Back-side memory element with local memory select transistor

    公开(公告)号:GB2579729A

    公开(公告)日:2020-07-01

    申请号:GB202001670

    申请日:2018-07-18

    Applicant: IBM

    Abstract: A memory device includes a semiconductor device on a wafer. The semiconductor device includes a gate structure, a first source/drain region, and a second source/drain region. The gate structure is on the first side of the wafer. The first source/drain region is also on the first side of the wafer, and contacts a first end of the gate structure. The second source/drain region is on the second side of the wafer and extends into the first side to contact a second end of the gate structure. The memory device further includes a memory storage element on the second side of the wafer. The memory storage element contacts the second source/drain region.

    Back-side memory element with local memory select transistor

    公开(公告)号:GB2579729B

    公开(公告)日:2022-06-08

    申请号:GB202001670

    申请日:2018-07-18

    Applicant: IBM

    Abstract: A memory device includes a semiconductor device on a wafer. The semiconductor device includes a gate structure, a first source/drain region, and a second source/drain region. The gate structure is on the first side of the wafer. The first source/drain region is also on the first side of the wafer, and contacts a first end of the gate structure. The second source/drain region is on the second side of the wafer and extends into the first side to contact a second end of the gate structure. The memory device further includes a memory storage element on the second side of the wafer. The memory storage element contacts the second source/drain region.

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