公开(公告)号：CA1278635C

公开(公告)日：1991-01-02

申请号：CA499558

申请日：1986-01-14

Applicant: IBM

Inventor： BABICH EDWARD D ,  HATZAKIS MICHAEL ,  LIUTKIS JOHN J ,  PARASCZCAK JURI R ,  SHAW JANE M

IPC: G03C5/00 ,  C08F2/48 ,  C08F290/00 ,  C08F299/00 ,  C08F299/08 ,  C08K5/07 ,  C08L83/07 ,  G03F7/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  H01L21/30

Abstract: ORGANOSILICON POLYMER COMPOSITION AND USE THEREOF FOR PHOTOLITHOGRAPHY A composition containing a polysiloxane having a polymerizable ethylenically unsaturated group, and 2,2-dimethoxy-2-phenyl acetophenone as an ultraviolet light sensitizer; and use thereof in lithography.