公开(公告)号：JP2001066767A

公开(公告)日：2001-03-16

申请号：JP2000209547

申请日：2000-07-11

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  ARI AVIRAMU ,  EDWARD D BAABICHI ,  TIMOTHY ARAN BRANNER ,  THOMAS BENJAMIN FAURE ,  C RICHARD GUARNIERI ,  KWONG RANEE W ,  PETRILLO KAREN E

IPC: G03F1/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/09 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a resist composition, having responsiveness to imaging irradiation and enhanced resistance to reactive ion etching by incorporating a radiation sensitive polymer and an organometallic compound of a specified metal. SOLUTION: This resist composition contains a radiation responsive polymer and an organometallic compound of a metal selected from among the group comprising yttrium, aluminum, iron, titanium, zirconium, hafnium and a mixture of these. The organometallic compound is, e.g. yttrium trishexafluoroacetylacetonate or yttrium tris(2,2,6,6-tetramethyl)-3,5-heptanedioate and the amount of the organometallic compound used is about 0.1-25 wt.% of the weight of the radiation sensitive polymer. The organometallic compound may be used in combination with various resist polymers including a chemically amplified resist and a non-chemically amplified resist.

公开(公告)号：JP2007226224A

公开(公告)日：2007-09-06

申请号：JP2007036142

申请日：2007-02-16

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： TIMOTHY ARAN BRANNER ,  HIBBS MICHAEL STRAIGHT

IPC: G03F1/08 ,  G01J9/00

CPC classification number: G03F1/84 ,  G03F1/32

Abstract: PROBLEM TO BE SOLVED: To provide a phase metrology pattern for an attenuating phase mask. SOLUTION: The phase error of this pattern can be determined to high accuracy by aerial image measurements. This pattern can be used to create an optical phase standard for calibrating phase metrology equipment for attenuated phase masks or as a witness pattern on a product mask, to verify the phase accuracy of that mask. The pattern includes an effective line to space ratio and can be tested, by using a microscope or a stepper system, or can be measured directly using a detector for the zeroth-order diffraction measurement. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供衰减相位掩模的相位计量模式。

解决方案：通过空间图像测量，可以将该图案的相位误差确定为高精度。 该模式可用于创建光学相位标准，用于校准衰减相位掩模的相位计量设备或产品掩模上的见证图案，以验证该掩模的相位精度。 该图案包括有效的线间距比，并且可以通过使用显微镜或步进系统进行测试，或者可以使用用于零阶衍射测量的检测器直接测量。 版权所有（C）2007，JPO＆INPIT