公开(公告)号：JP2004186673A

公开(公告)日：2004-07-02

申请号：JP2003367987

申请日：2003-10-28

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： CYRILLE MARIE-CLAIRE ,  DILL FREDERICK H ,  HWANG CHERNGYE ,  LI JUI-LUNG

IPC: G11B5/39 ,  G11B5/31 ,  H01L21/304 ,  H01L43/08

CPC classification number: G11B5/313

Abstract: PROBLEM TO BE SOLVED: To provide a CMP(chemical mechanical polish)-supported liftoff fine patterning which is used for a vacuum-deposited thin film for a micro electronic device and a nano-structure.
SOLUTION: The micro electronic device is formed of a first film covering a substrate, a first polishing-resistant layer covering the first film, a second film covering the first polishing-resistant layer, and a junction which is generally vertical between the first and second films and where the first and second polishing-resistant layers contain diamond-like carbons. The first film contains an electrical resistance material, whereas the second film contains a low resistance, conductive material. The first film is an electric resistor realized as a magnetic reading sensor. The electrical resistance material reacts with a magnetic field at high sensitivity. The device includes a generally vertical junction and a dielectric film adjacent to the electrical resistance material.
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：AU1284700A

公开(公告)日：2000-07-03

申请号：AU1284700

申请日：1999-11-24

Applicant: IBM

Inventor： SCHWENKER ROBERT OTTO ,  HWANG CHERNGYE

IPC: G11B5/012 ,  G11B5/31 ,  G11B5/39

Abstract: A read track width defining layer is employed for defining first and second side edges of a read sensor. The read track width defining layer preferably remains in the head to planarize the read head at first and second hard bias and lead layers so as to overcome a problem of write gap curvature in an accompanying write head. The read track width defining layer is defined by a subtractive process about a bilayer photoresist layer. The subtractive process is selective to the read track width defining layer over a read sensor material layer therebelow. Ion milling is then employed for defining first and second side edges of a read sensor layer employing the read track width defining layer as a mask. First and second hard bias and lead layers are then deposited which make contiguous junctions with the first and second side edges of each of the read sensor and read track width defining layers. The photoresist is then removed and the remainder of the read head is completed.

公开(公告)号：DE68915892T2

公开(公告)日：1994-12-01

申请号：DE68915892

申请日：1989-07-04

Applicant: IBM

Inventor： HOWARD JAMES K ,  HUANG HUNG-CHANG W ,  HWANG CHERNGYE

IPC: G01R33/09 ,  G11B5/39 ,  H01L43/08

公开(公告)号：HU0105162A2

公开(公告)日：2002-04-29

申请号：HU0105162

申请日：1999-11-24

Applicant: IBM

Inventor： CHANG HENRY ,  HWANG CHERNGYE ,  SCHWENKER ROBERT OTTO

IPC: G11B5/012 ,  G11B5/31 ,  G11B5/39

Abstract: A read track width defining layer is employed for defining first and second side edges of a read sensor. The read track width defining layer preferably remains in the head to planarize the read head at first and second hard bias and lead layers so as to overcome a problem of write gap curvature in an accompanying write head. The read track width defining layer is defined by a subtractive process about a bilayer photoresist layer. The subtractive process is selective to the read track width defining layer over a read sensor material layer therebelow. Ion milling is then employed for defining first and second side edges of a read sensor layer employing the read track width defining layer as a mask. First and second hard bias and lead layers are then deposited which make contiguous junctions with the first and second side edges of each of the read sensor and read track width defining layers. The photoresist is then removed and the remainder of the read head is completed.

公开(公告)号：GB2361801A

公开(公告)日：2001-10-31

申请号：GB0115773

申请日：1999-11-24

Applicant: IBM

Inventor： CHANG HENRY CHINLIN ,  SCHWENKER ROBERT OTTO ,  HWANG CHERNGYE

IPC: G11B5/012 ,  G11B5/31 ,  G11B5/39

Abstract: A read track width defining layer (306, 310) is employed for defining first (322) and second side edges of a read sensor. The read track width defining layer (310) preferably remains in the head to planarize the read head at first (330) and second (332) hard bias and lead layers so as to overcome a problem of write gap curvature in an accompanying write head. The read track width defining layer is defined by a subtractive process about a bilayer photoresist layer (308). The subtractive process is selective to the read track width defining layer over a read sensor material layer (304) therebelow. Ion milling is then employed for defining first and second side edges of a read sensor layer employing the read track width defining layer as a mask. First and second hard bias and lead layers are then deposited which make contiguous junctions with the first and second side edges of each of the read sensor and read track width defining layers. The photoresist is then removed and the remainder of the read head is completed.

公开(公告)号：DE69316099D1

公开(公告)日：1998-02-12

申请号：DE69316099

申请日：1993-05-21

Applicant: IBM

Inventor： LIN TSANN ,  HOWARD JAMES KENT ,  HWANG CHERNGYE ,  MAURI DANIELE ,  STAUD NORBERT

IPC: G11B5/39 ,  G01R33/06

公开(公告)号：DE69210928T2

公开(公告)日：1996-12-12

申请号：DE69210928

申请日：1992-09-03

Applicant: IBM

Inventor： HOWARD JAMES KENT ,  HUANG HUNG-CHANG WARD ,  HWANG CHERNGYE ,  WU ANTHONY WAI

IPC: G11B5/66 ,  G11B5/64 ,  G11B5/73 ,  G11B5/738 ,  G11B5/84 ,  G11B5/85 ,  G11B5/851

Abstract: A magnetic recording disk has an improved surface film formed on the disk blank. A sputter-deposited surface coating containing nickel, chromium and oxygen (Ni-Cr-O) is formed on a AlMg disk blank, after which a cobalt alloy magnetic layer is formed over the Ni-Cr-O coating and a protective overcoat is formed over magnetic layer. The use of the Ni-Cr-O coating on the disk blank eliminates the need for a wet electroless deposition process for creation of a surface coating and results in an inherent texturing of the subsequently deposited magnetic film and protective overcoat which conform to the surface texture of the sputter-deposited Ni-Cr-O. The disks made with the Ni-Cr-O surface film exhibit a very law static friction force between the air-bearing slider and the disk surface when the disks are used in contact start/stop (CSS) disk files.

公开(公告)号：DE69210928D1

公开(公告)日：1996-06-27

申请号：DE69210928

申请日：1992-09-03

Applicant: IBM

Inventor： HOWARD JAMES KENT ,  HUANG HUNG-CHANG WARD ,  HWANG CHERNGYE ,  WU ANTHONY WAI

IPC: G11B5/66 ,  G11B5/64 ,  G11B5/73 ,  G11B5/738 ,  G11B5/84 ,  G11B5/85 ,  G11B5/851

Abstract: A magnetic recording disk has an improved surface film formed on the disk blank. A sputter-deposited surface coating containing nickel, chromium and oxygen (Ni-Cr-O) is formed on a AlMg disk blank, after which a cobalt alloy magnetic layer is formed over the Ni-Cr-O coating and a protective overcoat is formed over magnetic layer. The use of the Ni-Cr-O coating on the disk blank eliminates the need for a wet electroless deposition process for creation of a surface coating and results in an inherent texturing of the subsequently deposited magnetic film and protective overcoat which conform to the surface texture of the sputter-deposited Ni-Cr-O. The disks made with the Ni-Cr-O surface film exhibit a very law static friction force between the air-bearing slider and the disk surface when the disks are used in contact start/stop (CSS) disk files.

公开(公告)号：DE68915892D1

公开(公告)日：1994-07-14

申请号：DE68915892

申请日：1989-07-04

Applicant: IBM

Inventor： HOWARD JAMES K ,  HUANG HUNG-CHANG W ,  HWANG CHERNGYE

IPC: G01R33/09 ,  G11B5/39 ,  H01L43/08

公开(公告)号：GB2361801B

公开(公告)日：2002-12-18

申请号：GB0115773

申请日：1999-11-24

Applicant: IBM

Inventor： CHANG HENRY CHINLIN ,  SCHWENKER ROBERT OTTO ,  HWANG CHERNGYE

IPC: G11B5/012 ,  G11B5/31 ,  G11B5/39

Abstract: A read track width defining layer is employed for defining first and second side edges of a read sensor. The read track width defining layer preferably remains in the head to planarize the read head at first and second hard bias and lead layers so as to overcome a problem of write gap curvature in an accompanying write head. The read track width defining layer is defined by a subtractive process about a bilayer photoresist layer. The subtractive process is selective to the read track width defining layer over a read sensor material layer therebelow. Ion milling is then employed for defining first and second side edges of a read sensor layer employing the read track width defining layer as a mask. First and second hard bias and lead layers are then deposited which make contiguous junctions with the first and second side edges of each of the read sensor and read track width defining layers. The photoresist is then removed and the remainder of the read head is completed.