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    METHOD FOR INTERFEROMETRIC SURFACE TOPOGRAPHY
    2.
    发明专利
    METHOD FOR INTERFEROMETRIC SURFACE TOPOGRAPHY 未知

    公开(公告)号：DE3173451D1

    公开(公告)日：1986-02-20

    申请号：DE3173451

    申请日：1981-09-17

    Applicant: IBM DEUTSCHLAND ,  IBM

    Inventor： MAKOSCH GUNTER ,  SCHEDEWIE FRANZ DR

    IPC: G01B9/02 ,  G01B11/06 ,  G01B11/24 ,  G01B11/30 ,  H01L21/66

    Abstract: For the point-by-point interferometric measuring of surfaces which are scanned along lines, or which are subjected to a processing procedure (e.g. etching) a focused laser beam is directed with oblique incidence as a measuring beam onto the respective measured points. The respective height of a measured point determines the path difference (phase difference) between the measuring beam and a reference beam which has been suitably split off the input beam. The oblique incidence (angle of incidence APPROXGREATER 80 DEG ) makes it possible to measure interferometrically very rough surfaces. The measuring range may be extended if the reference beam is directed at an oblique angle of incidence, differing only slightly from that of the measuring beam onto the surface to be examined.

    METHOD AND ARRANGEMENT FOR OPTICALLY DETERMINING SURFACE PROFILES
    3.
    发明专利
    METHOD AND ARRANGEMENT FOR OPTICALLY DETERMINING SURFACE PROFILES 未知

    公开(公告)号：DE3574280D1

    公开(公告)日：1989-12-21

    申请号：DE3574280

    申请日：1985-12-23

    Applicant: IBM DEUTSCHLAND ,  IBM

    Inventor： MAKOSCH GUNTER

    IPC: G01B11/30 ,  G01B9/02 ,  G01B11/24

    Abstract: A surface (1) is subjected to a light field whose intensity is periodically modulated in vertical direction to evaluate the scattered light pattern. The light field is obtained from interference between a first beam (2b) with vertical incidence and two symmetrical lateral beams (2a, 2c) with oblique incidence. All beams are focussed to a common spot if the profile is obtained by scanning the surface or are superimposed as collimated beams if large area profiling is desired. The surface (1) is imaged onto a diaphragm (4) which selects appropriate locations of the surface for measurements by a photodetector (5) to record the synusoidal intensity variation that is obtained when the light field is periodically shifted in vertical direction by phase modulating the central beam - (2b) with respect to the lateral beams.

    METHOD AND DEVICE FOR OPTICAL DISTANCE MEASUREMENT
    4.
    发明专利
    METHOD AND DEVICE FOR OPTICAL DISTANCE MEASUREMENT 未知

    公开(公告)号：DE3071858D1

    公开(公告)日：1987-01-22

    申请号：DE3071858

    申请日：1980-07-31

    Applicant: IBM ,  IBM DEUTSCHLAND

    Inventor： MAKOSCH GUNTER

    IPC: G01B11/00 ,  G01B11/06 ,  G01D5/38 ,  G03F7/20 ,  G03F9/00 ,  G01D5/26 ,  G01B9/02

    Abstract: 1. Method for optical distance measurement, wherein an entry beam (4 ; 4a ; 7 ; 55 ; 405) is diffracted at a displaceable optical measuring grating (3 ; 43) for generating a measuring beam (9 ; 4b ; 58) whose phase is determined by superimposition with a reference beam (4a ; 8 ; 57), characterized in that the reference beam (4a ; 8 ; 57) is collinear with and polarized perpendicularly to the measuring beam (9 ; 4b ; 58), and that the phase difference between the measuring and the phase difference between the measuring and the reference beam occuring during the displacement of the measuring grating (3 ; 43) is determined by electrooptical phase compensation.

    METHOD AND EQUIPMENT FOR CHECKING AN OPTICAL SYSTEM
    6.
    发明专利
    METHOD AND EQUIPMENT FOR CHECKING AN OPTICAL SYSTEM 未知

    公开(公告)号：DE3169941D1

    公开(公告)日：1985-05-23

    申请号：DE3169941

    申请日：1981-04-28

    Applicant: IBM DEUTSCHLAND ,  IBM

    Inventor： HAUSLER GERD DR ,  JARISCH WALTER DR ,  MAKOSCH GUNTER

    IPC: G01B9/02 ,  G01M11/00 ,  G01M11/02

    Abstract: Optical imaging systems are used for making microstructures, and have to be very precise. In order to test these imaging systems, a new method, and a device for carrying out this method, are described in which two interferograms are made and compared. In a first step, an interferogram of an original pattern is made, followed by a second step in which an interferogram of a copy of the original pattern is produced using the identical conditions used to form the first interferogram. The pattern copy is made in the imaging system to be tested. In a third step, the two interferograms are compared with one another to provide a measure of the accuracy of the imaging system. This technique can be used for testing imaging systems which produce only a mirror image.

    8.
    发明专利
    未知

    公开(公告)号：FR2355275A1

    公开(公告)日：1978-01-13

    申请号：FR7714011

    申请日：1977-05-03

    Applicant: IBM

    Inventor： JARISCH WALTER ,  MAKOSCH GUNTER ,  SCHACKPEFFER ARNO

    IPC: G01B11/00 ,  G01B9/02 ,  G01B11/24 ,  G01B11/30 ,  G01N21/956

    Abstract: Disclosed is an interferometric apparatus and method for the inspection and detection of overlay errors characterized in that two plane polarized laser beams are directed onto the surface to be inspected, the angle included by these two beams being dimensioned in such a way that the radiation generating the plus or minus first order of the diffraction pattern of one beam is parallel to the other beam, thus generating an interference field which in the absence of overlay errors consists of an homogeneous fringe pattern while in the presence of such errors the fringe pattern is locally distorted. In a first embodiment, a first component of a laser beam is deflected onto a viewing screen by a beam splitter while a second component passes through the beam splitter to a mirror. The position and angle of the mirror is determined by the first order diffraction characteristics of the grating (object). The second component provides a first order of diffraction which interferes with the first component, producing an interference pattern on the viewing screen.

    METHOD AND DEVICE FOR MEASURING THE EVENNESS, ROUGHNESS OR CURVATURE RADIUS OF AN AREA TO BE MEASURED
    9.
    发明专利
    METHOD AND DEVICE FOR MEASURING THE EVENNESS, ROUGHNESS OR CURVATURE RADIUS OF AN AREA TO BE MEASURED 未知

    公开(公告)号：DE2961022D1

    公开(公告)日：1981-12-24

    申请号：DE2961022

    申请日：1979-10-23

    Applicant: IBM

    Inventor： MAKOSCH GUNTER ,  SOLF BERNHARD

    IPC: G01B11/00 ,  G01B9/02 ,  G01B11/06 ,  G01B11/24 ,  G01B11/26 ,  G01B11/30 ,  G01N21/45

    Abstract: Two radiation components differing from each other with regard to their state of polarization or their wavelength are directed onto closely adjacent points of the object to be measured. The reflected components are recombined and are fed to a polarization- or wavelength-dependent phase shifter periodically shifting the phase positions of the two components by lambda /2 against each other. A phase shift of one of the components caused by the object to be measured is fully compensated for by periodically shifting the phase position of the other component at particular points in time, which can be determined, for example, by means of a connected analyzer and a photodetector. The values of the control voltage effecting the periodical phase shift in the phase shifter are measured at those points in time at which the phase difference between the two components equals zero. These values are proportional to the difference in height between the points of incidence of the two radiation components on the object surface or the slope of the object surface.

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