公开(公告)号：GB2547121B

公开(公告)日：2019-09-18

申请号：GB201704200

申请日：2016-02-08

Applicant: IBM

Inventor： JOY CHENG ,  MELIA TJIO ,  GURPREET SINGH ,  ALEXANDER FRIZ ,  HSINYU TSAI ,  MARKUS BRINK ,  MICHAEL GUILLORN ,  CHI-CHUN LIU ,  GREGORY DOERK ,  DANIEL PAUL SANDERS

IPC: C08J7/04 ,  B05D1/18 ,  G03F7/00 ,  H01L21/02 ,  H01L21/033 ,  H01L21/311 ,  H01L29/06 ,  H05K3/00

Abstract: Hybrid pre-patterns were prepared for directed self-assembly of a given block copolymer capable of forming a lamellar domain pattern. The hybrid pre-patterns have top surfaces comprising independent elevated surfaces interspersed with adjacent recessed surfaces. The elevated surfaces are neutral wetting to the domains formed by self-assembly. Material below the elevated surfaces has greater etch-resistance than material below the recessed surfaces in a given etch process. Following other dimensional constraints of the hybrid pre-pattern described herein, a layer of the given block copolymer was formed on the hybrid pre-pattern. Self-assembly of the layer produced a lamellar domain pattern comprising self-aligned, unidirectional, perpendicularly oriented lamellae over the elevated surfaces, and parallel and/or perpendicularly oriented lamellae over recessed surfaces. The domain patterns displayed long range order along the major axis of the pre-pattern. The lamellar domain patterns are useful in forming transfer patterns comprising two-dimensional customized features.

公开(公告)号：GB2579525A

公开(公告)日：2020-06-24

申请号：GB202002832

申请日：2018-09-25

Applicant: IBM

Inventor： INDIRA SESHADRI ,  EKMINI ANUJA DE SILVA ,  CHI-CHUN LIU ,  CHENG CHI ,  JING GUO ,  LUCIANA MELI THOMPSON

IPC: G03F7/00

Abstract: Embodiments of the present invention provide systems and methods for trapping amines. This in turn mitigates the undesired scumming and footing effects in a photoresist. The polymer brush is grafted onto a silicon nitride surface. The functional groups and molecular weight of the polymer brush provide protons and impose steric hindrance, respectively, to trap amines diffusing from a silicon nitride surface.

公开(公告)号：GB2547121A

公开(公告)日：2017-08-09

申请号：GB201704200

申请日：2016-02-08

Applicant: IBM

Inventor： JOY CHENG ,  MELIA TJIO ,  GURPREET SINGH ,  ALEXANDER FRIZ ,  HSINYU TSAI ,  MARKUS BRINK ,  MICHAEL GUILLORN ,  CHI-CHUN LIU ,  GREGORY DOERK ,  DANIEL PAUL SANDERS

IPC: C08J7/04 ,  H01L21/02 ,  H01L21/311 ,  H01L29/06 ,  H05K3/00

Abstract: Hybrid pre-patterns were prepared for directed self-assembly of a given block copolymer capable of forming a lamellar domain pattern. The hybrid pre-patterns have top surfaces comprising independent elevated surfaces interspersed with adjacent recessed surfaces. The elevated surfaces are neutral wetting to the domains formed by self-assembly. Material below the elevated surfaces has greater etch-resistance than material below the recessed surfaces in a given etch process. Following other dimensional constraints of the hybrid pre-pattern described herein, a layer of the given block copolymer was formed on the hybrid pre-pattern. Self- assembly of the layer produced a lamellar domain pattern comprising self-aligned, unidirectional, perpendicularly oriented lamellae over the elevated surfaces, and parallel and/or perpendicularly oriented lamellae over recessed surfaces. The domain patterns displayed long range order along the major axis of the pre-pattern. The lamellar domain patterns are useful in forming transfer patterns comprising two-dimensional customized features.