公开(公告)号：JPH03152543A

公开(公告)日：1991-06-28

申请号：JP25042190

申请日：1990-09-21

Applicant: IBM

Inventor： UIRAADO AARU KONREE JIYUNIA ,  JIEFURII DONARUDO JIEROOMU ,  UEIN MAATEIN MOROO ,  SUTANREE YUUJIIN PEROORUTO ,  GEERII TOMASU SUPINITSURO ,  ROBAATO RABIN UTSUDO

IPC: G03F7/004 ,  G03F7/038 ,  H01L21/027

Abstract: PURPOSE: To ensure satisfactory contrast and sensitivity by using an arom. hydroxy substd. polymer, a radiation-degradable acid generating agent and a crosslinking agent having two epoxy groups per one molecule. CONSTITUTION: This photoresist contains polyhydroxystyrene, especially poly-p- hydroxystyrene or novolak such as m-cresol novolak or bisphenol A novolak as an arom. hydroxy substd. polymer, a metallic or nonmetallic onium salt or a nonmetallic precursor of sulfonic acid generating the strong acid when exposed with radiation as a radiation-degradable acid generating agent and an epoxide-contg. compd. having two epoxy groups and crosslinking the hydroxy substd. polymer in the presence of the acid generated under radiation. Satisfactory contrast is ensured without reducing sensitivity.