公开(公告)号：GB2577661B

公开(公告)日：2020-07-15

申请号：GB202000788

申请日：2018-06-11

Applicant: IBM

Inventor： CHRISTOPHER FREDERICK ROBINSON ,  DAN CORLISS ,  LUCIANA MELI THOMPSON

IPC: G03F7/20

Abstract: Embodiments are directed to a method and system for determining effective dose of a lithography tool. The method includes performing a series of open frame exposures with the lithography tool on a substrate to produce a set of controlled exposure dose blocks in resist, and then baking and developing the exposed substrate. The method further includes scanning the resultant open frame images with oblique light and capturing the light scattered from the substrate surface. The method further includes creating a haze map from the background signal of the scattered light data, converting the haze map to a graphical image file, and analyzing the graphical image file to determine effective dose of the lithography tool, wherein a brightness of the graphical image file is related to effective dose of the lithography tool.

公开(公告)号：GB2579525A

公开(公告)日：2020-06-24

申请号：GB202002832

申请日：2018-09-25

Applicant: IBM

Inventor： INDIRA SESHADRI ,  EKMINI ANUJA DE SILVA ,  CHI-CHUN LIU ,  CHENG CHI ,  JING GUO ,  LUCIANA MELI THOMPSON

IPC: G03F7/00

Abstract: Embodiments of the present invention provide systems and methods for trapping amines. This in turn mitigates the undesired scumming and footing effects in a photoresist. The polymer brush is grafted onto a silicon nitride surface. The functional groups and molecular weight of the polymer brush provide protons and impose steric hindrance, respectively, to trap amines diffusing from a silicon nitride surface.

公开(公告)号：GB2577661A

公开(公告)日：2020-04-01

申请号：GB202000788

申请日：2018-06-11

Applicant: IBM

Inventor： CHRISTOPHER FREDERICK ROBINSON ,  DAN CORLISS ,  LUCIANA MELI THOMPSON

IPC: G03F7/20

Abstract: Embodiments are directed to a method and system for determining effective dose of a lithography tool. The method includes performing a series of open frame exposures with the lithography tool on a substrate to produce a set of controlled exposure dose blocks in resist, and then baking and developing the exposed substrate. The method further includes scanning the resultant open frame images with oblique light and capturing the light scattered from the substrate surface. The method further includes creating a haze map from the background signal of the scattered light data, converting the haze map to a graphical image file, and analyzing the graphical image file to determine effective dose of the lithography tool, wherein a brightness of the graphical image file is related to effective dose of the lithography tool.