公开(公告)号：DE3585437D1

公开(公告)日：1992-04-02

申请号：DE3585437

申请日：1985-12-13

Applicant: IBM

Inventor： GELORME JEFFREY DONALD ,  LAWRENCE WILLIAM HOWELL ,  SLOTA JR

IPC: C08J7/00 ,  C08J7/12 ,  C23C18/22 ,  H05K3/18 ,  H05K3/38 ,  H05K3/10

Abstract: The surface of a substrate is roughened by providing a substrate which comprises a resinous material and an inorganic particulate material; and etching a surface of the substrate to selectively etch the resinous material and thereby produce the roughened surface. The preferred etching process is a dry etching process.

公开(公告)号：BR8905837A

公开(公告)日：1990-06-12

申请号：BR8905837

申请日：1989-11-20

Applicant: IBM

Inventor： ANGELO RAYMOND WILLIAM ,  GELORME JEFFREY DONALD ,  KUCZYNSKI JOSEPH PAUL ,  LAWRENCE WILLIAM HOWELL ,  PAPPAS SOCRATES PETER ,  SIMPSN LOGAN LLOYD

IPC: C07C381/12 ,  C08G59/00 ,  C08G59/18 ,  C08G59/68 ,  G03F7/029 ,  C07C309/04 ,  C07C309/08 ,  C07C309/23 ,  C08L63/00

Abstract: Sulfonium salts of the formula: wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof.

公开(公告)号：BR8900664A

公开(公告)日：1989-10-10

申请号：BR8900664

申请日：1989-02-15

Applicant: IBM

Inventor： JOHNSON ROBERT WILLIAM ,  LAWRENCE WILLIAM HOWELL ,  LEMON GARY KEVIN ,  MAGNUSON ROY HARVEY ,  MARKOVICH VOYA RISTA ,  PARSONS RALPH ELLIOTT ,  SAMBUCETTI CARLOS JUAN

IPC: C23C18/18 ,  C23C18/28 ,  C23C18/30 ,  H05K3/00 ,  H05K3/18 ,  H05K3/38 ,  H05K3/26

公开(公告)号：DE3564363D1

公开(公告)日：1988-09-15

申请号：DE3564363

申请日：1985-04-17

Applicant: IBM

Inventor： JONES GERALD WALTER ,  LAWRENCE WILLIAM HOWELL ,  ROVENTE FREDERICK MICHAEL

IPC: H05K1/03 ,  G03F7/095 ,  H05K3/04 ,  H05K3/18 ,  C23C18/16 ,  G03F7/02