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公开(公告)号:GB2585403A
公开(公告)日:2021-01-13
申请号:GB202000333
申请日:2018-06-18
Applicant: IBM
Inventor: JOHN GREG MASSEY , MICHAEL GORDON , KENNETH RODBELL
IPC: H01J35/08
Abstract: A radiation exposure system having a beam source is provided. The system further includes a variable thickness degrader, positioned between the beam source and an object to be exposed, for providing varying degrees of degradation to a radiation beam emitted from the beam source onto the object. The system also includes a set of detectors, positioned between the variable thickness degrader and the object, for receiving and measuring only a portion of the radiation beam remaining after the degradation of the radiation beam by the variable thickness degrader.
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公开(公告)号:SG99289A1
公开(公告)日:2003-10-27
申请号:SG1999004765
申请日:1999-09-22
Applicant: IBM
Inventor: VLASTA A BRUSIC , DANIEL CHARLES EDELSTEIN , PAUL M FENNEY , WILLIAM GUTHRIE , MARK JASO , FRANK B KAUFMAN , NAFTALI LUSTIG , PETER ROPER , KENNETH RODBELL , DAVID B THOMPSON
IPC: C09G1/02 , C09K13/04 , B24C11/00 , C23F3/00 , H01L21/321
Abstract: Copper or a copper alloy is removed by chemical-mechanical planarisation (CMP) in a slurry of an oxidizer, an oxidation inhibitor, and an additive that appreciably regulates copper complexing with the oxidation inhibitor.
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公开(公告)号:GB2585403B
公开(公告)日:2022-04-13
申请号:GB202000333
申请日:2018-06-18
Applicant: IBM
Inventor: JOHN GREG MASSEY , MICHAEL GORDON , KENNETH RODBELL
Abstract: A radiation exposure system having a beam source is provided. The system further includes a variable thickness degrader, positioned between the beam source and an object to be exposed, for providing varying degrees of degradation to a radiation beam emitted from the beam source onto the object. The system also includes a set of detectors, positioned between the variable thickness degrader and the object, for receiving and measuring only a portion of the radiation beam remaining after the degradation of the radiation beam by the variable thickness degrader.
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