Abstract:
On-chip integrated variable inductors, methods of making and tuning an on-chip integrated variable inductor, and design structures embodying a circuit containing the on-chip integrated variable inductor. The inductor generally includes a signal line configured to carry an electrical signal, a ground line positioned in proximity to the signal line, and at least one control unit electrically coupled with the ground line. The at least one control unit is configured to open and close switch a current path connecting the ground line with a ground potential so as to change an inductance of the signal line.
Abstract:
PROBLEM TO BE SOLVED: To provide circuit and design structures for on-chip slow wave transmission line band-stop filter, and to provide a method for manufacturing the same. SOLUTION: The circuit structure includes an on-chip transmission line stub having a conditionally floating structure. The conditionally floating structure is so structured as to provide increased capacitance to the on-chip transmission line stub when the conditionally floating structure is connected to ground. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an inductor being formed on an integrated circuit chip. SOLUTION: The on-chip inductor comprises one or a plurality of inner layers (12) existing between two or more outer layers (14), an inductor metal wiring turn (16) included in the one or a plurality of inner layers (12), and a magnetic member for forming the two or more outer layers (14) and the one or a plurality of inner layers (12). In one embodiment, the magnetic member is photoresist paste containing magnetic particles. In another embodiment, the magnetic member is a series of magnetic metal strips (32 and 36) arranged, respectively, on the first and second parts (30 and 34) of the two or more outer layers (14) and on the one or a plurality of inner layers (12), respectively. The series of magnetic metal strips on the first and second parts (30 and 34) form a lattice pattern. Other mode includes deposition of a compound controlled adjustably and a control winding having an adjustable current. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
A method, structure, and design structure for a through-silicon- via Wilkinson power divider (100). A method includes: forming an input (105) on a first side of a substrate(200); forming a first leg (110a) comprising a first through-silicon- via (120a) formed in the substrate, wherein the first leg electrically connects the input and a first output (115a); forming a second leg (110b) comprising a second through-silicon- via (120b) formed in the substrate, wherein the second leg electrically connects the input and a second output (115b), and forming a resistor (125) electrically connected between the first output and the second output.
Abstract:
Una estructura de diseño, una estructura y un método para proporcionar una línea de transmisión con retardo variable en la microplaqueta con una impedancia característica fija. Una estructura de la línea de transmisión incluye una línea de la señal (50) (por ejemplo, S), una primera estructura de retorno a tierra (55) (por ejemplo, G1), que causa un primer retardo (ti) y una primera impedancia característica (Zo1) en la estructura de la línea de transmisión, y una segunda estructura de retorno a tierra (75) (por ejemplo, G2), que causa un segundo retardo (t2) y una segunda impedancia característica (Zo2) en la estructura de la línea de transmisión. El primer retardo (t1) es diferente del segundo retardo (t2), y la primera impedancia característica (Zo1) es sustancialmente la misma que la segunda impedancia característica (Zo2).
Abstract:
Verfahren, Struktur und Entwurfsstruktur für einen Wilkinson-Leistungsteiler (100) mit Durchkontaktierung durch Silicium. Das Verfahren umfasst das Folgende: Bilden eines Eingangs (105) auf einer ersten Seite eines Substrats (200); Bilden eines ersten Ausläufers (110a), der eine erste in dem Substrat ausgebildete Durchkontaktierung durch Silicium (120a) umfasst, wobei der erste Ausläufer den Eingang und einen ersten Ausgang (115a) elektrisch verbindet; Bilden eines zweiten Ausläufers (110b), welcher eine zweite in dem Substrat ausgebildete Durchkontaktierung durch Silicium (120b) umfasst, wobei der zweite Ausläufer den Eingang und einen zweiten Ausgang (115b) elektrisch verbindet; und Bilden eines Widerstands (125), der elektrisch zwischen den ersten Ausgang und den zweiten Ausgang geschaltet ist.
Abstract:
A Lange coupler having a first plurality of lines (210, 220) on a first level and a second plurality of lines (230, 240) on a second level. At least one line on the first level is cross-coupled to a respective line on the second level via electromagnetic waves (250, 260, 270, 280) traveling through the first and second plurality of lines. The first and second plurality of lines may be made of metal, and the first level may be higher than the second level. A substrate (200) may be provided into which the first and second plurality of lines are etched so as to define an on-chip Lange coupler.
Abstract:
A method, structure, and design structure for a through-silicon- via Wilkinson power divider (100). A method includes: forming an input (105) on a first side of a substrate(200); forming a first leg (110a) comprising a first through-silicon- via (120a) formed in the substrate, wherein the first leg electrically connects the input and a first output (115a); forming a second leg (110b) comprising a second through-silicon- via (120b) formed in the substrate, wherein the second leg electrically connects the input and a second output (115b), and forming a resistor (125) electrically connected between the first output and the second output.