公开(公告)号：JP2005319460A

公开(公告)日：2005-11-17

申请号：JP2005119127

申请日：2005-04-18

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： DELAMARCHE EMMANUEL ,  JUNCKER DAVID ,  SCHMIDT HEINZ

IPC: B01J19/00 ,  B01L3/02 ,  B05C5/02 ,  C40B40/06 ,  C40B50/14 ,  C40B60/14 ,  H01L21/027

CPC classification number: B82Y30/00 ,  B01J19/0046 ,  B01J2219/00353 ,  B01J2219/00367 ,  B01J2219/00369 ,  B01J2219/0038 ,  B01J2219/00418 ,  B01J2219/00468 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00605 ,  B01J2219/0061 ,  B01J2219/00612 ,  B01J2219/00621 ,  B01J2219/00637 ,  B01J2219/00675 ,  B01J2219/00677 ,  B01J2219/00722 ,  B01J2219/00743 ,  C23F1/08 ,  C40B40/06 ,  C40B50/14 ,  C40B60/14

Abstract: PROBLEM TO BE SOLVED: To provide a technique of confinement of a fluid on a surface, which enables the formation of a two-dimensional pattern.
SOLUTION: An apparatus for applying the fluid on the surface comprises a first conduit which directs the flow of a fist fluid towards the surface, and a second conduit which directs the flow of a second fluid away from the surface. The first conduit is arranged to the second conduit so that the second fluid substantially includes the first fluid when the apparatus operates. The first conduit includes a first aperture and the second conduit includes a second aperture. The first aperture is arranged at a certain distance from the second aperture.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种在表面上限制流体的技术，这使得能够形成二维图案。 解决方案：用于在表面上施加流体的装置包括将第一流体的流动引向表面的第一导管和将第二流体的流动引导离开表面的第二导管。 第一管道被布置到第二管道，使得当设备操作时第二流体基本上包括第一流体。 第一导管包括第一孔，第二导管包括第二孔。 第一孔被布置在与第二孔相距一定距离处。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2002356075A

公开(公告)日：2002-12-10

申请号：JP2002072713

申请日：2002-03-15

Applicant: IBM

Inventor： SCHMIDT HEINZ ,  JUNCKER DAVID ,  MICHEL BRUNO ,  WOLF HEIKO ,  GEISSLER MATTHIAS

IPC: B41F15/36 ,  B41C1/14 ,  B41F15/40 ,  B41N1/24 ,  G03F1/16 ,  G03F7/12

Abstract: PROBLEM TO BE SOLVED: To provide a patterning mask enabling formation of a pattern with increased precision. SOLUTION: Regarding the patterning mask 6 having a substantially planar patterned printing layer 2, the printing layer 2 has a substantially non-elastic stencil layer 3 and a substantially elastic seal layer 4 fixed on the stencil layer 3. The seal layer 4 performs a function of a seal in regard to a liquid, viscous or gaseous material 7 that can be filled on a base 5 through the patterned printing layer 2 when the layer 4 is in contact with the base 5. Moreover, the mask may have a mesh layer. The mesh layer has openings isolated by a solid element and having a two-dimensional regular pattern and rigidity can be given to the mesh plane thereof.

公开(公告)号：AU2003283627A1

公开(公告)日：2004-06-23

申请号：AU2003283627

申请日：2003-11-13

Applicant: IBM

Inventor： DELAMARCHE EMMANUEL ,  JUNCKER DAVID ,  MICHEL BRUNO ,  SCHMID HEINZ

IPC: B01J19/00 ,  B01L3/00 ,  B01L3/02 ,  B05C5/02 ,  C40B60/14

Abstract: A device for flowing a liquid on a surface comprises: a flow path. A first port supplies the liquid to one end of the flow path and applies a first port pressure for retaining the liquid when the flow path is remote from the surface. A second port receives the liquid from the other end of the flow path and applies a second port pressure such that the difference between the first and second negative port pressures is oriented to promote flow of the liquid from the first port to the second port via the flow path in response to the flow path being located proximal to the surface and the liquid in the device contacting the surface. The first and second port pressures are such that the liquid is drawn towards at least the second port in response to withdrawal of the flow path from the surface. Such devices may employ microfluidic technology and find application in surface patterning.