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    HIGH RESOLUTION OPTICAL LITHOGRAPHY METHOD AND APPARATUS HAVING EXCIMER LASER LIGHT SOURCE AND STIMULATED RAMAN SHIFTING
    1.
    发明专利
    HIGH RESOLUTION OPTICAL LITHOGRAPHY METHOD AND APPARATUS HAVING EXCIMER LASER LIGHT SOURCE AND STIMULATED RAMAN SHIFTING 未知

    公开(公告)号：CA1173889A

    公开(公告)日：1984-09-04

    申请号：CA399143

    申请日：1982-03-23

    Applicant: IBM

    Inventor： JAIN KANTILAL ,  WILLSON CARLTON G

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/30 ,  H01S3/30 ,  G03G13/00 ,  G03G15/00

    Abstract: HIGH RESOLUTION OPTICAL LITHOGRAPHY METHOD AND APPARATUS HAVING EXCIMER LASER LIGHT SOURCE AND STIMULATED RAMAN SHIFTING An optical lithography method and apparatus in which a pulsed excimer laser produces at least one fundamental output which is directed to expose a photosensitive medium. The output is highly non-gaussian and has sufficient power so that full exposures can be accomplished within a few seconds. An alternate light source is provided by directing the excimer laser output to a Raman cell having a suitable Raman medium contained therein. At least one secondary wavelength is produced by stimulated Raman scattering and the output of the Raman cell is directed to expose a photosensitive medium. A mixture of more than one excimer gas can also be provided in the excimer laser to produce one fundamental output for each excimer gas present in the mixture. These outputs can be directed to expose a photosensitive medium directly. Alternatively, these outputs can be directed to a Raman cell having either a single Raman medium or multiple Raman media in a suitable mixture and directing the output from the Raman cell to expose the photosensitive medium. SA9-81-008

    A METHOD AND APPARATUS FOR PRODUCING A LIGHT SOURCE OF REQUIRED SHAPE
    3.
    发明专利
    A METHOD AND APPARATUS FOR PRODUCING A LIGHT SOURCE OF REQUIRED SHAPE 未知

    公开(公告)号：DE3379597D1

    公开(公告)日：1989-05-18

    申请号：DE3379597

    申请日：1983-05-25

    Applicant: IBM

    Inventor： JAIN KANTILAL ,  LATTA MILTON RUSSELL ,  SINCERBOX GLENN TAVERNIA

    IPC: G02B27/00 ,  G02B5/32 ,  G03H1/00 ,  G03B41/00

    Abstract: Apparatus for producing a light source of a desired shape from a light source such as a laser comprising means for directing the light source along a predetermined path 10 as a playback beam to impinge upon a hologram 12 at a predetermined angle to produce the continuous self-luminous source of the desired shape. The hologram is recorded upon a substrate 28 coated with a photosensitive material 30 by interference between recording and object beams 24, 48 derived from the same source 20 of coherent radiation. The recording beam 24 is directed toward the substrate at an orientation and angle so that the playback beam 10 is a conjugate of the recording beam. The object beam 48 is directed to the substrate 28 over a path which includes a diffuser plate 36 covered with an opaque material in all areas except for a continuous area which defines the desired shape. The part of the object beam which impinges upon the substrate is limited by a stop 17 which defines the numerical aperture.

    REFLECTING SYSTEM FOR IMPROVING THE UNIFORMITY OF A LIGHT BEAM
    4.
    发明专利
    REFLECTING SYSTEM FOR IMPROVING THE UNIFORMITY OF A LIGHT BEAM 未知

    公开(公告)号：DE3476127D1

    公开(公告)日：1989-02-16

    申请号：DE3476127

    申请日：1984-02-20

    Applicant: IBM

    Inventor： JAIN KANTILAL ,  LATTA MILTON RUSSELL

    IPC: G02B19/00 ,  G02B27/09 ,  G03F7/20 ,  G02B17/00 ,  H01S3/00

    Abstract: Apparatus for improving the uniformity of the intensity distribution across the width of a light beam comprises primary optical means (16) for focusing the beam into a primary focus line (P) extending across the axis of the beam and a primary plane reflecting surface (18) located so as to reflect said beam in the region of the primary focus line. The primary plane reflecting surface is located so that the primary focus line extends parallel to and adjacent to the primary reflecting surface. The primary reflecting surface is inclined at a first angle to the axis of the beam so as to reflect the beam at a plane inclined at the first angle to the axis. The first angle may be zero so that the primary reflecting surface extends parallel to the axis of the beam. The apparatus may also include an additional primary plane reflecting surface (24) located adjacent to the primary focus line as to reflect the beam at a plane inclined at another angle to the axis of the beam. The apparatus may further include secondary plane reflecting surfaces similar to the primary plane reflecting surfaces for providing further reflection of the beam at planes at right angles to the planes of reflection provided by the primary plane reflecting surfaces.

    LIGHT SOURCE
    5.
    发明专利
    LIGHT SOURCE 未知

    公开(公告)号：DE3365603D1

    公开(公告)日：1986-10-02

    申请号：DE3365603

    申请日：1983-05-19

    Applicant: IBM

    Inventor： JAIN KANTILAL ,  LATTA MILTON RUSSELL

    IPC: G03B27/54 ,  G02B3/00 ,  G02B6/06 ,  G03F7/20 ,  G02B6/04

    Abstract: A light source for a high resolution projection lithography system comprises a laser 10 and transforming optical apparatus which transforms the laser source into an optically equivalent self-luminous curved line source. The transforming optical apparatus comprises a two- dimensional array 20 of fly's eye lenses positioned to intercept a collimated parallel beam of light from the laser source and to produce a series of point or small area sources having a selected numerical aperture. An optical fibre array 22 is positioned so that the input end of each fibre receives the light output from one of the lenses in the array. The position of the input end of each fibre is chosen so that light from the illuminating lens underfills the fibre end to preserve the numerical aperture. The output ends of the fibres are arranged in position to produce a curved line source of a desired shape, e.g a quarter of an annulus. Alternate embodiments are described in which different lens arrays can be selectively positioned to change the numerical aperture of the transforming optical apparatus.

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