公开(公告)号：GB2576466A

公开(公告)日：2020-02-19

申请号：GB201917751

申请日：2018-05-29

Applicant: IBM

Inventor： BENJAMIN DAVID BRIGGS ,  LEIGH ANNE CLEVENGER ,  MICHAEL RIZZOLO ,  MARYAM ASHOORI ,  SPYRIDON SKORDAS ,  LAWRENCE CLEVENGER ,  JUSTIN CANAPERI

IPC: G06F3/041

Abstract: A system for a touch screen interface that includes a coating including a plurality of a touch activated microchips; and a projector for projecting a light image onto the coating that is applied to a touch screen substrate. The system also includes an image calibrator that calibrates touch activated microchips in the coating to features of the light image projected onto the coating. The system further includes a receiver for receiving signal from the touch activated microchips when said feature of the light image is activated.

公开(公告)号：GB2601100B

公开(公告)日：2022-08-31

申请号：GB202204077

申请日：2020-09-08

Applicant: IBM

Inventor： MICHAEL RIZZOLO ,  NICHOLAS ANTHONY LANZILLO ,  BENJAMIN DAVID BRIGGS ,  LAWRENCE CLEVENGER

IPC: G11C11/16 ,  H01L27/22 ,  H01L43/12

Abstract: Encapsulation topography-assisted techniques for forming self-aligned top contacts in MRAM devices are provided. In one aspect, a method for forming an MRAM device includes: forming MTJs on interconnects embedded in a first dielectric; depositing an encapsulation layer over the MTJs; burying the MTJs in a second dielectric; patterning a trench in the second dielectric over the MTJs exposing the encapsulation layer over tops of the MTJs which creates a topography at the trench bottom; forming a metal line in the trench over the topography; recessing the metal line which breaks up the metal line into segments separated by exposed peaks of the encapsulation layer; recessing the exposed peaks of the encapsulation layer to form recesses at the tops of the MTJs; and forming self-aligned contacts in the recesses. An MRAM device is also provided.

公开(公告)号：GB2576466B

公开(公告)日：2022-01-26

申请号：GB201917751

申请日：2018-05-29

Applicant: IBM

Inventor： BENJAMIN DAVID BRIGGS ,  LEIGH ANNE CLEVENGER ,  MICHAEL RIZZOLO ,  MARYAM ASHOORI ,  SPYRIDON SKORDAS ,  LAWRENCE CLEVENGER ,  JUSTIN CANAPERI

IPC: G06F3/041

Abstract: A system for a touch screen interface that includes a coating including a plurality of a touch activated microchips; and a projector for projecting a light image onto the coating that is applied to a touch screen substrate. The system also includes an image calibrator that calibrates touch activated microchips in the coating to features of the light image projected onto the coating. The system further includes a receiver for receiving signal from the touch activated microchips when said feature of the light image is activated.

公开(公告)号：GB2601100A

公开(公告)日：2022-05-18

申请号：GB202204077

申请日：2020-09-08

Applicant: IBM

Inventor： MICHAEL RIZZOLO ,  NICHOLAS ANTHONY LANZILLO ,  BENJAMIN DAVID BRIGGS ,  LAWRENCE CLEVENGER

IPC: G11C11/16 ,  H01L27/22 ,  H01L43/12

Abstract: A method for forming an MRAM device includes: forming MTJs (202) on interconnects (106) embedded in a first dielectric (102); depositing an encapsulation layer (204) over the MTJs (202); burying the MTJs (202) in a second dielectric (206); patterning a trench (302') in the second dielectric (206) over the MTJs (202) exposing the encapsulation layer (204) over tops of the MTJs (202) which creates a topography at the trench (302') bottom; forming a metal line (904) in the trench (302') over the topography; recessing the metal line (904) which breaks up the metal line (904) into segments (904a, 904b) separated by exposed peaks of the encapsulation layer (204); recessing the exposed peaks of the encapsulation layer (204) to form recesses at the tops of the MTJs (202); and forming self-aligned contacts (1202) in the recesses. An MRAM device is also provided.

公开(公告)号：GB2555269A

公开(公告)日：2018-04-25

申请号：GB201718865

申请日：2016-05-27

Applicant: IBM

Inventor： BENJAMIN DAVID BRIGGS ,  MICHAEL RIZZOLO ,  LAWRENCE CLEVENGER ,  KOICHI MOTOYAMA

IPC: H01L23/528 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532

Abstract: After forming a trench opening (52) including narrow trench portions (52A) spaced apart by wide trench portions (52B) and forming a stack of a first diffusion barrier layer (62) and a first liner layer (64) on sidewalls and a bottom surface of the trench opening (52), a reflow process is performed to fill the narrow trench portions (52A) but not the wide trench portions (52B) with a first conductive material layer (66). A stack of a second diffusion barrier layer (72) and a second liner layer (74) is formed on portions of the first liner layer (64) and ends of the first conductive material layer (66) exposed by the wide trench portions (52B). A second conductive material layer (76) is deposited to fill the wide trench portions (52B). Portions of the second diffusion barrier layer (72) and the second liner layer (74) located between the first conductive material layer (66) and the second conductive material layer (76) act as vertical blocking boundaries to prevent the electromigration of metal atoms.