公开(公告)号：JPH11224936A

公开(公告)日：1999-08-17

申请号：JP29838198

申请日：1998-10-20

Applicant: IBM

Inventor： PETER RICHARD DANKOOMU ,  HUMMEL JOHN P ,  LAIBOWITZ ROBERT BENJAMIN ,  DEBORAH AN NEWMEYER ,  KATRINE LIN ZENGER ,  SCHROTT ALEJANDRO GABRIEL

IPC: H01L21/8247 ,  C23C8/12 ,  H01L21/822 ,  H01L21/8242 ,  H01L21/8246 ,  H01L27/04 ,  H01L27/10 ,  H01L27/105 ,  H01L27/108 ,  H01L29/788 ,  H01L29/792

Abstract: PROBLEM TO BE SOLVED: To provide a method for improving adhesion and interfacial characteristics between a noble metal part and a high-permeability film by exposing a surface of a noble-metal substrate to oxygen-containing energy and forming a noble-metal oxide film. SOLUTION: One of or a combination of high-density microwave, high-frequency plasma, ion collisions due to oxygen-containing ion beam is selected as an oxygen-containing energy source, and the energy source is used with or without a substrate bias under separate control. The noble metal is selected from among at least on of Pt, Ir, Au, Os, Ag, Pd, Rh and Ru, or selected from among a noble metal alloy of these noble metals. A noble metal oxide film 36 is formed on a noble-metal substrate 34, by exposing a surface of the substrate 34 to the oxygen containing energy source. The oxide layer thickness is normally in a range of 0.4 to 10 nm. In addition, the surface of the noble- metal substrate 34 may be exposed to the oxygen containing energy source for a sufficient time to form an interfacial reinforcement layer, and then a high-permeability material layer 38 may be deposited on the noble-metal substrate 34 with the oxygen containing layer in between.