Method of manufacturing a semiconductor device
    1.
    发明授权
    Method of manufacturing a semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号:US3871067A

    公开(公告)日:1975-03-18

    申请号:US37527873

    申请日:1973-06-29

    Applicant: IBM

    CPC classification number: H01L21/00 H01L21/3215 H01L29/00 Y10S438/91

    Abstract: Silicon ions are implanted in an aluminum or aluminum-copper film forming an electrode layer over a silicon dioxide layer on a semiconductor. The per cent by weight of silicon implanted into the metal film is greater than the per cent by weight of solid solubility of silicon in aluminum at the maximum processing temperature of the substrate that occurs after implantation. The peak of the implanted ion profile is preferably at the interface between the film and a silicon dioxide layer on the surface of the substrate.

    Abstract translation: 将硅离子注入到在半导体上形成二氧化硅层上的电极层的铝或铝 - 铜膜中。 植入金属膜中的硅的重量百分比大于在植入后发生的衬底的最大处理温度下硅在铝中的固体溶解度的重量百分比。 注入离子轮廓的峰优选在膜和衬底表面上的二氧化硅层之间的界面处。

    2.
    发明专利
    未知

    公开(公告)号:FR2423338A1

    公开(公告)日:1979-11-16

    申请号:FR7831284

    申请日:1978-10-31

    Applicant: IBM

    Abstract: An electrostatic lens is disposed between a charge electrode and deflection plates to electrostatically focus each of the droplets on a recording surface at a position in alignment with the nozzle supplying the stream. The lens preferably comprises three electrodes with each of the outer electrodes having the same potential, which is substantially equal to the kinetic energy per unit charge of each of the charged droplets and of opposite polarity to the charge on the droplets, and the third electrode preferably being grounded. Each of the electrodes has a circular aperture through which the charged droplets pass with the electrodes being spaced from each other in the direction of the stream a distance preferably no greater than the diameter of the aperture. If desired, the electrode, which is furthest from the nozzle, can be omitted although this will produce some deceleration of the droplets.

    4.
    发明专利
    未知

    公开(公告)号:DE2852667A1

    公开(公告)日:1979-06-13

    申请号:DE2852667

    申请日:1978-12-06

    Applicant: IBM

    Abstract: An electrostatic lens is disposed between a charge electrode and deflection plates to electrostatically focus each of the droplets on a recording surface at a position in alignment with the nozzle supplying the stream. The lens preferably comprises three electrodes with each of the outer electrodes having the same potential, which is substantially equal to the kinetic energy per unit charge of each of the charged droplets and of opposite polarity to the charge on the droplets, and the third electrode preferably being grounded. Each of the electrodes has a circular aperture through which the charged droplets pass with the electrodes being spaced from each other in the direction of the stream a distance preferably no greater than the diameter of the aperture. If desired, the electrode, which is furthest from the nozzle, can be omitted although this will produce some deceleration of the droplets.

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