step for attaching a thin metal film on the surface and a resin coating step, etc., and it can maintain a surface high in quality, and it facilitates handling, etc., and permits automatic conveyance, too.