公开(公告)号：US20250155739A1

公开(公告)日：2025-05-15

申请号：US18942189

申请日：2024-11-08

Applicant: HyperLight Corporation

Inventor： Fan Ye ,  Christian Reimer ,  Mian Zhang ,  Kevin Luke ,  Amirmahdi Honardoost

IPC: G02F1/035

Abstract: A substrate configured for an electro-optic device and an electro-optic device formed using the substrate are described. The substrate includes a semiconductor substrate, an insulating layer, and at least one thin film optical material. The semiconductor substrate includes a trap-rich layer and an underlying substrate layer. The insulating layer is on the semiconductor substrate, The trap-rich layer is between the underlying substrate layer and the insulating layer. The thin film optical material(s) have an electro-optic effect and are on the insulating layer.

公开(公告)号：US20250076578A1

公开(公告)日：2025-03-06

申请号：US18817075

申请日：2024-08-27

Applicant: HyperLight Corporation

Inventor： Fan Ye ,  Ying Wang ,  Roy Meade

IPC: G02B6/13

Abstract: A singulated thin film lithium containing (TFLC) photonics device, as well as a method and system for singulating the device are described. The TFLC photonics device includes a device layer and a silicon substrate. The device layer includes a TFLC layer having a depth. The device layer also has a first sawn edge. The silicon substrate has a second sawn edge and includes an upper portion and a lower portion. The upper portion has the second sawn edge that is mutually aligned with the first sawn edge. The upper portion overhangs the lower portion.

公开(公告)号：US20230400717A1

公开(公告)日：2023-12-14

申请号：US18209415

申请日：2023-06-13

Applicant: HyperLight Corporation

Inventor： Mian Zhang ,  Kevin Luke ,  Roy Meade ,  Prashanta Kharel ,  Christian Reimer ,  Fan Ye

IPC: G02F1/035

CPC classification number: G02F1/035 ,  G02F2202/20 ,  G02F2201/063

Abstract: An electro-optic device is described. The electro-optic device includes at least one optical material having an electro-optic effect. Further, the optical material(s) include lithium. The optical material(s) have a slab and a ridge waveguide. The slab has a top surface. The slab includes free surfaces. Each of the free surfaces is at a nonzero angle from the top surface of the slab and mitigates stress in the slab.

公开(公告)号：US20230305326A1

公开(公告)日：2023-09-28

申请号：US18125644

申请日：2023-03-23

Applicant: HyperLight Corporation

Inventor： Kevin Luke ,  Mian Zhang ,  Fan Ye ,  Roy Meade ,  Christian Reimer ,  Prashanta Kharel

IPC: G02F1/035

CPC classification number: G02F1/035 ,  G02F2202/20

Abstract: An optical device includes a substrate, an oxide layer on the substrate and an electro-optic device on the oxide layer. The oxide layer is at least one micrometer thick. The electro-optic device includes an electro-optic material having a thickness of not more than one micrometer. The silicon substrate, oxide layer, and the electro-optic material terminate at an edge. At least one of the silicon substrate has a thickness of at least five hundred micrometers or the edge includes a recessed region corresponding to a portion of the oxide layer.