2.
    发明专利
    未知

    公开(公告)号:DE68914939T2

    公开(公告)日:1994-11-10

    申请号:DE68914939

    申请日:1989-09-21

    Applicant: IBM

    Abstract: Thin-film electrical circuits are interconnected by a process comprising the steps of partially ablating the existing thin-film conductor at the connection point(s) by means of a pulsed laser and then depositing a thin-film metal interconnection over the desired area, which includes the area(s) of the existing thin-film circuit that were exposed to the pulsed laser.

    3.
    发明专利
    未知

    公开(公告)号:DE68914939D1

    公开(公告)日:1994-06-01

    申请号:DE68914939

    申请日:1989-09-21

    Applicant: IBM

    Abstract: Thin-film electrical circuits are interconnected by a process comprising the steps of partially ablating the existing thin-film conductor at the connection point(s) by means of a pulsed laser and then depositing a thin-film metal interconnection over the desired area, which includes the area(s) of the existing thin-film circuit that were exposed to the pulsed laser.

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