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公开(公告)号：DE3484271D1
公开(公告)日：1991-04-18
申请号：DE3484271
申请日：1984-12-11
Applicant: IBM
Abstract: A composition of matter is obtained by interreacting a quinone diazo compound and an organosilicon compound. Such a composition can be used as a resist in a lithographic process.
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