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公开(公告)号:US3692397A
公开(公告)日:1972-09-19
申请号:US3692397D
申请日:1971-04-12
Applicant: IBM
Inventor: SCHEDEWIE FRANZ
CPC classification number: G02F1/29 , B41J2/4655
Abstract: An optical character generator comprises in combination, a source (L) of collimated and polarized coherent light, a first polarization-dependent beam splitter 14 presenting a low impedance optical transmission path to the light 13, an electrooptic light deflector 15 which deflects light transferred to it by the beam splitter, an electro-optic rotator 16 operating selectively to rotate the plane of polarization of light exiting from the deflector, a second low-loss polarization dependent beam splitter 17 having predetermined orientation with respect to light exiting from the rotator, mirrors 18,19 for directing light reflected from second splitter 17 to character mask 20, and source 27 of deflection/polarization control voltages for coordinately operating the deflector 15 and rotator 16. With suitable voltages from the source 27 light 13 undergoes predetermined handling in the deflector and rotator and exits from the rotator with predetermined deflectional displacement and polarization rotation relative to the entering beam 13. The exit polarization plane is rotated by 90* from the entry plane so that the displaced exiting beam is reflected by splitter 17 and mirrors 18, 19 through a predetermined character opening of the character mask and emerges shaped in the character image. The shaped beam impinges upon first splitter 14 and is reflected back into the deflector system due to its positional orientation and polarization state. The shaped re-entrant beam undergoes complementary deflection and polarization switching in the deflector and rotator whereby it exits from the rotator aligned with the path of the original beam 13 and is permitted to pass through the second beam splitter, optics 21 and fixed aperture A of the shutter 22. Thus the single deflector system performs the dual functions of deflecting the unshaped beam and re-centering the shaped beam, with coupling losses minimized by the adaptive use of the low-loss beam splitters.
Abstract translation: 光学字符发生器组合包括准直和偏振相干光源(L),呈现出对光13的低阻抗光传输路径的第一偏振相关分束器14,使光线偏转光 通过分束器转移到其上,电光旋转器16选择性地操作以旋转从偏转器出射的光的偏振平面,具有相对于从旋转体出射的光的预定取向的第二低损耗偏振相关分束器17 ,用于将从第二分离器17反射的光引导到字符掩模20的反射镜18,19以及用于协调地操作偏转器15和转子16的偏转/偏振控制电压的源27.在来自源27的适当电压下,光13经历预定的处理 偏转器和旋转器,并以预定的偏转位移和极化从转子出射 出射极化平面从入射面旋转90°,使得偏移的出射光束通过分离器17和反射镜18,19反射通过字符掩模的预定字符开口,并且形成为 字符图像。 成形梁撞击在第一分离器14上并且由于其位置取向和偏振状态而被反射回到偏转器系统中。 成形的入射光束在偏转器和旋转器中经历互补偏转和偏振切换,由此其从与原始光束13的路径对准的旋转体离开,并允许其穿过第二分束器,光学器件21和固定孔A 因此,单个偏转器系统执行偏转未成形光束并使成形光束重新定心的双重功能,其中耦合损耗通过低损耗光束分离器的自适应使用最小化。
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公开(公告)号:CA1113757A
公开(公告)日:1981-12-08
申请号:CA326206
申请日:1979-04-24
Applicant: IBM
Inventor: MAKOSCH GUNTER , SCHEDEWIE FRANZ , SCHMACKPFEFFER ARNO , ZILLER JORG
IPC: B23K15/08 , B23K26/06 , B23K26/073 , B23K26/382 , G02B27/09 , H01J37/30 , B23K26/00
Abstract: Device for Material Machining Using Electromagnetic or Corpuscular Beams The invention provides an improved method and apparatus for material processing by electromagnetic or corpuscular beams. The processing beam is modified by inverting means in the beam path which modifies the beam by axis symmetrical inversion of paraxial and off-axis cross-sectional areas of said beam. The modified beam is then focused at the material to be processed, e.g., for welding, drilling, cutting or the like.
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公开(公告)号:CH634656A5
公开(公告)日:1983-02-15
申请号:CH1243078
申请日:1978-12-05
Applicant: IBM
Inventor: KORTH HANS ERDMANN , SCHEDEWIE FRANZ
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公开(公告)号:IT1150985B
公开(公告)日:1986-12-17
申请号:IT2072580
申请日:1980-03-18
Applicant: IBM
Inventor: ERDMANN KORTH HANS , SCHEDEWIE FRANZ
Abstract: A radiation analyzing system including a beam splitting prism, an analyzer and a photodiode array arranged in an evaluation plane. Upon passing through the prism radiation to be analyzed is split into two beams vertically linearly polarized to each other which include a small angle and show a phase shift that is a function of the distance from the optical axis. The difference of the phase positions of these two beams is a function of their distance from the left or right edge of the prism. The analyzer, which is arranged behind the prism and whose axis of polarization is inclined relative to the directions of polarization of the two vertically polarized beams, produces a periodic intensity distribution when the impinging radiation is polarized at least partly and has a component in parallel to the axis of the analyzer. The periodicity of the intensity distribution which generally consists of an interference fringe pattern in evaluation plane is proportional to the wave length of the light and inversely proportional to the sine of the splitting angle of the prism. This intensity distribution is detected by the one-dimensional photodiode array arranged in the evaluation plane, and subsequently applied either to suitable analog circuits or to a computer for evaluation.
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公开(公告)号:FR2413644A1
公开(公告)日:1979-07-27
申请号:FR7833626
申请日:1978-11-21
Applicant: IBM
Inventor: KORTH HANS E , SCHEDEWIE FRANZ
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