公开(公告)号：CA1101765A

公开(公告)日：1981-05-26

申请号：CA305345

申请日：1978-06-13

Applicant: IBM

Inventor： BERKENBLIT MELVIN ,  CHAN SEE A ,  REISMAN ARNOLD ,  ZIRINSKY STANLEY

IPC: B05B1/00 ,  B41J2/135 ,  C04B41/53 ,  C04B41/91 ,  C23F1/00 ,  G01F1/42 ,  H01L21/308 ,  H03H7/06 ,  C09K13/04 ,  B01J17/00

Abstract: - PROCESS FOR ETCHING HOLES A method for etching at least one aperture having a defined crystallographic geometry in single crystals which includes masking the crystal to protect predetermined portions thereof from being etched, and then anisotropically etching with a mixture of sulfuric acid and phosphoric acid.