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    Method of forming pattern on surface of article by means of positive microcontact printing
    1.
    发明专利
    Method of forming pattern on surface of article by means of positive microcontact printing 有权
    通过正面微孔印刷形成文章表面的方法

    公开(公告)号：JP2005142175A

    公开(公告)日：2005-06-02

    申请号：JP2002358524

    申请日：2002-12-10

    Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

    Inventor： DELAMARCHE EMMANUEL ,  GEISSLER MATTHIAS ,  WOLF HEIKO

    IPC: H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a method of forming a pattern on an article (10) made of a copper layer (12) formed on an insulating substrate (11) by means of a novel positive microcontact printing (MCP) process.
    SOLUTION: A natural oxide present on a Cu layer is removed in HCl solution. Then, an inking layer (15') is formed on a stamp (13') consisting of a polydimethyl siloxane object (14) with a pattern formed by inking it for one minute in 0.2 mM ethanol solution of pentaerythritol-tetrakis. This stamp is applied to the Cu layer, and a first self-assembly monomolecular layer (SAM) (16') is printed according to a desired pattern. The article is soaked in ECT solution. The ECT is adsorbed only in a non-printed region, and the second SAM (18) of a complementary shape to the desired pattern is formed. Finally, the printed region on the Cu layer is removed by means of a peroxodisulfate etching bath.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种通过新颖的正微接触印刷（MCP）工艺在由绝缘衬底（11）上形成的铜层（12）制成的制品（10）上形成图案的方法 。 解决方案：在HCl溶液中除去存在于Cu层上的天然氧化物。 然后，在由聚二甲基硅氧烷物体（14）组成的印模（13'）上形成着墨层（15'），所述印模（13'）具有通过在季戊四醇四甲醇的0.2mM乙醇溶液中着墨1分钟形成的图案。 将该印模施加于Cu层，根据所需图案印刷第一自组装单分子层（SAM）（16'）。 该文章浸泡在ECT解决方案中。 ECT仅吸附在非印刷区域中，形成与期望图案互补形状的第二SAM（18）。 最后，通过过二硫酸盐蚀刻浴去除Cu层上的印刷区域。 版权所有（C）2005，JPO＆NCIPI

    PATTERNING MASK AND PATTERNING METHOD
    3.
    发明专利
    PATTERNING MASK AND PATTERNING METHOD 审中-公开

    公开(公告)号：JP2002356075A

    公开(公告)日：2002-12-10

    申请号：JP2002072713

    申请日：2002-03-15

    Applicant: IBM

    Inventor： SCHMIDT HEINZ ,  JUNCKER DAVID ,  MICHEL BRUNO ,  WOLF HEIKO ,  GEISSLER MATTHIAS

    IPC: B41F15/36 ,  B41C1/14 ,  B41F15/40 ,  B41N1/24 ,  G03F1/16 ,  G03F7/12

    Abstract: PROBLEM TO BE SOLVED: To provide a patterning mask enabling formation of a pattern with increased precision. SOLUTION: Regarding the patterning mask 6 having a substantially planar patterned printing layer 2, the printing layer 2 has a substantially non-elastic stencil layer 3 and a substantially elastic seal layer 4 fixed on the stencil layer 3. The seal layer 4 performs a function of a seal in regard to a liquid, viscous or gaseous material 7 that can be filled on a base 5 through the patterned printing layer 2 when the layer 4 is in contact with the base 5. Moreover, the mask may have a mesh layer. The mesh layer has openings isolated by a solid element and having a two-dimensional regular pattern and rigidity can be given to the mesh plane thereof.

    SURFACE TREATMENT
    5.
    发明申请
    SURFACE TREATMENT 审中-公开
    表面处理

    公开(公告)号：WO2004050919A3

    公开(公告)日：2004-08-26

    申请号：PCT/US0338752

    申请日：2003-12-04

    Applicant: IBM

    Inventor： AMONTOV SERGEY ,  MICHEL BRUNO ,  SWANSON SALLY ,  WOLF HEIKO

    IPC: G01N33/543 ,  B01J20/32 ,  G01N33/551

    CPC classification number: B82Y30/00 ,  G01N33/54353 ,  G01N2610/00

    Abstract: Described is a process for producing a biomolecular monolayer on a biosensor surface comprising the steps of: reacting a biosensor surface with a solution of heterobifunctional reagent having a first functional group and a second functional group, the first functional group being capable of forming a covalent bond to the biosensor surface groups, the second functional group forming a covalent bond with a homobifunctional polymer to obtain a self-assembled monolayer, and thereafter reacting the monolayer with capture molecules.

    Abstract translation: 描述了在生物传感器表面上生产生物分子单层的方法，包括以下步骤：使生物传感器表面与具有第一官能团和第二官能团的异双功能试剂溶液反应，第一官能团能够形成共价键 到生物传感器表面基团，第二官能团与均双官能聚合物形成共价键以获得自组装单层，然后使单层与捕获分子反应。

    Produkt, das eine physische, nicht klonbare Funktion verkörpert
    9.
    发明专利
    Produkt, das eine physische, nicht klonbare Funktion verkörpert 未知

    公开(公告)号：DE112011103162T5

    公开(公告)日：2013-12-05

    申请号：DE112011103162

    申请日：2011-08-03

    Applicant: IBM

    Inventor： WOLF HEIKO ,  VISEGRADY TAMAS

    IPC: G06K19/06 ,  G06K19/08

    Abstract: Der Erfindung bezieht sich auf Produkte, die eine PUF verkörpern. Ein Verfahren zum Fertigen eines solchen Produkts wird offenbart, das sich auf ein Material stützt, das eine Oberfläche mit „deterministischen” Unebenheiten aufweist. Das Verfahren verwendet des Weiteren Teilchen, die so dimensioniert sind, dass sie durch die Unebenheiten der Oberfläche gefangen werden können. Im Allgemeinen ermöglicht das Verfahren Teilchen (20), sich zufällig auf Unebenheiten (14) der Materialoberfläche (12) abzuscheiden und daran gefangen zu werden, um eine Struktur zu erzielen, die die PUF ausbildet. Die resultierende PUF ist leichter auslesbar gestaltet, da die allgemeine Struktur und die Position der Teilchen bekannt sind. Lediglich die Füllhöhe (einer bestimmten Art) der Teilchen ist zufällig.

    Product embodying a physical unclonable function
    10.
    发明专利
    Product embodying a physical unclonable function 未知

    公开(公告)号：GB2497032A

    公开(公告)日：2013-05-29

    申请号：GB201303961

    申请日：2011-08-03

    Applicant: IBM

    Inventor： VISEGRADY TAMAS ,  WOLF HEIKO

    IPC: G06K19/08 ,  G06K19/06 ,  H04L9/32

    Abstract: The invention is directed to products embodying a PUF. A method for manufacturing such a product is disclosed which relies on a material having one surface with "deterministic" asperities. The method further uses particles dimensioned such as to be able to be trapped by the asperities of the surface. Generally, the method enables particles (20) to randomly deposit on and get trapped by asperities (14) of the material surface (12), such as to obtain a pattern that forms the PUF. The resulting PUF is made easier to read out since the general pattern and the location of the particles are known. Only the filling level (of a given type) of the particles is random.

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