公开(公告)号：DE2459179A1

公开(公告)日：1975-06-26

申请号：DE2459179

申请日：1974-12-14

Applicant: IBM

Inventor： ABOLAFIA OSCAR ROBERT ,  CANESTARO MICHAEL JAMES ,  CUTILLO JOSEPH GEORGE ,  SCHMITT GEORGE PERSHING

IPC: C08F2/50 ,  C08F299/02 ,  C08G59/00 ,  C08G59/40 ,  C08G59/50 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  H05K3/00 ,  G03C1/68

公开(公告)号：DE3266507D1

公开(公告)日：1985-10-31

申请号：DE3266507

申请日：1982-06-02

Applicant: IBM

Inventor： ABOLAFIA OSCAR ROBERT ,  AMEEN JOSEPH GEORGE ,  ELMORE GLENN VANNESS

IPC: C23F1/26 ,  H05K3/06 ,  C23F1/00 ,  C09K13/06

Abstract: An aqueous acidic composition suitable for etching which contains an acid and a thiourea compound, and use thereof.

公开(公告)号：DE2258880A1

公开(公告)日：1973-06-20

申请号：DE2258880

申请日：1972-12-01

Applicant: IBM

Inventor： ABOLAFIA OSCAR ROBERT

IPC: H05K3/00 ,  C08G59/00 ,  G03C5/56 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C08G30/14

Abstract: 1405943 Photosensitive epoxy resin composition INTERNATIONAL BUSINESS MACHINES CORP 25 Oct 1972 [17 Dec 1971] 49108/72 Heading C3B [Also in Divisions G2 and H1] A positive photoresist composition comprises (I) an epoxy resin, (II) a tertiary amine curing agent, (III) a halogenated hydrocarbon sensitizer and (IV) a solvent. I may be a diglycidyl ether of bisphenol A, polyglycidyl ethers of phenol formaldehyde condensates, a polyglycidyl ether of tetraphenylene ethane or a diglycidyl ether of bisphenol A. II may be N,N,N 1 ,N 1 - tetramethyl - 1,3 - butanediamine, benzyldimethylamine, 2 - dimethylamino - 2 - hydroxypropane, 2 - (dimethylaminomethyl)- phenol or 2,4,6 - tris - (dimethylaminomethyl)- phenol. A preferred III is carbon tetrabromide. IV may be 2-methoxyethanol, methyl ethyl ketone, chloroform or mixtures thereof. Uses.-Printed circuitry (see Divisions H1 and G2).