公开(公告)号：DE60326724D1

公开(公告)日：2009-04-30

申请号：DE60326724

申请日：2003-05-28

Applicant: IBM

Inventor： MICHEL BRUNO ,  ROTHUIZEN HUGO E ,  VETTIGER PETER ,  BONA GIAN-LUCA ,  BIEBUYCK HANS

IPC: G02B5/18 ,  G03F7/00 ,  G03F9/00

Abstract: The invention relates to a method for creating a pattern on a substrate comprising a first alignment structure, using an elastomeric stamp comprising a patterning structure and a second alignment structure. The method comprises a moving step for moving the elastomeric stamp towards the substrate, and a deformation step for deforming the patterning structure with a tensile or compressive force generated by cooperation of the first alignment structure and the second alignment structure.

公开(公告)号：AT205998T

公开(公告)日：2001-10-15

申请号：AT96918817

申请日：1996-07-10

Applicant: IBM

Inventor： BIEBUYCK HANS ,  HASKAL ELIAV

IPC: B05D3/02 ,  C08G77/06 ,  H01L51/52 ,  H05B33/20 ,  H05B33/22

Abstract: An organic light emitting device (10) is provided which is encapsulated by a Siloxane film (17). This Siloxane film (17) is applied to the light emitting portion of the diode (10) providing for protection against contamination, degradation, oxidation and the like. The Siloxane film (17) carries an optical element, such as a lens (18) for example. This optical element (18) is arranged such that the light generated inside the diode (10) is output through it.

公开(公告)号：DE69817329T2

公开(公告)日：2004-06-09

申请号：DE69817329

申请日：1998-06-02

Applicant: IBM

Inventor： BERNARD ANDRE ,  MICHEL BRUNO ,  BIEBUYCK HANS ,  SCHMID HEINZ ,  DELAMARCHE EMMANUEL

IPC: G01N13/02 ,  G01N33/483

公开(公告)号：DE69624934D1

公开(公告)日：2003-01-02

申请号：DE69624934

申请日：1996-09-06

Applicant: IBM

Inventor： BIEBUYCK HANS ,  DELAMARCHE EMMANUEL ,  MICHEL BRUNO

IPC: G01N33/543 ,  B01J19/00 ,  B05D1/18 ,  B05D1/28 ,  C07K17/14 ,  C40B40/06 ,  C40B40/10 ,  C40B60/14

Abstract: PCT No. PCT/IB96/00908 Sec. 371 Date Apr. 29, 1998 Sec. 102(e) Date Apr. 29, 1998 PCT Filed Sep. 6, 1996 PCT Pub. No. WO98/09735 PCT Pub. Date Mar. 12, 1998A method is proposed with which chemically defined bodies can be deposited on a substrate. Therefor, the bodies are fixed with a predetermined orientation on a stamping means which is then approached to the substrate whereby the bodies are deposited. While releasing the stamping means the bodies remain on the substrate keeping their orientation.

公开(公告)号：DE69724159D1

公开(公告)日：2003-09-18

申请号：DE69724159

申请日：1997-09-19

Applicant: IBM

Inventor： BIEBUYCK HANS ,  MICHEL BRUNO ,  SCHMID HEINZ

IPC: G03F1/00 ,  G03F7/20 ,  H01L21/027 ,  G03F1/14

Abstract: Optical lithography scheme making use of light coupling structures, and elastomeric light coupling structures in particular. These light coupling structures comprise protruding portions and connecting portions. The protruding elements are designed to be brought into conformal contact with a resist to be exposed such that the light guided into the protruding elements is coupled from there directly into the resist. The lateral shape and size of the protruding elements defines 1:1 the lateral size and shape of small features to be exposed in the resist.

公开(公告)号：AU4944700A

公开(公告)日：2001-01-09

申请号：AU4944700

申请日：2000-06-15

Applicant: IBM

Inventor： BIEBUYCK HANS ,  DELAMARCHE EMMANUEL ,  GEISSLER MATTHIAS ,  KIND HANNES ,  MICHEL BRUNO

IPC: C23C18/18 ,  C23C18/16 ,  H05K3/18

Abstract: Methods for electroless deposition of conductive material on a substrate using in both cases a stamp having a patterned surface which is pressed onto the surface of a substrate for printing the substrate and providing a pattern of a catalyst on the substrate on which metal deposition occurs in the course of electroless deposition by immersing the printed substrate in a plating bath are provided. In one case, the stamp is pretreated to render the pattern of the stamp wettable with a catalytic ink which is transformed to the surface of the substrate. In the other case, a catalytic layer is provided on the surface of the substrate which is patterned by the stamp transferring a resist material onto the catalytic layer so that a subsequent etching process lays open the desired pattern of the catalytic layer for electroless deposition.

公开(公告)号：DE60024046T2

公开(公告)日：2006-07-27

申请号：DE60024046

申请日：2000-06-15

Applicant: IBM

Inventor： BIEBUYCK HANS ,  DELAMARCHE EMMANUEL ,  GEISSLER MATTHIAS ,  KIND HANNES ,  MICHEL BRUNO

IPC: C23C18/16 ,  C23C18/18 ,  H05K3/18

Abstract: Methods for electroless deposition of conductive material on a substrate using in both cases a stamp having a patterned surface which is pressed onto the surface of a substrate for printing the substrate and providing a pattern of a catalyst on the substrate on which metal deposition occurs in the course of electroless deposition by immersing the printed substrate in a plating bath are provided. In one case, the stamp is pretreated to render the pattern of the stamp wettable with a catalytic ink which is transformed to the surface of the substrate. In the other case, a catalytic layer is provided on the surface of the substrate which is patterned by the stamp transferring a resist material onto the catalytic layer so that a subsequent etching process lays open the desired pattern of the catalytic layer for electroless deposition.

公开(公告)号：DE60024046D1

公开(公告)日：2005-12-22

申请号：DE60024046

申请日：2000-06-15

Applicant: IBM

Inventor： BIEBUYCK HANS ,  DELAMARCHE EMMANUEL ,  GEISSLER MATTHIAS ,  KIND HANNES ,  MICHEL BRUNO

IPC: C23C18/18 ,  C23C18/16 ,  H05K3/18

Abstract: Methods for electroless deposition of conductive material on a substrate using in both cases a stamp having a patterned surface which is pressed onto the surface of a substrate for printing the substrate and providing a pattern of a catalyst on the substrate on which metal deposition occurs in the course of electroless deposition by immersing the printed substrate in a plating bath are provided. In one case, the stamp is pretreated to render the pattern of the stamp wettable with a catalytic ink which is transformed to the surface of the substrate. In the other case, a catalytic layer is provided on the surface of the substrate which is patterned by the stamp transferring a resist material onto the catalytic layer so that a subsequent etching process lays open the desired pattern of the catalytic layer for electroless deposition.

公开(公告)号：ES2164250T3

公开(公告)日：2002-02-16

申请号：ES96918817

申请日：1996-07-10

Applicant: IBM

Inventor： BIEBUYCK HANS ,  HASKAL ELIAV

IPC: B05D3/02 ,  C08G77/06 ,  H01L51/52 ,  H05B33/20 ,  H05B33/22

Abstract: An organic light emitting device (10) is provided which is encapsulated by a Siloxane film (17). This Siloxane film (17) is applied to the light emitting portion of the diode (10) providing for protection against contamination, degradation, oxidation and the like. The Siloxane film (17) carries an optical element, such as a lens (18) for example. This optical element (18) is arranged such that the light generated inside the diode (10) is output through it.

公开(公告)号：DE69615410D1

公开(公告)日：2001-10-25

申请号：DE69615410

申请日：1996-07-10

Applicant: IBM

Inventor： BIEBUYCK HANS ,  HASKAL ELIAV

IPC: B05D3/02 ,  C08G77/06 ,  H01L51/52 ,  H05B33/20 ,  H05B33/22

Abstract: An organic light emitting device (10) is provided which is encapsulated by a Siloxane film (17). This Siloxane film (17) is applied to the light emitting portion of the diode (10) providing for protection against contamination, degradation, oxidation and the like. The Siloxane film (17) carries an optical element, such as a lens (18) for example. This optical element (18) is arranged such that the light generated inside the diode (10) is output through it.