公开(公告)号：MY126758A

公开(公告)日：2006-10-31

申请号：MYPI20000517

申请日：2000-02-15

Applicant: IBM

Inventor： PUSHKARA RAO VARANASI ,  JOSEPH F MANISCALCO ,  MARGARET C LAWSON ,  ANN MARIE MEWHERTER ,  MAHMOUD M KHOJASTEH ,  GEORGE M JORDHAMO ,  ROBERT D ALLEN ,  JULIANN OPITZ ,  HIROSHI ITO

IPC: G03F7/039 ,  G03F7/027

Abstract: ACID-CATALYZED POSITIVE PHOTORESIST COMPOSITIONS WHICH ARE IMAGEABLE WITH 193 NM RADIATION AND ARE DEVELOPABLE TO FORM PHOTORESIST STRUCTURES OF HIGH RESOLUTION AND HIGH ETCH RESISTANCE ARE ENABLED BY THE USE OF A COMBINATION OF CYCLIC OLEFIN POLYMER, PHOTOSENSITIVE ACID GENERATOR AND BULKY HYDROPHOBIC ADDITIVE WHICH IS SUBSTANTIALLY TRANSPARENT TO 193 NM RADIATION. THE CYCLIC OLEFIN POLYMERS CONTAIN I) CYCLIC OLEFIN UNITS HAVING ACIDIC POLAR FUNCTIONAL MOIETIES THAT PROMOTE SOLUBILITY IN AQUEOUS ALKALINE SOLUTIONS, AND II) CYCLIC OLEFIN UNITS HAVING ACID LABILE MOIETIES THAT INHIBIT SOLUBILITY IN AQUEOUS SOLUTIONS.

公开(公告)号：SG90720A1

公开(公告)日：2002-08-20

申请号：SG200001282

申请日：2000-03-09

Applicant: IBM

Inventor： PUSHKARA RAO VARANASI ,  JOSEPH F MANISCALCO ,  MARGARET C LAWSON ,  ANN MARIE MEWHERTER ,  MAHMOUD M KHOJASTEH ,  GEORGE M JORDHAMO ,  ROBERT D ALLEN ,  JULIANN OPTIZ ,  HIROSHI ITO

IPC: G03F7/027 ,  G03F7/039