公开(公告)号：GB2579525A

公开(公告)日：2020-06-24

申请号：GB202002832

申请日：2018-09-25

Applicant: IBM

Inventor： INDIRA SESHADRI ,  EKMINI ANUJA DE SILVA ,  CHI-CHUN LIU ,  CHENG CHI ,  JING GUO ,  LUCIANA MELI THOMPSON

IPC: G03F7/00

Abstract: Embodiments of the present invention provide systems and methods for trapping amines. This in turn mitigates the undesired scumming and footing effects in a photoresist. The polymer brush is grafted onto a silicon nitride surface. The functional groups and molecular weight of the polymer brush provide protons and impose steric hindrance, respectively, to trap amines diffusing from a silicon nitride surface.