公开(公告)号：DE2628818A1

公开(公告)日：1977-01-27

申请号：DE2628818

申请日：1976-06-26

Applicant: IBM

Inventor： HASSAN JAVATHU KUTIKARAN ,  RABSTEJNEK CARL VINCENT

IPC: H01J37/20 ,  B23K15/00 ,  B23Q1/62 ,  B23Q11/08 ,  H01J37/30 ,  H01J37/317 ,  H01L21/027 ,  H01L21/68 ,  B25B11/00

Abstract: Disclosed is an X-Y table for positioning semiconductor workpieces in a vacuum environment with a high degree of speed and accuracy. The X and Y prime movers are mounted on adjacent external surfaces of the vacuum chamber. The first motor associated with the drive in the Y direction seals with an O-ring onto the front surface of the chamber. A second motor associated with the X drive is fixedly mounted to one of the sides of the chamber. The lower stage providing motion in the Y direction has a single degree of freedom relative to the vacuum chamber. The upper stage providing motion in the X direction is connected to the lower Y stage and has two degrees of freedom relative to the vacuum chamber. The entire X-Y table assembly is mounted on rails in parallel with the Y direction of motion such that by removing the front wall of the vacuum chamber, the entire assembly may be removed for repair and/or maintenance. By such modular replacement, the entire E-beam tool can resume operation.

公开(公告)号：DE3174452D1

公开(公告)日：1986-05-28

申请号：DE3174452

申请日：1981-06-10

Applicant: IBM

Inventor： HASSAN JAVATHU KUTIKARAN ,  PAIVANAS JOHN ANGELO

IPC: B65G49/07 ,  B65G51/03 ,  B65G53/24 ,  B65H20/10 ,  H01L21/677 ,  B65G51/00 ,  H01L21/68

公开(公告)号：DE3069019D1

公开(公告)日：1984-09-27

申请号：DE3069019

申请日：1980-08-29

Applicant: IBM

Inventor： HASSAN JAVATHU KUTIKARAN ,  PAIVANAS JOHN ANGELO

IPC: B01J19/08 ,  B01J19/26 ,  C23C14/34 ,  C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  C23F1/00

Abstract: A method and apparatus for obtaining a uniform gaseous molecular field under high vacuum conditions encountered in a dry etching process. In the method a source of a gas is provided and introduced into a manifold. The manifold feeds at least one nozzle and the gas is passed through the manifold and through the nozzle into a chamber maintained under vacuum conditions. The pressure of the gas and the configuration of the manifold and nozzle are such that the gas is caused to exit from the nozzle into the chamber under vacuum at sonic velocity.

公开(公告)号：DE3067695D1

公开(公告)日：1984-06-07

申请号：DE3067695

申请日：1980-08-29

Applicant: IBM

Inventor： HASSAN JAVATHU KUTIKARAN ,  PAIVANAS JOHN ANGELO

IPC: B65H23/18 ,  B25J15/06 ,  B65H3/14 ,  B66C1/02 ,  G01V9/00 ,  H05K13/02 ,  B65G47/91

Abstract: A contactless air film pick-up device utilizes the Bernoulli pressure-velocity relationship to provide a pick-up action, and, at the same time, generates a lateral restraining force centering the picked-up object. An air outlet opening (22) in the center of a flow boundary surface is surrounded by intake means (25) ahd, in a radially wider distance, by outlet means (27, 29). The lifting force is provided by air flow through the outlet opening (22), the centering force is generated by air flowfrom the outlet means (27,29) to the intake means (25).

公开(公告)号：DE2754228A1

公开(公告)日：1978-07-06

申请号：DE2754228

申请日：1977-12-06

Applicant: IBM

Inventor： HASSAN JAVATHU KUTIKARAN ,  PAIVANAS JOHN ANGELO

IPC: B65G49/07 ,  B65G51/03 ,  H01L21/677 ,  B65G51/02

Abstract: The transportation of semiconductor wafers along a track on an air film. The supporting air film is controlled by the track configuration and fluid relationships to eliminate the need of a wafer guide on restraint to keep the wafers on the track.

公开(公告)号：DE3166874D1

公开(公告)日：1984-11-29

申请号：DE3166874

申请日：1981-12-16

Applicant: IBM

Inventor： DEROBERTIS IGNATIUS JOSEPH ,  HASSAN JAVATHU KUTIKARAN ,  JUDGE ROBERT LEWIS ,  PAIVANAS JOHN ANGELO

IPC: B65G49/07 ,  B65G51/03 ,  B65H5/22 ,  H01L21/677 ,  B65G51/02

Abstract: This transport system contains an air film shuttle conveyor (10) for conveying semiconductor chips (26) from a loading (20) to an unloading station (30), the conveyor comprising a base plate (42) and upstanding side walls (48) extending longitudinally of the base plate, the side walls being spaced apart a distance slightly greater than the lateral dimension of said chips; further included are means providing a laminar air flow which surrounds the chips and forms an air film supporting them and propelling them downstream such that the slight spacing between the chips and the side walls causes the flow resistance to be higher in the one regions defined by said slight spacing than in the region defined by the spacing between the chips, whereby a continuous and flexible separation action occurs between the chips.

公开(公告)号：DE3166421D1

公开(公告)日：1984-11-08

申请号：DE3166421

申请日：1981-04-28

Applicant: IBM

Inventor： HASSAN JAVATHU KUTIKARAN ,  PAIVANAS JOHN ANGELO

IPC: B65G49/07 ,  B65G51/03 ,  H01L21/67 ,  H01L21/677 ,  B65G51/02 ,  H05K13/02 ,  H01L21/68

Abstract: An air track system, preferably of axi-radial air tracks (22,23) with novel sections rotatable about a transverse axis in the plane of the track and normal to the travel of the objects, hereafter referred to as swivelators (30). Certain of the swivelators are formed with axial movable portions capable of moving beyond the plane of the air track surface and returning to the plane, so that these swivelators can pick up and set down objects (14) in predetermined positions in the manufacturing processing station (20,21) with an air force so as to not make physical contact with the objects. A novel gas lock device is positioned in the air track between those processing stations, in which the gas pressure must be separated so as to essentially eliminate the possibility of gas contaminant passing from one station to the next. The gas lock comprises an air track compartment having closable sides or panels in the path of the travel of the object being transported along the air track.