Abstract:
System and method for compact model algorithms (310-350) to accurately account for effects of layout-induced changes in nitride liner (260) stress in semiconductor devices (200). The layout- sensitive compact model algorithms (310-350) account for the impact of large layout variation on circuits by implementing algorithms for obtaining the correct stress response approximations and layout extraction algorithms for obtaining the correct geometric parameters that drive the stress response. In particular, these algorithms include specific information from search "buckets" that are directionally-oriented and include directionally-specific distance measurements for analyzing in detail the specific shape neighborhood of the semiconductor device. The algorithms are additionally adapted to enable the modeling and stress impact determination of a device having single stress liner film and dual-stress liners (260) (two different liner films that abut at an interface).
Abstract:
The invention provides a method, system (12), and program product for diagnosing an integrated circuit. In particular, the invention captures one or more images for each relevant circuit layer of the integrated circuit (S2). Based on the image(s), a component netlist is generated (S3, S305, S315). Further, a logic netlist is generated (S4) by applying hierarchical composition rules to the component netlist. The component netlist and/or logic netlist can be compared to a reference netlist to diagnose the integrated circuit. The invention can further generate a schematic (50) based on the component netlist or logic netlist in which components are arranged according to port, power, and/or component pin connection information determined from the netlist. Further, the schematic can be displayed in a manner that wiring connections are selectively displayed to assist a user in intelligently arranging the circuit components.