公开(公告)号：JP2001066767A

公开(公告)日：2001-03-16

申请号：JP2000209547

申请日：2000-07-11

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  ARI AVIRAMU ,  EDWARD D BAABICHI ,  TIMOTHY ARAN BRANNER ,  THOMAS BENJAMIN FAURE ,  C RICHARD GUARNIERI ,  KWONG RANEE W ,  PETRILLO KAREN E

IPC: G03F1/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/09 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a resist composition, having responsiveness to imaging irradiation and enhanced resistance to reactive ion etching by incorporating a radiation sensitive polymer and an organometallic compound of a specified metal. SOLUTION: This resist composition contains a radiation responsive polymer and an organometallic compound of a metal selected from among the group comprising yttrium, aluminum, iron, titanium, zirconium, hafnium and a mixture of these. The organometallic compound is, e.g. yttrium trishexafluoroacetylacetonate or yttrium tris(2,2,6,6-tetramethyl)-3,5-heptanedioate and the amount of the organometallic compound used is about 0.1-25 wt.% of the weight of the radiation sensitive polymer. The organometallic compound may be used in combination with various resist polymers including a chemically amplified resist and a non-chemically amplified resist.

公开(公告)号：JP2001072716A

公开(公告)日：2001-03-21

申请号：JP2000209354

申请日：2000-07-11

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  ARI AVIRAMU ,  GUARNIERI C RICHARD ,  KWONG RANEE W

IPC: G03F7/038 ,  C08F30/04 ,  C08F212/04 ,  C08F220/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/039 ,  G03F7/32 ,  H01L21/312

Abstract: PROBLEM TO BE SOLVED: To provide a composition usable as resist, sensitive to image rendering irradiation, and enhanced in its capability to resist reactive ion etching. SOLUTION: A composition which resists reactive ion etching includes polymerizable organometallic monomer acids or ester polymers. Specifically described, it is a polymer generated to include at least one monomer from the group of organic metal acrylates, organic metal methacrylates, organometallic styrenes, and their mixtures. In this composition, metals are selected from yttrium, aluminum, iron, titanium, zirconium, hafnium, and their mixtures.