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公开(公告)号:GB2603442A
公开(公告)日:2022-08-03
申请号:GB202207430
申请日:2020-10-23
Applicant: IBM
Abstract: An erasable magnetoresistive random-access memory (MRAM) structure and a method of making the same includes an MRAM cell disposed between bit line and word line circuit elements, and a vertical-cavity surface-emitting laser (VCSEL) element disposed above the MRAM cell. A laser output of the VCSEL is directed toward the MRAM cell.
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公开(公告)号:GB2616375B
公开(公告)日:2025-05-14
申请号:GB202308637
申请日:2021-11-10
Applicant: IBM
Inventor: KARTHIK YOGENDRA , ERIC RAYMOND EVARTS
Abstract: Provided is a magnetoresistive random-access memory (MRAM) cell. The MRAM cell comprises a first heavy metal layer and a first magnetic tunnel junctions (MTJ) coupled to the first heavy metal layer. The first MTJ has a first area. The MRAM cell further comprises a second MTJ. The second MTJ is connected in series with the first MTJ, and the second MTJ has a second area that is different than the first area. The second MTJ shared a reference layer with the first MTJ. The MRAM cell further comprises a second heavy metal layer that is coupled to the second MTJ.
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