公开(公告)号：DE2512745A1

公开(公告)日：1975-10-09

申请号：DE2512745

申请日：1975-03-22

Applicant: IBM

Inventor： CORTELLINO CHARLES ANTHONY ,  GIPSTEIN EDWARD ,  HEWETT WILLIAM AINSLIE ,  JOHNSON DUANE EDWARD ,  MOREAU WAYNE MARTIN

IPC: G03F7/039 ,  H01L21/027 ,  G03F7/10

Abstract: It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 x 10 6 coulombs/cm2.

公开(公告)号：DE2736756A1

公开(公告)日：1978-03-09

申请号：DE2736756

申请日：1977-08-16

Applicant: IBM

Inventor： JOHNSON DUANE EDWARD ,  PEDERSON LESTER ARLYN

IPC: G03F7/20 ,  G03C1/72 ,  G03C5/08 ,  G03F7/039 ,  H01L21/027 ,  G03C1/71