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公开(公告)号:JPH1095833A
公开(公告)日:1998-04-14
申请号:JP18344897
申请日:1997-07-09
Applicant: IBM
Inventor: KUCZYNSKI JOSEPH PAUL , MULHOLLAND LAURA MARIE
IPC: C08K3/18 , C08F2/46 , C08G59/18 , C08G59/20 , C08G59/22 , C08G59/24 , C08K3/30 , C08K3/36 , C08K7/16 , C08L63/00 , G03F7/038 , H01L23/29 , H01L23/498
Abstract: PROBLEM TO BE SOLVED: To obtain a thermosetting compd. which is cured by the exposure to chemical rays and is useful as a reprocessible capsule material for integrated circuits by compounding a specific acetal diepoxide with a photo/acid-generated photoinitiator. SOLUTION: This material is an uncured thermosetting compd. which is cured by the exposure to chemical rays and contains an acetal diepoxide represented by the formula [wehrein R and R' are each an aliph. or alicyclic epoxy part; R1 to R4 are each alkyl, substd. alkyl, aryl, or aralkyl; and R2 and R3 are each H, alkyl, alkoxy, substd. alkaryl, alkaryl, or cycloalkyl] and a photo/acid generated photoinitiator. The compd. may further contain a second epoxy-functional resin, an inorg. filler, a plasticizer, etc. A cured capsule material contg. the compd. is dissolvable in a dil. acidic soln. and can be recycled.
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公开(公告)号:JP2004131732A
公开(公告)日:2004-04-30
申请号:JP2003345177
申请日:2003-10-03
Applicant: Internatl Business Mach Corp
, インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation IPC: G01K11/00 , C09D7/12 , C09D201/00 , H05K1/02 , H05K3/28
CPC classification number: H05K3/284 , H05K1/0201 , H05K2201/10151 , H05K2203/083
Abstract: PROBLEM TO BE SOLVED: To provide a new system for detecting heat by detecting gas emitted from a coating material.
SOLUTION: The improved conformal coating is obtained by compounded with a foaming agent (in some case called "frother"). The composition of the improved coating emits a specific gas when heated to a specific temperature. The improved coating is applied on an article preferably detecting heat before damaged. A gas sensor is set near the article to detect the emitted gas. When the gas is detected, a suitable treatment for the article is performed so as to decrease heat. In the case of applying the improved coating in the computer industry, the coating is usable with a specific electronic part or a group of the electronic parts (e.g. circuit board).
COPYRIGHT: (C)2004,JPOAbstract translation: 要解决的问题:提供一种通过检测从涂料发出的气体来检测热量的新系统。 解决方案:通过与发泡剂(在某种情况下称为“起泡剂”)混合来获得改进的保形涂层。 当加热到特定温度时,改进的涂层的组成发射特定的气体。 将改进的涂层施加在优选在损坏之前检测热量的制品上。 气体传感器设置在物品附近以检测排出的气体。 当检测到气体时,进行用于制品的适当处理以降低热量。 在计算机工业中应用改进的涂层的情况下,该涂层可用于特定电子部件或一组电子部件(例如电路板)。 版权所有(C)2004,JPO
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公开(公告)号:DE69738559D1
公开(公告)日:2008-04-24
申请号:DE69738559
申请日:1997-07-30
Applicant: IBM
Inventor: KUCZYNSKI JOSEPH PAUL , MULHOLLAND LAURA MARIE
IPC: C08G59/18 , C08K3/18 , C08F2/46 , C08G59/20 , C08G59/22 , C08G59/24 , C08K3/30 , C08K3/36 , C08K7/16 , C08L63/00 , G03F7/038 , H01L23/29 , H01L23/498
Abstract: An uncured thermosetting composition which is capable of curing upon exposure to actinic radiation is disclosed. The composition includes an acetal diepoxide of the formula: wherein R and R' are individually an aliphatic epoxy, or a cycloaliphatic epoxy; R1 and R4 are individually an alkyl, substituted alkyl, aryl, aryl alkyl; and R2 and R3 are individually hydrogen, alkyl, alkoxy, substituted alkyl aryl, alkyl aryl, and cyclic alkyl, as well as a photo initiator, and an inorganic filler. The composition of the invention may also include a second epoxy functional resin, a flexibilizer, and other adjuvants. Other aspects of the invention include the cured resin encapsulant and a method of recovering the resin from a circuit assembly.
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公开(公告)号:AU4466889A
公开(公告)日:1990-05-24
申请号:AU4466889
申请日:1989-11-14
Applicant: IBM
Inventor: ANGELO RAYMOND WILLIAM , GELORME JEFFREY DONALD , KUCZYNSKI JOSEPH PAUL , LAWRENCE WILLIMA HOWELL , PAPPAS SOCRATES PETER , SIMPSON LOGAN LLOYD
Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
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公开(公告)号:DE69738559T2
公开(公告)日:2009-04-02
申请号:DE69738559
申请日:1997-07-30
Applicant: IBM
Inventor: KUCZYNSKI JOSEPH PAUL , MULHOLLAND LAURA MARIE
IPC: C08G59/18 , C08K3/18 , C08F2/46 , C08G59/20 , C08G59/22 , C08G59/24 , C08K3/30 , C08K3/36 , C08K7/16 , C08L63/00 , G03F7/038 , H01L23/29 , H01L23/498
Abstract: An uncured thermosetting composition which is capable of curing upon exposure to actinic radiation is disclosed. The composition includes an acetal diepoxide of the formula: wherein R and R' are individually an aliphatic epoxy, or a cycloaliphatic epoxy; R1 and R4 are individually an alkyl, substituted alkyl, aryl, aryl alkyl; and R2 and R3 are individually hydrogen, alkyl, alkoxy, substituted alkyl aryl, alkyl aryl, and cyclic alkyl, as well as a photo initiator, and an inorganic filler. The composition of the invention may also include a second epoxy functional resin, a flexibilizer, and other adjuvants. Other aspects of the invention include the cured resin encapsulant and a method of recovering the resin from a circuit assembly.
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公开(公告)号:AU620936B2
公开(公告)日:1992-02-27
申请号:AU4466889
申请日:1989-11-14
Applicant: IBM
Inventor: ANGELO RAYMOND WILLIAM , GELORME JEFFREY DONALD , KUCZYNSKI JOSEPH PAUL , LAWRENCE WILLIMA HOWELL , PAPPAS SOCRATES PETER , SIMPSON LOGAN LLOYD
Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
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公开(公告)号:BR8905837A
公开(公告)日:1990-06-12
申请号:BR8905837
申请日:1989-11-20
Applicant: IBM
Inventor: ANGELO RAYMOND WILLIAM , GELORME JEFFREY DONALD , KUCZYNSKI JOSEPH PAUL , LAWRENCE WILLIAM HOWELL , PAPPAS SOCRATES PETER , SIMPSN LOGAN LLOYD
IPC: C07C381/12 , C08G59/00 , C08G59/18 , C08G59/68 , G03F7/029 , C07C309/04 , C07C309/08 , C07C309/23 , C08L63/00
Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.
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